JPS59155852A - Electrophotographic sensitive body and its manufacture - Google Patents

Electrophotographic sensitive body and its manufacture

Info

Publication number
JPS59155852A
JPS59155852A JP2923583A JP2923583A JPS59155852A JP S59155852 A JPS59155852 A JP S59155852A JP 2923583 A JP2923583 A JP 2923583A JP 2923583 A JP2923583 A JP 2923583A JP S59155852 A JPS59155852 A JP S59155852A
Authority
JP
Japan
Prior art keywords
layer
alloy
photoreceptor
film thickness
sensitivity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2923583A
Other languages
Japanese (ja)
Inventor
Shigeharu Konuma
重春 小沼
Kunihiro Tamahashi
邦裕 玉橋
Akira Hosoya
細谷 明
Yasuki Mori
森 靖樹
Yasusada Morishita
森下 泰定
Shinichi Haruki
春木 愼一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koki Holdings Co Ltd
Hitachi Ltd
Original Assignee
Hitachi Ltd
Hitachi Koki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi Koki Co Ltd filed Critical Hitachi Ltd
Priority to JP2923583A priority Critical patent/JPS59155852A/en
Publication of JPS59155852A publication Critical patent/JPS59155852A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02Charge-receiving layers
    • G03G5/04Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/08Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photoreceptors In Electrophotography (AREA)

Abstract

PURPOSE:To improve reproducibility of electrophotographic characteristics, sensitivity to He-Ne laser beams, and heat resistance and to extend a life by making the alloy element concn. of the Te-contg. layer of an Se type photosensitive body almost constant in the film thickness direction. CONSTITUTION:The alloy element concn. of the Te-contg. layer (Te-Se alloy layer) 4 of an Se type photosensitive body formed on a conductive substrate 1 is made almost constant in the film thickness direction. The Se photosensitive body is obtained by laminating an Se layer 3 and the layer 4 successively on the substrate 1. The layer 4 is formed by vapor deposition at a temp. about 100 deg.C higher than that of the liquid phase line of the binary constitutional diagram. The layer 4 thus formed makes the content of Te constant in the film thickness direction, enhances glass transition point and heat resistance, and extends its life, and further, eliminates scattering of electrophotographic characteristics, and enhances reproducibility. Since the Te content has correlation with, e.g. sensitivity to He-Ne laser beams, the sensitivity can be held at the optimum value by controlling the Te content.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は電子写真感光体およびその製造方法に係り、特
にTeを含有するSeJm’に有する感光体において、
長波長高感度化とともに耐熱性に優れ、かつ長寿命全図
つた電子写真感光体およびその製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to an electrophotographic photoreceptor and a method for manufacturing the same, and particularly to a photoreceptor having SeJm' containing Te.
The present invention relates to an electrophotographic photoreceptor that has high sensitivity at long wavelengths, excellent heat resistance, and a long life, and a method for manufacturing the same.

〔従来技術〕[Prior art]

電子写真方式を利用したレーザビームプリンタ、複写機
等にはSe(セレン)を主体とした感光体が使用されて
いることは周知である。また、このような感光体が用い
られる装置の小型化、汎用化にともなって、光源に)(
e −N eレーザや半導体レーザが用いられ、前記感
光体はSeにTe(テルル)、As (砒素)等を添加
しその感度領域全長波長に拡張して用いられるようにな
った。さらに、前記感光体の作製にあっては、大量生産
などの観点から主として合金蒸発法による真空蒸着が用
いられている。
2. Description of the Related Art It is well known that photoreceptors mainly made of Se (selenium) are used in laser beam printers, copying machines, and the like that utilize electrophotography. In addition, as devices using such photoreceptors become smaller and more versatile, light sources () (
E-N e lasers and semiconductor lasers have been used, and the photoreceptor has come to be used by doping Se with Te (tellurium), As (arsenic), etc. to extend its sensitivity range to the full length wavelength. Further, in the production of the photoreceptor, vacuum evaporation using an alloy evaporation method is mainly used from the viewpoint of mass production.

