JPS59193291U - モ−ルド内に残留する冷菓原料を回収する装置 - Google Patents
モ−ルド内に残留する冷菓原料を回収する装置Info
- Publication number
- JPS59193291U JPS59193291U JP8640083U JP8640083U JPS59193291U JP S59193291 U JPS59193291 U JP S59193291U JP 8640083 U JP8640083 U JP 8640083U JP 8640083 U JP8640083 U JP 8640083U JP S59193291 U JPS59193291 U JP S59193291U
- Authority
- JP
- Japan
- Prior art keywords
- mold
- suction nozzle
- frozen dessert
- drive frame
- raw materials
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Confectionery (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8640083U JPS59193291U (ja) | 1983-06-08 | 1983-06-08 | モ−ルド内に残留する冷菓原料を回収する装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8640083U JPS59193291U (ja) | 1983-06-08 | 1983-06-08 | モ−ルド内に残留する冷菓原料を回収する装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59193291U true JPS59193291U (ja) | 1984-12-21 |
JPS6144616Y2 JPS6144616Y2 (enrdf_load_stackoverflow) | 1986-12-16 |
Family
ID=30216337
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8640083U Granted JPS59193291U (ja) | 1983-06-08 | 1983-06-08 | モ−ルド内に残留する冷菓原料を回収する装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59193291U (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010034203A (ja) * | 2008-07-28 | 2010-02-12 | Tokyo Electron Ltd | 半導体製造装置の洗浄装置及び洗浄方法 |
-
1983
- 1983-06-08 JP JP8640083U patent/JPS59193291U/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010034203A (ja) * | 2008-07-28 | 2010-02-12 | Tokyo Electron Ltd | 半導体製造装置の洗浄装置及び洗浄方法 |
TWI419248B (zh) * | 2008-07-28 | 2013-12-11 | Tokyo Electron Ltd | Cleaning apparatus and cleaning method for semiconductor manufacturing apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPS6144616Y2 (enrdf_load_stackoverflow) | 1986-12-16 |
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