JPS59165421A - 半導体装置の位置合わせマ−ク - Google Patents

半導体装置の位置合わせマ−ク

Info

Publication number
JPS59165421A
JPS59165421A JP58039852A JP3985283A JPS59165421A JP S59165421 A JPS59165421 A JP S59165421A JP 58039852 A JP58039852 A JP 58039852A JP 3985283 A JP3985283 A JP 3985283A JP S59165421 A JPS59165421 A JP S59165421A
Authority
JP
Japan
Prior art keywords
mark
epitaxial layer
marks
semiconductor substrate
growth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58039852A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6347329B2 (enrdf_load_stackoverflow
Inventor
Shoichi Sasaki
正一 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP58039852A priority Critical patent/JPS59165421A/ja
Publication of JPS59165421A publication Critical patent/JPS59165421A/ja
Publication of JPS6347329B2 publication Critical patent/JPS6347329B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58039852A 1983-03-10 1983-03-10 半導体装置の位置合わせマ−ク Granted JPS59165421A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58039852A JPS59165421A (ja) 1983-03-10 1983-03-10 半導体装置の位置合わせマ−ク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58039852A JPS59165421A (ja) 1983-03-10 1983-03-10 半導体装置の位置合わせマ−ク

Publications (2)

Publication Number Publication Date
JPS59165421A true JPS59165421A (ja) 1984-09-18
JPS6347329B2 JPS6347329B2 (enrdf_load_stackoverflow) 1988-09-21

Family

ID=12564492

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58039852A Granted JPS59165421A (ja) 1983-03-10 1983-03-10 半導体装置の位置合わせマ−ク

Country Status (1)

Country Link
JP (1) JPS59165421A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6260223A (ja) * 1985-09-09 1987-03-16 Seiko Epson Corp 半導体装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01283585A (ja) * 1988-05-11 1989-11-15 Hitachi Ltd 投射型デイスプレイ

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5491058A (en) * 1977-12-28 1979-07-19 Nec Corp Manufacture of semiconductor device
JPS568822A (en) * 1980-06-23 1981-01-29 Sanyo Electric Co Ltd Manufacture of semiconductor device
JPS5835923A (ja) * 1981-08-28 1983-03-02 Fujitsu Ltd マスク位置合わせ方法及びこれに用いる装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5491058A (en) * 1977-12-28 1979-07-19 Nec Corp Manufacture of semiconductor device
JPS568822A (en) * 1980-06-23 1981-01-29 Sanyo Electric Co Ltd Manufacture of semiconductor device
JPS5835923A (ja) * 1981-08-28 1983-03-02 Fujitsu Ltd マスク位置合わせ方法及びこれに用いる装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6260223A (ja) * 1985-09-09 1987-03-16 Seiko Epson Corp 半導体装置

Also Published As

Publication number Publication date
JPS6347329B2 (enrdf_load_stackoverflow) 1988-09-21

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