しかし、合金暴発法においては合金元素の蒸気圧の差に
よシ、蒸4腹中の合金元素が著しい濃度勾配をもつ分布
となり、したがって蒸着の再現性が低く電子写真特性に
ばらつき等が生じていた。
However, in the alloy explosion method, due to the difference in vapor pressure of the alloying elements, the alloying elements in the vaporized material have a distribution with a significant concentration gradient, resulting in low reproducibility of vapor deposition and variations in electrophotographic properties. Ta.

一般には、5eJfiI上に合金元素の大きな濃度勾配
會もつ5e−Te合金層を有する膜構成の感光体、ある
いはさらにその上面にBe層又はSe合金層’(I−積
層した膜構成の感光体が用いられているが、いずれの場
合にも上述した欠点含有するものであった。また、特に
、前者にあってはその合金層膜厚のコントロールが困難
で所望組成の合金層が得られ難く、たとえ得られても再
現性の低いものであった。さらに電子写真特性のうち暗
減衰が大きいという欠点を有したものであった。また、
後者におっては、表面層側の耐熱性等に問題があシ、繰
り返し使用において感光体周辺の温度上昇によって熱的
不安定性が増加し、この結果、感光j−衣表面トナー等
により汚染され変化するいわゆるフィルミング等の発生
が生ずるものであった。
In general, a photoreceptor with a film structure having a 5e-Te alloy layer with a large concentration gradient of alloy elements on 5eJfiI, or a photoreceptor with a film structure in which a Be layer or Se alloy layer' (I-laminated) is further formed on the top surface. However, in both cases, they have the drawbacks mentioned above.In addition, in the former case in particular, it is difficult to control the thickness of the alloy layer, making it difficult to obtain an alloy layer with the desired composition. Even if obtained, the reproducibility was low.Furthermore, among the electrophotographic characteristics, it had the drawback of large dark decay.Also,
In the latter case, there are problems with heat resistance on the surface layer side, and thermal instability increases due to temperature rise around the photoreceptor during repeated use, resulting in contamination of the surface of the photoreceptor with toner, etc. This resulted in the occurrence of so-called filming or the like.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、Te含有層を有するBe感光体におい
て、前記Te含有量の合金元素濃度’t −走化するこ
とによって、電子写真特性の再現性が良好で、He−N
eレーザ等に高感度とな夛、シかも耐熱性に優れた長寿
命の電子写真感光体を提供するものである。
An object of the present invention is to provide a Be photoreceptor having a Te-containing layer with good reproducibility of electrophotographic properties by chemotacticing the alloying element concentration 't - of the Te content, and to improve He-N
The present invention provides an electrophotographic photoreceptor that is highly sensitive to e-lasers, etc., has excellent heat resistance, and has a long life.

〔発明の概要〕[Summary of the invention]

このような目的を達成するために、本発明は、Te含有
j藷の合金元素濃度を膜厚方向にほぼ一定化させること
とし、またその形成方法として、Te含有層はSe−’
1’e二元状態図における液相線以上から100C高い
温度範囲の加熱温度で蒸着するようにしたものである。
In order to achieve such an object, the present invention makes the alloying element concentration of the Te-containing layer almost constant in the film thickness direction, and as a method of forming it, the Te-containing layer is made of Se-'
The vapor deposition is performed at a heating temperature within a temperature range of 100 C higher than the liquidus line in the 1'e binary phase diagram.

以下、実施例を用いて本発明の詳細な説明する。Hereinafter, the present invention will be explained in detail using Examples.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明全実施例を用いて説明する。 Hereinafter, all embodiments of the present invention will be explained.

