JPS5872151A - Production for photoreceptor - Google Patents
Production for photoreceptorInfo
- Publication number
- JPS5872151A JPS5872151A JP16977581A JP16977581A JPS5872151A JP S5872151 A JPS5872151 A JP S5872151A JP 16977581 A JP16977581 A JP 16977581A JP 16977581 A JP16977581 A JP 16977581A JP S5872151 A JPS5872151 A JP S5872151A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- vapor
- photoreceptor
- alloy
- sete
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 108091008695 photoreceptors Proteins 0.000 title claims abstract description 21
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 13
- 239000000956 alloy Substances 0.000 claims abstract description 13
- 238000000151 deposition Methods 0.000 claims abstract description 5
- 239000011669 selenium Substances 0.000 claims description 25
- 229910052711 selenium Inorganic materials 0.000 claims description 13
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 10
- 229910052714 tellurium Inorganic materials 0.000 claims description 6
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims description 2
- 229910001215 Te alloy Inorganic materials 0.000 claims 1
- XSOKHXFFCGXDJZ-UHFFFAOYSA-N telluride(2-) Chemical compound [Te-2] XSOKHXFFCGXDJZ-UHFFFAOYSA-N 0.000 claims 1
- 230000035945 sensitivity Effects 0.000 abstract description 8
- 239000004065 semiconductor Substances 0.000 abstract description 5
- 239000000758 substrate Substances 0.000 abstract description 5
- 238000010438 heat treatment Methods 0.000 abstract description 4
- 238000009826 distribution Methods 0.000 abstract description 3
- 230000003287 optical effect Effects 0.000 abstract description 3
- 229910018219 SeTe Inorganic materials 0.000 abstract 5
- FESBVLZDDCQLFY-UHFFFAOYSA-N sete Chemical compound [Te]=[Se] FESBVLZDDCQLFY-UHFFFAOYSA-N 0.000 abstract 5
- 230000008016 vaporization Effects 0.000 abstract 1
- 238000009834 vaporization Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 12
- 238000010586 diagram Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 206010034972 Photosensitivity reaction Diseases 0.000 description 3
- 230000008030 elimination Effects 0.000 description 3
- 238000003379 elimination reaction Methods 0.000 description 3
- 230000036211 photosensitivity Effects 0.000 description 3
- 230000003068 static effect Effects 0.000 description 3
- 238000005275 alloying Methods 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 229940082569 selenite Drugs 0.000 description 1
- MCAHWIHFGHIESP-UHFFFAOYSA-L selenite(2-) Chemical compound [O-][Se]([O-])=O MCAHWIHFGHIESP-UHFFFAOYSA-L 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
- G03G5/08207—Selenium-based
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
Abstract
Description
【発明の詳細な説明】 本発明は半導体レーザなと長波長の光に対して。[Detailed description of the invention] The present invention applies to long wavelength light such as semiconductor lasers.
高感度でかつ光疲労のない安定な繰返し動作ができるS
e/5eTe積層感光体の形成方法に関する。S with high sensitivity and stable repetitive operation without optical fatigue
The present invention relates to a method of forming an e/5eTe laminated photoreceptor.
従来、長波長用の電子写真感光体として、高湊度にドー
プしたS e T e / S e積層感光体が提案さ
れておF)、5eTe合金層の形成法において、5eT
e合金を蒸発源とする方法と、SeとTeを別々の蒸発
源を用いて蒸着する方法とがある。まず。Conventionally, a highly doped S e Te / S e laminated photoreceptor has been proposed as an electrophotographic photoreceptor for long wavelengths.
There is a method in which an e-alloy is used as an evaporation source, and a method in which Se and Te are evaporated using separate evaporation sources. first.
5eTe 合金を用いる方法では、SeとTeの蒸気圧
が大きく異な99表面に近くなるに従ってTe過剰な状
態となる。このことによって、感光体として感度ムラ・
帯電性能の劣化などの原因になりやすい。また、Seと
Teを別々の蒸発源で蒸着する方法ではとくに高湊度ド
ープ層をつくる場合。In the method using a 5eTe alloy, the closer to the 99 surface, where the vapor pressures of Se and Te are significantly different, the more Te becomes excessive. This results in uneven sensitivity and
This can easily cause deterioration of charging performance. Furthermore, the method of depositing Se and Te using separate evaporation sources is particularly useful when forming a highly doped layer.
合金化するために基板加熱などの他の製造条件を非常に
厳密に抑えなければならず、少しの条件の変化によって
大巾に上記感光体特性が不安定になりやすい。In order to achieve alloying, other manufacturing conditions such as substrate heating must be controlled very strictly, and even a slight change in conditions tends to greatly destabilize the photoreceptor characteristics.
本発明の目的は、長波長光に対し高感度で、かつ帯電・
露先の電子写真プロセスの繰返しに対し。The object of the present invention is to have high sensitivity to long wavelength light, and to prevent charging and
For repeated electrophotographic process of dew point.
