JPS59154452A - 軟ｘ線転写用マスク及びその製造法 - Google Patents

軟ｘ線転写用マスク及びその製造法

Info

Publication number
JPS59154452A
JPS59154452A JP58027333A JP2733383A JPS59154452A JP S59154452 A JPS59154452 A JP S59154452A JP 58027333 A JP58027333 A JP 58027333A JP 2733383 A JP2733383 A JP 2733383A JP S59154452 A JPS59154452 A JP S59154452A
Authority
JP
Japan
Prior art keywords
film
soft
ray
silicon dioxide
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58027333A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0423819B2 (en, 2012
Inventor
Yukio Iimura
飯村　幸夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP58027333A priority Critical patent/JPS59154452A/ja
Publication of JPS59154452A publication Critical patent/JPS59154452A/ja
Publication of JPH0423819B2 publication Critical patent/JPH0423819B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58027333A 1983-02-21 1983-02-21 軟ｘ線転写用マスク及びその製造法 Granted JPS59154452A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58027333A JPS59154452A (ja) 1983-02-21 1983-02-21 軟ｘ線転写用マスク及びその製造法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58027333A JPS59154452A (ja) 1983-02-21 1983-02-21 軟ｘ線転写用マスク及びその製造法

Publications (2)

Publication Number Publication Date
JPS59154452A true JPS59154452A (ja) 1984-09-03
JPH0423819B2 JPH0423819B2 (en, 2012) 1992-04-23

Family

ID=12218136

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58027333A Granted JPS59154452A (ja) 1983-02-21 1983-02-21 軟ｘ線転写用マスク及びその製造法

Country Status (1)

Country Link
JP (1) JPS59154452A (en, 2012)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6220310A (ja) * 1985-07-19 1987-01-28 Nippon Telegr & Teleph Corp <Ntt> Ｘ線マスク
US4712446A (en) * 1985-08-09 1987-12-15 Nissan Shatai Company, Limited Anti-vibration structure of a steering arrangement
EP1089128A3 (en) * 1999-09-30 2001-05-02 Kabushiki Kaisha Toshiba Exposure mask, exposure mask manufacturing method, and semiconductor device manufacturing method using exposure mask
WO2000075727A3 (en) * 1999-06-07 2001-05-17 Univ California Coatings on reflective mask substrates

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6220310A (ja) * 1985-07-19 1987-01-28 Nippon Telegr & Teleph Corp <Ntt> Ｘ線マスク
US4712446A (en) * 1985-08-09 1987-12-15 Nissan Shatai Company, Limited Anti-vibration structure of a steering arrangement
WO2000075727A3 (en) * 1999-06-07 2001-05-17 Univ California Coatings on reflective mask substrates
US6352803B1 (en) 1999-06-07 2002-03-05 The Regents Of The University Of California Coatings on reflective mask substrates
KR100805360B1 (ko) * 1999-06-07 2008-02-20 더 리전트 오브 더 유니버시티 오브 캘리포니아 코팅층을 갖는 반사 마스크 기판
EP1089128A3 (en) * 1999-09-30 2001-05-02 Kabushiki Kaisha Toshiba Exposure mask, exposure mask manufacturing method, and semiconductor device manufacturing method using exposure mask
US6381300B1 (en) 1999-09-30 2002-04-30 Kabushiki Kaisha Toshiba Exposure mask, exposure mask manufacturing method, and semiconductor device manufacturing method using exposure mask

Also Published As

Publication number Publication date
JPH0423819B2 (en, 2012) 1992-04-23

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