第1図は本発明による電子写真感光体およびその製造方
法の一実施例金示す説明図である。同図において、At
ドラム10表面が化学洗浄処理によって清浄にされ、5
bzSea層2が蒸着により形成されている。Atドラ
ム1として、JIS、A−6063・TE−T5  の
表面を鏡面に加工した外径261 M、内径250調、
長さ4’30+mのものを用いている。また8b2Se
sの蒸着は基板温度20C〜30Cとし、蒸着装置とし
ては、基板加熱および冷却設備を有する日本真空技術に
−Kmのマンドレル型Se#着装置を用いている。
FIG. 1 is an explanatory view showing an example of an electrophotographic photoreceptor and a method for manufacturing the same according to the present invention. In the same figure, At
The drum 10 surface is cleaned by a chemical cleaning treatment, and 5
A bzSea layer 2 is formed by vapor deposition. The At drum 1 has an outer diameter of 261 M, an inner diameter of 250 mm, and has a JIS, A-6063/TE-T5 surface processed to a mirror finish.
A length of 4'30+m is used. Also 8b2Se
The substrate temperature was 20 to 30 C for vapor deposition, and a -Km mandrel type Se# deposition apparatus manufactured by Japan Vacuum Technology Co., Ltd. and equipped with substrate heating and cooling equipment was used as the evaporation apparatus.

さらに、前記S bz S es層2の上面には順次B
e層3および5e−Te合金層4が蒸着されている。
Furthermore, B is sequentially formed on the upper surface of the S bz S es layer 2.
An e-layer 3 and a 5e-Te alloy layer 4 are deposited.

上記蒸着装置により蒸着されたもので、その蒸着温度は
基板温度を50C〜8(lに高めた状態にてなされてい
る。このうち、特にse−’re合金層4の形成は種々
組成の蒸発する3e−T6合金tマツク7.−/’7セ
7著、 Con5titution of13inar
y A110Y8 ;1958の5e−Te二元状態図
の液相線温度以上に加熱して蒸発させたものである。上
記8e−Te二元状態図は第2図に示している。この際
の加熱温度は、好ましくは液相側温度以上から100C
高い温度範囲までがよく、最適には液相線温度よ、92
0Cから50C高い温度が選択される。その理由は液相
線温度未満でBe−’1’e重合金加熱蒸発させると、
形成されるBe−’1’e蒸溜膜は膜中のTe濃度が一
定化しないし、また、液相線温度よシ100C高い温度
を超えると突沸現象が顕著となり、蒸着膜表面欠陥の発
生が大きくなるからである。
The material was deposited using the above-mentioned vapor deposition apparatus, and the vapor deposition temperature was raised to 50C to 8 (L). Among these, the formation of the SE-'RE alloy layer 4 was performed by evaporation of various compositions. 3e-T6 alloy t-mack 7.-/'7 SE7 author, Con5titution of13inar
y A110Y8; evaporated by heating above the liquidus temperature of the 5e-Te binary phase diagram of 1958. The above 8e-Te binary phase diagram is shown in FIG. The heating temperature at this time is preferably 100C above the liquidus side temperature.
High temperature range is best, optimally liquidus temperature, 92
A temperature 50C higher than 0C is selected. The reason is that when Be-'1'e heavy alloy is heated and evaporated below the liquidus temperature,
In the Be-'1'e distilled film that is formed, the Te concentration in the film is not constant, and when the temperature exceeds the liquidus temperature by 100C, the bumping phenomenon becomes noticeable and the surface defects of the deposited film are greatly generated. Because it will be.

以上のように形成した感光体の5e−I116合金層4
をイオン・マイクロ・アナライザ(日立製作所要、型式
IMA−5型)により定量分析を行なった結果、第3図
に示すように、蒸発合金の各組成のTe量と、形成され
だ5e−Te合合金−中の一定化部のIf eA度は直
線的な相関を示すことが判明している。
5e-I116 alloy layer 4 of the photoreceptor formed as above
As a result of quantitative analysis using an ion micro analyzer (manufactured by Hitachi, Model IMA-5), we found that the amount of Te in each composition of the evaporated alloy and the 5e-Te alloy formed were as shown in Figure 3. It has been found that the IfeA degree of the stabilizer in the alloy exhibits a linear correlation.

