JPS59193451A - パタ−ン形成用材料及びパタ−ン形成方法 - Google Patents

パタ−ン形成用材料及びパタ−ン形成方法

Info

Publication number
JPS59193451A
JPS59193451A JP58066893A JP6689383A JPS59193451A JP S59193451 A JPS59193451 A JP S59193451A JP 58066893 A JP58066893 A JP 58066893A JP 6689383 A JP6689383 A JP 6689383A JP S59193451 A JPS59193451 A JP S59193451A
Authority
JP
Japan
Prior art keywords
pattern
energy ray
group
sensitive material
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58066893A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0222942B2 (cg-RX-API-DMAC7.html
Inventor
Masao Morita
雅夫 森田
Haruyori Tanaka
啓順 田中
Saburo Imamura
三郎 今村
Toshiaki Tamamura
敏昭 玉村
Osamu Kogure
小暮　攻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP58066893A priority Critical patent/JPS59193451A/ja
Priority to US06/580,468 priority patent/US4507384A/en
Priority to DE8484101686T priority patent/DE3480735D1/de
Priority to EP84101686A priority patent/EP0122398B1/en
Publication of JPS59193451A publication Critical patent/JPS59193451A/ja
Priority to US06/680,739 priority patent/US4564579A/en
Publication of JPH0222942B2 publication Critical patent/JPH0222942B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Silicon Polymers (AREA)
JP58066893A 1983-04-18 1983-04-18 パタ−ン形成用材料及びパタ−ン形成方法 Granted JPS59193451A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP58066893A JPS59193451A (ja) 1983-04-18 1983-04-18 パタ−ン形成用材料及びパタ−ン形成方法
US06/580,468 US4507384A (en) 1983-04-18 1984-02-15 Pattern forming material and method for forming pattern therewith
DE8484101686T DE3480735D1 (de) 1983-04-18 1984-02-17 Bilderzeugendes material und verfahren zur herstellung von bildern.
EP84101686A EP0122398B1 (en) 1983-04-18 1984-02-17 Pattern forming material and method for forming pattern therewith
US06/680,739 US4564579A (en) 1983-04-18 1984-12-12 Pattern forming material of a siloxane polymer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58066893A JPS59193451A (ja) 1983-04-18 1983-04-18 パタ−ン形成用材料及びパタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS59193451A true JPS59193451A (ja) 1984-11-02
JPH0222942B2 JPH0222942B2 (cg-RX-API-DMAC7.html) 1990-05-22

Family

ID=13329046

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58066893A Granted JPS59193451A (ja) 1983-04-18 1983-04-18 パタ−ン形成用材料及びパタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS59193451A (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6057833A (ja) * 1983-09-09 1985-04-03 Nippon Telegr & Teleph Corp <Ntt> レジスト材料

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58207041A (ja) * 1982-05-28 1983-12-02 Nec Corp 放射線感応性高分子レジスト

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58207041A (ja) * 1982-05-28 1983-12-02 Nec Corp 放射線感応性高分子レジスト

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6057833A (ja) * 1983-09-09 1985-04-03 Nippon Telegr & Teleph Corp <Ntt> レジスト材料

Also Published As

Publication number Publication date
JPH0222942B2 (cg-RX-API-DMAC7.html) 1990-05-22

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