感度ムラをなくシ、帯電特性を安定化させるための5e
Te層を含む感光体の製造法に関する。5e to eliminate sensitivity unevenness and stabilize charging characteristics
The present invention relates to a method of manufacturing a photoreceptor including a Te layer.
以下図面を参照しながら本発明の好ましい実施例につい
て詳細に説明する。Preferred embodiments of the present invention will be described in detail below with reference to the drawings.
第1図は本発明の一実施例を説明するだめの図で、1は
ペルジャー、2は基台、3け排気用導管で図示しない排
気モータに接続される。4はホルダ、5はアルミニウム
(A/)基板、6は幕板加熱用ヒータ、7a、7bはボ
ードであって各々セレン(Se)、セレンテルル(Se
Te)合金が載置さ排気モータに求ジベルジャー1円の
空気が排気用導管3から排出され、ペルジャーl内が真
空状態になった時点で、ヒータ6fより60℃に加熱さ
れた状態にある基板5に、ボート7sKあるSeを加熱
して50μmの厚さに蒸着し、そのSe層の上に25w
t%Te濃度の5eTe合金をボート7即ち蒸発源温度
350℃で1μmの厚さに蒸着し、さらに5eTeを蒸
着しつつ同時にポートのSeを加熱して、Seを蒸着し
、Te濃度を10wtチまで低下せしめた層を1μm程
度設けた。FIG. 1 is a diagram for explaining one embodiment of the present invention, in which reference numeral 1 denotes a Pel jar, 2 a base, and a three-piece exhaust conduit connected to an exhaust motor (not shown). 4 is a holder, 5 is an aluminum (A/) substrate, 6 is a heater for heating the curtain plate, and 7a and 7b are boards made of selenium (Se) and selenite (Se), respectively.
Te) When the alloy is placed on the Pel jar and the exhaust motor is required to discharge 1 yen of air from the exhaust conduit 3, and the inside of the Pel jar is in a vacuum state, the substrate is heated to 60°C by the heater 6f. In step 5, 7 sK of Se was heated in a boat and evaporated to a thickness of 50 μm, and 25 W of Se was deposited on top of the Se layer.
A 5eTe alloy with a Te concentration of t%Te is deposited to a thickness of 1 μm at a boat 7, that is, an evaporation source temperature of 350°C, and 5eTe is deposited while simultaneously heating Se at the port to deposit Se, and the Te concentration is reduced to 10wt%. A layer with a thickness of about 1 μm was provided.
こうして得られた5eTe/Se&層体を恒温槽で70
℃30分間熱処理することによって感光体とした。。The thus obtained 5eTe/Se&layer body was heated to 70°C in a constant temperature bath.
A photoreceptor was prepared by heat-treating at ℃ for 30 minutes. .
このようにして得た感光体を第2図に示すようにドラム
状にしてこの感光体ドラムを用いて9通常の電子写真プ
ロセスによりその感光特性の変化を調べた。The thus obtained photoreceptor was shaped into a drum as shown in FIG. 2, and the photoreceptor drum was used to examine changes in its photosensitive characteristics through a normal electrophotographic process.
第2図において、T1ti帯電器、Lは露光部であって
半導体レーザ光源、又は可視光である複写光の光源を有
する。Kは感光体ドラムの表面電位を測る電位計、Gは
現像器wT2は転写コロトロン、PFi、記録紙9Mは
除電ランプ+Tsは除電用ACコロナ帯電器、Cはクリ
ーナである。In FIG. 2, the T1ti charger L is an exposure section and has a semiconductor laser light source or a light source of visible light for copying light. K is an electrometer for measuring the surface potential of the photosensitive drum, G is a developing device wT2 is a transfer corotron, PFi, recording paper 9M is a static elimination lamp + Ts is an AC corona charger for static elimination, and C is a cleaner.
で感光ドラム表面の露光部及び非露光部の電位を測定す
る。Measure the potentials of the exposed and non-exposed areas of the photosensitive drum surface.
その後現像器Gにより現像を行ない、そのトナー像を記
録紙に転写する。そして感光体ドラム表面に残留するト
ナーの電荷、および感光体ドラム表面電荷を除去するた
め、除電ランプM及びACコロナ帯電器Tsでその残留
電荷を中和し、クリーナCで残留トナーを除去する。そ
して再び前述の一様帯電工程を開始する。半導体レーザ
として波長780關のレーザビームを用いた場合、配録
エネルギーは2μm/d!であシ、記録紙10万枚詭
へのM録を行なったが第3図に実軸で示すように光感度
の変化はなく、(破線は前述の従来の製法により得た感
光体を用いた場合の光感度特性である。)また感光体ド
ラム表面における電位の変化はなかった。Thereafter, development is performed by a developing device G, and the toner image is transferred onto recording paper. In order to remove the toner charge remaining on the surface of the photoreceptor drum and the surface charge of the photoreceptor drum, the residual charge is neutralized by the static elimination lamp M and the AC corona charger Ts, and the residual toner is removed by the cleaner C. Then, the uniform charging process described above is started again. When a laser beam with a wavelength of about 780 is used as a semiconductor laser, the distribution energy is 2 μm/d! I then performed M recording on 100,000 sheets of recording paper, but as shown in the real axis in Figure 3, there was no change in photosensitivity. (This is the photosensitivity characteristic when the photoreceptor drum was used.) Furthermore, there was no change in the potential on the surface of the photoreceptor drum.