ちなみに、蒸発合金のTe量を25%とした場合加熱温
度を240tl:’、253t:、290Cの5e−T
e合金層の膜厚に対する5e−Te合金層中のTe量の
関係を調べると、第4図に示すようになることが判った
。特性、α、β、rはそれぞれ加熱温度であるボート温
度t240tT、 253C,290Cにした場合であ
る。この実験結果から判るように、加熱温度が253C
から290Cの範囲内であれば、3e−’l’e合金層
中のTe量は合金層方向にほぼ一定化していることが判
る。
By the way, when the amount of Te in the vaporized alloy is 25%, the heating temperature is 240tl:', 253t:, 5e-T of 290C.
When the relationship between the amount of Te in the 5e-Te alloy layer and the thickness of the e-alloy layer was investigated, it was found that the relationship is as shown in FIG. Characteristics α, β, and r are obtained when the boat temperatures, which are heating temperatures, are set to t240tT, 253C, and 290C, respectively. As can be seen from this experimental result, the heating temperature was 253C.
It can be seen that within the range from 290C to 290C, the amount of Te in the 3e-'l'e alloy layer is almost constant in the direction of the alloy layer.

さらに、第5図に示すように、5e−Te合金層の膜厚
を横軸に、合金層中のTe濃度を縦軸にとって、Tea
度の分布を調べると、自由面表面から特性A及び特性B
に示す如く膜厚に拘わらず、Te濃度はほとんど不変で
あり、その変動は分析精度を考慮しても±10%以内で
あることが各組成におて認められた。
Furthermore, as shown in FIG. 5, the thickness of the 5e-Te alloy layer is taken as the horizontal axis and the Te concentration in the alloy layer is taken as the vertical axis.
When examining the distribution of degrees, characteristic A and characteristic B are obtained from the free surface surface.
As shown in Fig. 2, it was observed that the Te concentration remained almost unchanged regardless of the film thickness, and the variation was within ±10% even considering the analysis accuracy for each composition.

△ ここで、He−Neレーザに対して5rnJ/m”前後
の感度を有するse−’l’e合金層のTe濃度20重
量%の感光体を用意して、−走化部の膜厚を変化させて
、5e−1:[Te合金層の膜厚変化に対する電荷保持
性(帯電5秒後の表面電位/帯電時の表面電位と定義)
を調べると、第6図に示すようになることが判明した。
△Here, a photoreceptor with a se-'l'e alloy layer having a Te concentration of 20% by weight, which has a sensitivity of about 5rnJ/m'' to a He-Ne laser, is prepared, and the film thickness of the chemotactic part is 5e-1: [Charge retention property against change in film thickness of Te alloy layer (defined as surface potential after 5 seconds of charging/surface potential during charging)
Upon investigation, it was found that the result was as shown in Figure 6.

けの図から電荷保持性は合金層膜厚が0.5未満、およ
び1oμmf超えると大きくなる。このため好ましい膜
厚は0.5μmから10μmの間の膜厚となるが、最適
には1μmから5μmの範囲が望ましい。
From the figure, the charge retention property increases when the thickness of the alloy layer is less than 0.5 μm and exceeds 1 μmf. For this reason, the preferred film thickness is between 0.5 μm and 10 μm, but the most desirable range is between 1 μm and 5 μm.

この範囲の最適膜厚のうち3.5μmからなるBe−’
I’e合金層膜厚の感光体を用意し、He−Neレーザ
光源を有するレーザビームプリンタに実装して印刷性能
全試験してみた結果、フィルミング等の発生がなく良好
な印字性を示し、かつ長寿命が達成されることが判った
。これは従来与られたような大きな濃度勾配をもっTe
含有層に比べて、−走化された濃度を有するTe含有層
はそのガラス化転移温度が高いことに原因することが示
差走査熱分析から明らかとなったものであシ、耐熱性が
向上したものである。
Be-' consisting of 3.5 μm of the optimum film thickness within this range
We prepared a photoreceptor with an I'e alloy layer thickness, mounted it on a laser beam printer equipped with a He-Ne laser light source, and conducted a full printing performance test. As a result, it showed good printing performance with no filming or the like. It was found that a long life can be achieved. This is because Te has a large concentration gradient as previously given.
Differential scanning calorimetry revealed that the Te-containing layer, which has a chemotactic concentration, has a higher vitrification transition temperature than the Te-containing layer, and has improved heat resistance. It is something.

