JPS59174804A - 回折格子の作製方法 - Google Patents

回折格子の作製方法

Info

Publication number
JPS59174804A
JPS59174804A JP4920383A JP4920383A JPS59174804A JP S59174804 A JPS59174804 A JP S59174804A JP 4920383 A JP4920383 A JP 4920383A JP 4920383 A JP4920383 A JP 4920383A JP S59174804 A JPS59174804 A JP S59174804A
Authority
JP
Japan
Prior art keywords
thin film
diffraction grating
substrate
metal thin
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4920383A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0456283B2 (enrdf_load_stackoverflow
Inventor
Shigeo Toda
戸田　重郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP4920383A priority Critical patent/JPS59174804A/ja
Publication of JPS59174804A publication Critical patent/JPS59174804A/ja
Publication of JPH0456283B2 publication Critical patent/JPH0456283B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP4920383A 1983-03-24 1983-03-24 回折格子の作製方法 Granted JPS59174804A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4920383A JPS59174804A (ja) 1983-03-24 1983-03-24 回折格子の作製方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4920383A JPS59174804A (ja) 1983-03-24 1983-03-24 回折格子の作製方法

Publications (2)

Publication Number Publication Date
JPS59174804A true JPS59174804A (ja) 1984-10-03
JPH0456283B2 JPH0456283B2 (enrdf_load_stackoverflow) 1992-09-08

Family

ID=12824429

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4920383A Granted JPS59174804A (ja) 1983-03-24 1983-03-24 回折格子の作製方法

Country Status (1)

Country Link
JP (1) JPS59174804A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01269002A (ja) * 1988-04-21 1989-10-26 Mitsutoyo Corp ２次元変位検出装置
JPH0615067U (ja) * 1993-05-21 1994-02-25 大日本印刷株式会社 レリーフホログラム
JP2002503505A (ja) * 1998-02-19 2002-02-05 マインドウェイブズ リミティド コンピュータ・プログラムにおいて個人の集中力を扱う方法
JP2006065306A (ja) * 2004-07-15 2006-03-09 Schott Ag パターン付き光学フィルタ層を基板上に作製する方法
US8818498B2 (en) 2009-01-19 2014-08-26 Panasonic Corporation Electroencephalogram interface system
US11467487B2 (en) * 2019-01-03 2022-10-11 Boe Technology Group Co., Ltd. Method for manufacturing template

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01269002A (ja) * 1988-04-21 1989-10-26 Mitsutoyo Corp ２次元変位検出装置
JPH0615067U (ja) * 1993-05-21 1994-02-25 大日本印刷株式会社 レリーフホログラム
JP2002503505A (ja) * 1998-02-19 2002-02-05 マインドウェイブズ リミティド コンピュータ・プログラムにおいて個人の集中力を扱う方法
JP2006065306A (ja) * 2004-07-15 2006-03-09 Schott Ag パターン付き光学フィルタ層を基板上に作製する方法
US7704683B2 (en) 2004-07-15 2010-04-27 Schott Ag Process for producing patterned optical filter layers on substrates
US8818498B2 (en) 2009-01-19 2014-08-26 Panasonic Corporation Electroencephalogram interface system
US11467487B2 (en) * 2019-01-03 2022-10-11 Boe Technology Group Co., Ltd. Method for manufacturing template

Also Published As

Publication number Publication date
JPH0456283B2 (enrdf_load_stackoverflow) 1992-09-08

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