このように感光体の特性が改善された理由は。What is the reason for this improvement in the characteristics of the photoreceptor?
下地Se層上に5eTe層のみをまづ形成し、高濃度に
テルル(Te)をドープした5eTe 層を形成して半
導体レーザ等の光波長光に対して高い感度を有する感光
層を得1次いでこの感光層上に5eTe合金とSeを同
時に蒸着することにより。First, only a 5eTe layer is formed on the underlying Se layer, and then a 5eTe layer doped with tellurium (Te) at a high concentration is formed to obtain a photosensitive layer having high sensitivity to light at wavelengths e.g. from a semiconductor laser. By simultaneously depositing 5eTe alloy and Se on this photosensitive layer.
Te濃度を低減せしめて、前述の光疲労を抑えるととも
に、過剰のTeに基因する帯電電荷保持能力の低下を防
止するようにしたためである。This is because the Te concentration is reduced to suppress the above-mentioned optical fatigue and to prevent a decrease in charge retention ability due to excessive Te.
なお、この5eTe )−上にSe層を形成することに
感光体表面の耐耗性を向上せしめることができる。Note that by forming a Se layer on this 5eTe (5eTe) layer, the wear resistance of the photoreceptor surface can be improved.
本発明によればeTeの分布が均一となり、かつ感光体
表面層では低濃度となっているため、1)感度ムラがな
くなる。2)帯電性能が向上する。According to the present invention, the distribution of eTe is uniform and the concentration is low in the surface layer of the photoreceptor, so that 1) sensitivity unevenness is eliminated; 2) Charging performance is improved.
3)光疲労がなくなる。4)耐摩耗性が向上する。3) Eliminates light fatigue. 4) Improved wear resistance.
などの効果がある。There are effects such as
第1図は9本発明の一実施例構成図、第2図電子写真プ
ロセスを説明する図、第3図は感光体の光感度特性を示
す図である。
1:ベルジャー、4:ホルダ、5:基板。
6:ヒータ+ 7a、 7b :ボート。FIG. 1 is a block diagram of an embodiment of the present invention, FIG. 2 is a diagram explaining an electrophotographic process, and FIG. 3 is a diagram showing the photosensitivity characteristics of a photoreceptor. 1: bell jar, 4: holder, 5: board. 6: Heater + 7a, 7b: Boat.
Claims (2)
れたセレンテルル(SeTe)合金層を有する感光体の
製造法において、前記下地セレン層を形成する工程後、
5eTe合金層を所定の層厚になるまで形成し9次いで
、該5eTe合金層上にセレンおよびセレンテルル合金
を同時に蒸着するようにしたことを特徴とr する感光体の製造法。(1) In a method for manufacturing a photoconductor having a selenium (Se) base layer and a selenium tellurium (SeTe) alloy layer formed on the selenium layer, after the step of forming the base selenium layer,
A method for producing a photoreceptor, characterized in that a 5eTe alloy layer is formed to a predetermined thickness, and then selenium and a selenium tellurium alloy are simultaneously vapor-deposited on the 5eTe alloy layer.
する工程後、セレン蒸着層を形成することを特徴とする
特許請求の範囲!(1)項に記載の感光体の製造法。(2) A selenium vapor deposited layer is formed after the step of simultaneously vapor depositing selenium and selenium telluride alloy! A method for producing a photoreceptor according to item (1).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16977581A JPS5872151A (en) | 1981-10-23 | 1981-10-23 | Production for photoreceptor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16977581A JPS5872151A (en) | 1981-10-23 | 1981-10-23 | Production for photoreceptor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5872151A true JPS5872151A (en) | 1983-04-30 |
Family
ID=15892624
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16977581A Pending JPS5872151A (en) | 1981-10-23 | 1981-10-23 | Production for photoreceptor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5872151A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4904559A (en) * | 1988-10-24 | 1990-02-27 | Xerox Corporation | Processes for suppressing the fractionation of chalcogenide alloys |
KR100601332B1 (en) | 2004-06-10 | 2006-07-13 | 박병주 | Organic semiconducting device, method and apparatus for producing the same |
-
1981
- 1981-10-23 JP JP16977581A patent/JPS5872151A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4904559A (en) * | 1988-10-24 | 1990-02-27 | Xerox Corporation | Processes for suppressing the fractionation of chalcogenide alloys |
KR100601332B1 (en) | 2004-06-10 | 2006-07-13 | 박병주 | Organic semiconducting device, method and apparatus for producing the same |
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