さらに、5e−Te合金層におけるTe濃度が一定化す
ることにより、任意に所望の蒸着膜組成が得られるとと
もに、同一蒸発合金における蒸着膜中の組成の再現性に
優れるようになる。また、所望組成のSe−’I’e合
金層からなる多層構造にすることもでき、実験によると
、Se−’I”e蒸発合金に微量のsb、As、In等
の第3元素を添加しても蒸着膜中の合金化の一定化は変
わらないことが判明した。
Furthermore, by making the Te concentration in the 5e-Te alloy layer constant, any desired composition of the deposited film can be obtained, and the reproducibility of the composition in the deposited film of the same evaporated alloy becomes excellent. It is also possible to create a multilayer structure consisting of Se-'I'e alloy layers with a desired composition.According to experiments, a trace amount of a third element such as sb, As, or In is added to the Se-'I'e vaporized alloy. However, it was found that the constant alloying in the deposited film did not change.

上述した実施例では、5e−Te合金層中のTe量12
0W%としたものであるが、Tetはたとえば光源とし
てHe −N eレーザを用いた場合に、その感度と相
関的な関係にあることが判る。
In the example described above, the amount of Te in the 5e-Te alloy layer is 12
It is assumed that Tet is 0 W%, but it can be seen that Tet has a correlation with the sensitivity when a He--Ne laser is used as a light source, for example.

第7図は5e−Te合金属中のTe量に対するHe−N
eレーザ感度の関係を示すグラフである。
Figure 7 shows the amount of He-N versus Te in the 5e-Te alloy.
It is a graph showing the relationship between e-laser sensitivity.

He −N eレーザ感度を最適感度に保持したい場合
(0,13〜0.2m2/mJ )、S e −’T 
e合金層中のTetは17.5〜21W%の範囲内で選
択することができる。
If you want to maintain He-N e laser sensitivity at the optimum sensitivity (0.13 to 0.2 m2/mJ), S e-'T
Tet in the e-alloy layer can be selected within the range of 17.5 to 21 W%.

