JPS5916333A - レジストの塗布方法 - Google Patents

レジストの塗布方法

Info

Publication number
JPS5916333A
JPS5916333A JP57126415A JP12641582A JPS5916333A JP S5916333 A JPS5916333 A JP S5916333A JP 57126415 A JP57126415 A JP 57126415A JP 12641582 A JP12641582 A JP 12641582A JP S5916333 A JPS5916333 A JP S5916333A
Authority
JP
Japan
Prior art keywords
substrate
film thickness
spinning
photoresist
rotated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57126415A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0345529B2 (enExample
Inventor
Koji Senda
耕司 千田
Norihisa Mino
規央 美濃
Shigenori Matsumoto
松本　茂則
Yoshimitsu Hiroshima
広島　義光
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp, Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electronics Corp
Priority to JP57126415A priority Critical patent/JPS5916333A/ja
Publication of JPS5916333A publication Critical patent/JPS5916333A/ja
Publication of JPH0345529B2 publication Critical patent/JPH0345529B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57126415A 1982-07-19 1982-07-19 レジストの塗布方法 Granted JPS5916333A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57126415A JPS5916333A (ja) 1982-07-19 1982-07-19 レジストの塗布方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57126415A JPS5916333A (ja) 1982-07-19 1982-07-19 レジストの塗布方法

Publications (2)

Publication Number Publication Date
JPS5916333A true JPS5916333A (ja) 1984-01-27
JPH0345529B2 JPH0345529B2 (enExample) 1991-07-11

Family

ID=14934596

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57126415A Granted JPS5916333A (ja) 1982-07-19 1982-07-19 レジストの塗布方法

Country Status (1)

Country Link
JP (1) JPS5916333A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6197923A (ja) * 1984-10-19 1986-05-16 Matsushita Electric Ind Co Ltd 半導体装置の製造方法
JPS6334925A (ja) * 1986-07-29 1988-02-15 Nec Corp フオトレジスト膜の形成方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101515510B1 (ko) * 2013-12-09 2015-04-27 전자부품연구원 태양광 모듈에 적층된 부유물 측정 시스템

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5226214A (en) * 1975-08-25 1977-02-26 Hitachi Ltd Method for coating resist

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5226214A (en) * 1975-08-25 1977-02-26 Hitachi Ltd Method for coating resist

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6197923A (ja) * 1984-10-19 1986-05-16 Matsushita Electric Ind Co Ltd 半導体装置の製造方法
JPS6334925A (ja) * 1986-07-29 1988-02-15 Nec Corp フオトレジスト膜の形成方法

Also Published As

Publication number Publication date
JPH0345529B2 (enExample) 1991-07-11

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