JPS59171188A - 半導体レ−ザ素子 - Google Patents
半導体レ−ザ素子Info
- Publication number
- JPS59171188A JPS59171188A JP192184A JP192184A JPS59171188A JP S59171188 A JPS59171188 A JP S59171188A JP 192184 A JP192184 A JP 192184A JP 192184 A JP192184 A JP 192184A JP S59171188 A JPS59171188 A JP S59171188A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- light
- laser device
- semiconductor
- semiconductor laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/2205—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers
- H01S5/2218—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers having special optical properties
- H01S5/2219—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers having special optical properties absorbing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2231—Buried stripe structure with inner confining structure only between the active layer and the upper electrode
Landscapes
- Semiconductor Lasers (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP192184A JPS59171188A (ja) | 1984-01-11 | 1984-01-11 | 半導体レ−ザ素子 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP192184A JPS59171188A (ja) | 1984-01-11 | 1984-01-11 | 半導体レ−ザ素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59171188A true JPS59171188A (ja) | 1984-09-27 |
JPS6367350B2 JPS6367350B2 (enrdf_load_stackoverflow) | 1988-12-26 |
Family
ID=11515054
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP192184A Granted JPS59171188A (ja) | 1984-01-11 | 1984-01-11 | 半導体レ−ザ素子 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59171188A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6372173A (ja) * | 1986-09-16 | 1988-04-01 | Hitachi Ltd | 半導体レ−ザ装置 |
JPH08279652A (ja) * | 1996-05-31 | 1996-10-22 | Hitachi Ltd | 半導体レーザ装置 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE9114367U1 (de) * | 1991-11-18 | 1992-03-12 | Wissmann, Eberhard, 7450 Hechingen | Rückwärts-Einparkhilfe |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5228281A (en) * | 1975-08-28 | 1977-03-03 | Fujitsu Ltd | Light emitting semiconductor device |
-
1984
- 1984-01-11 JP JP192184A patent/JPS59171188A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5228281A (en) * | 1975-08-28 | 1977-03-03 | Fujitsu Ltd | Light emitting semiconductor device |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6372173A (ja) * | 1986-09-16 | 1988-04-01 | Hitachi Ltd | 半導体レ−ザ装置 |
US4800565A (en) * | 1986-09-16 | 1989-01-24 | Hitachi, Ltd. | Semiconductor laser device having high optical intensity and reliability |
JPH08279652A (ja) * | 1996-05-31 | 1996-10-22 | Hitachi Ltd | 半導体レーザ装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS6367350B2 (enrdf_load_stackoverflow) | 1988-12-26 |
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