〔発明の、効果〕〔Effect of the invention〕

以上述べたことから明らかなように、本発明による電子
写真感光体およびその製造方法によればTe含有層を有
する長波長感度化されたBe系感元体の従来の短゛所を
改善し、優れた感光体を得ることができる。特に前記し
たように、感光体製造の再現性にすぐれ、一定組成の合
金層となることによってガラス化転移温度が上昇し、レ
ーザビームプリンタ実使用における耐フィルミング性、
耐熱性等が向下し長寿命の感光体が得られる。
As is clear from the above description, the electrophotographic photoreceptor and the method for manufacturing the same according to the present invention improve the conventional shortcomings of long-wavelength sensitive Be-based photoreceptors having a Te-containing layer. An excellent photoreceptor can be obtained. In particular, as mentioned above, the reproducibility of photoreceptor manufacturing is excellent, and the vitrification transition temperature is increased by forming an alloy layer with a constant composition, which improves the filming resistance in actual use of a laser beam printer.
A photoreceptor with improved heat resistance and long life can be obtained.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明による電子写真感光体およびその製造方
法の一実施例を示す図で、感光体の断面を示す構成図、
第2図はSe−’l’e二元状態図、第3図は蒸発合金
中のTe量に対する合金層の一定化部のTe濃度を示す
グラフ、第4図は加熱温度によるBe−’I’e合金層
の膜厚とSe−’l’e合金層中のTe量の関係を示す
グラフ、第5図は蒸発合金のT e 量< 25wt%
とした場合の合金層の膜厚と合金層中のTe濃度の関係
を示すグラフ、第6図は86720wt%Te合金層の
膜厚と電荷保持性の関係を示すグラフ、第7図はSe−
’l’e合金層中の’l’e−lとHe−Neレーザ感
度の関係を示すグラフである。 1−A tドラム、2 ・= 8bzSes層、3・・
・Se層、毛/図 第2図 ’Ee Te合*% ノH’j−(2μm)宅51¥] 弔」(2) Se−Te合’を層、yr 映f’+ (Pyn−)憎
q図 Se −7e 台ソ辻層中arTe%<uytiノ第1
頁の続き ■出 願 人 日立工機株式会社 東京都千代田区大手町2丁目6 番2号
FIG. 1 is a diagram showing an embodiment of an electrophotographic photoreceptor and a method for manufacturing the same according to the present invention, including a configuration diagram showing a cross section of the photoreceptor;
Fig. 2 is a Se-'l'e binary phase diagram, Fig. 3 is a graph showing the Te concentration in the constant part of the alloy layer against the amount of Te in the evaporated alloy, and Fig. 4 is a graph showing Be-'l'e depending on the heating temperature. A graph showing the relationship between the film thickness of the 'e alloy layer and the amount of Te in the Se-'l'e alloy layer.
Figure 6 is a graph showing the relationship between the thickness of the alloy layer and the Te concentration in the alloy layer when Se-
It is a graph showing the relationship between 'l'e-l in the 'l'e alloy layer and He-Ne laser sensitivity. 1-At drum, 2.=8bzSes layer, 3..
・Se layer, hair / Figure 2 'Ee Te combination *% ノH'j- (2μm) 51 yen] (2) Se-Te combination' layer, yr reflection f'+ (Pyn-) Hatq diagram Se -7e Taiso Tsuji layer middle arTe%< uyti no 1st
Continued on page ■ Applicant Hitachi Koki Co., Ltd. 2-6-2 Otemachi, Chiyoda-ku, Tokyo

Claims (1)

【特許請求の範囲】 1、導電基体上にTe含有層を有するBe系感光体にお
いて、前記Te含有層の合金元素濃度は膜厚方向にほぼ
一定化されていることを特徴とする電子写真感光体。 2、前記感光体は導電基体上にSeJmおよびSe−’
1’e合金層が順次積層された構成としfc特許請求の
範囲第1項記載の電子写真感光体。 3、導電基体上にTe含有1−を有するSe系感光体に
おいて、Te含有量はBe−’fe二元状態図。 における液相線以上から100C高い温度範囲の加熱温
度で蒸着形成することを特徴とする電子写真感光体の製
造方法。
[Scope of Claims] 1. An electrophotographic photosensitive member having a Te-containing layer on a conductive substrate, characterized in that the alloy element concentration of the Te-containing layer is approximately constant in the film thickness direction. body. 2. The photoreceptor has SeJm and Se-' on the conductive substrate.
An electrophotographic photoreceptor according to claim 1, having a structure in which 1'e alloy layers are sequentially laminated. 3. In the Se-based photoreceptor having Te-containing 1- on the conductive substrate, the Te content is a Be-'fe binary phase diagram. 1. A method for producing an electrophotographic photoreceptor, characterized in that vapor deposition is performed at a heating temperature in the range of 100C higher than the liquidus line.
JP2923583A 1983-02-25 1983-02-25 Electrophotographic sensitive body and its manufacture Pending JPS59155852A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2923583A JPS59155852A (en) 1983-02-25 1983-02-25 Electrophotographic sensitive body and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2923583A JPS59155852A (en) 1983-02-25 1983-02-25 Electrophotographic sensitive body and its manufacture

Publications (1)

Publication Number Publication Date
JPS59155852A true JPS59155852A (en) 1984-09-05

Family

ID=12270565

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2923583A Pending JPS59155852A (en) 1983-02-25 1983-02-25 Electrophotographic sensitive body and its manufacture

Country Status (1)

Country Link
JP (1) JPS59155852A (en)

