JPS59175122A - 半導体基板塗布前処理装置 - Google Patents

半導体基板塗布前処理装置

Info

Publication number
JPS59175122A
JPS59175122A JP4821783A JP4821783A JPS59175122A JP S59175122 A JPS59175122 A JP S59175122A JP 4821783 A JP4821783 A JP 4821783A JP 4821783 A JP4821783 A JP 4821783A JP S59175122 A JPS59175122 A JP S59175122A
Authority
JP
Japan
Prior art keywords
wafer
carrier
processing
semiconductor substrate
closed chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4821783A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6355860B2 (cg-RX-API-DMAC7.html
Inventor
Hidemi Amai
秀美 天井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP4821783A priority Critical patent/JPS59175122A/ja
Publication of JPS59175122A publication Critical patent/JPS59175122A/ja
Publication of JPS6355860B2 publication Critical patent/JPS6355860B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
JP4821783A 1983-03-23 1983-03-23 半導体基板塗布前処理装置 Granted JPS59175122A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4821783A JPS59175122A (ja) 1983-03-23 1983-03-23 半導体基板塗布前処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4821783A JPS59175122A (ja) 1983-03-23 1983-03-23 半導体基板塗布前処理装置

Publications (2)

Publication Number Publication Date
JPS59175122A true JPS59175122A (ja) 1984-10-03
JPS6355860B2 JPS6355860B2 (cg-RX-API-DMAC7.html) 1988-11-04

Family

ID=12797241

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4821783A Granted JPS59175122A (ja) 1983-03-23 1983-03-23 半導体基板塗布前処理装置

Country Status (1)

Country Link
JP (1) JPS59175122A (cg-RX-API-DMAC7.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6364031U (cg-RX-API-DMAC7.html) * 1986-10-16 1988-04-27
JPS63199423A (ja) * 1987-02-16 1988-08-17 Toshiba Corp 半導体基板表面処理方法
JP2012199318A (ja) * 2011-03-18 2012-10-18 Tokyo Electron Ltd 塗布、現像装置、塗布、現像方法及び記憶媒体

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52142972A (en) * 1976-05-25 1977-11-29 Toshiba Corp Semiconductor production device
JPS5731151A (en) * 1980-08-04 1982-02-19 Toshiba Corp Automatic continuous treating device for semiconductor substrate
JPS5753933A (ja) * 1980-09-18 1982-03-31 Toshiba Corp Handotaisoshinoseizohoho

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52142972A (en) * 1976-05-25 1977-11-29 Toshiba Corp Semiconductor production device
JPS5731151A (en) * 1980-08-04 1982-02-19 Toshiba Corp Automatic continuous treating device for semiconductor substrate
JPS5753933A (ja) * 1980-09-18 1982-03-31 Toshiba Corp Handotaisoshinoseizohoho

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6364031U (cg-RX-API-DMAC7.html) * 1986-10-16 1988-04-27
JPS63199423A (ja) * 1987-02-16 1988-08-17 Toshiba Corp 半導体基板表面処理方法
JP2012199318A (ja) * 2011-03-18 2012-10-18 Tokyo Electron Ltd 塗布、現像装置、塗布、現像方法及び記憶媒体

Also Published As

Publication number Publication date
JPS6355860B2 (cg-RX-API-DMAC7.html) 1988-11-04

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