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4843941A (en) * 1971-10-07 1973-06-25
JPS5093632A (en) * 1973-12-20 1975-07-25
JPS5184642A (en) * 1975-01-22 1976-07-24 Mitsubishi Electric Corp DENSHISHA SHINKANKOBAN
JPS5271241A (en) * 1975-12-11 1977-06-14 Ricoh Co Ltd Electrophotographic light sensitive material
JPS5674253A (en) * 1979-11-22 1981-06-19 Fuji Electric Co Ltd Photoreceptor for electrophotography
JPS56132349A (en) * 1980-02-05 1981-10-16 Int Standard Electric Corp Electrophotographic recording support and method of producing same
JPS5722245A (en) * 1980-07-15 1982-02-05 Fuji Electric Co Ltd Low fatigue electrophotographic receptor and its manufacture
JPS5779947A (en) * 1980-11-06 1982-05-19 Ricoh Co Ltd Photoreceptor for electrophotography
JPS57124355A (en) * 1981-01-24 1982-08-03 Ricoh Co Ltd Composite electrophotographic receptor
JPS57146257A (en) * 1981-03-04 1982-09-09 Ricoh Co Ltd Composite electrophotographic receptor
JPS5943867A (en) * 1982-09-04 1984-03-12 Konishiroku Photo Ind Co Ltd Vapor depositing method

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4843941A (en) * 1971-10-07 1973-06-25
JPS5093632A (en) * 1973-12-20 1975-07-25
JPS5184642A (en) * 1975-01-22 1976-07-24 Mitsubishi Electric Corp DENSHISHA SHINKANKOBAN
JPS5271241A (en) * 1975-12-11 1977-06-14 Ricoh Co Ltd Electrophotographic light sensitive material
JPS5674253A (en) * 1979-11-22 1981-06-19 Fuji Electric Co Ltd Photoreceptor for electrophotography
JPS56132349A (en) * 1980-02-05 1981-10-16 Int Standard Electric Corp Electrophotographic recording support and method of producing same
JPS5722245A (en) * 1980-07-15 1982-02-05 Fuji Electric Co Ltd Low fatigue electrophotographic receptor and its manufacture
JPS5779947A (en) * 1980-11-06 1982-05-19 Ricoh Co Ltd Photoreceptor for electrophotography
JPS57124355A (en) * 1981-01-24 1982-08-03 Ricoh Co Ltd Composite electrophotographic receptor
JPS57146257A (en) * 1981-03-04 1982-09-09 Ricoh Co Ltd Composite electrophotographic receptor
JPS5943867A (en) * 1982-09-04 1984-03-12 Konishiroku Photo Ind Co Ltd Vapor depositing method

Similar Documents

Publication Publication Date Title
US4842973A (en) Vacuum deposition of selenium alloy
JPS59155852A (en) Electrophotographic sensitive body and its manufacture
US4822712A (en) Reduction of selenium alloy fractionation
US4868077A (en) Layered photosensitive material for electrophotography comprising selenium, arsenic and tellurium
DE4135802C2 (en) Electrophotographic recording material
JPH0217021B2 (en)
JPS5842054A (en) Method for vapor depositing electrophotographic receptor
JP2574485B2 (en) Method for controlling crystallization of chalcogenide alloys
US6228545B1 (en) Electrophotographic selenium photoconductor
JPH06161137A (en) Manufacture of electrophotographic selenium photosensitive body
USRE35246E (en) Layed photosensitive material and electrophotography comprising selenium, arsenic and tellurium
JPH02171756A (en) Vacuum evaporation source container of photosensitive body for electrophotography
EP0337683A2 (en) Control of selenium alloy fractionation
JPH0372152B2 (en)
JPS61139663A (en) Formation of vapor-deposited film and evaporating source
US4476209A (en) Selenium-antimony alloy electrophotographic photoreceptors
JP2599950B2 (en) Photoconductor structure
JPH0260754B2 (en)
JPS5943868A (en) Vapor depositing method
US5075191A (en) Process for controlling alloy fractionation
JPS61269162A (en) Electrophotographic sensitive body
JPS5943866A (en) Vapor depositing method
JPS59176748A (en) Electrophotographic sensitive body
JPH0157898B2 (en)
JPS5872151A (en) Production for photoreceptor