JPS59152625A - 異物検出装置 - Google Patents

異物検出装置

Info

Publication number
JPS59152625A
JPS59152625A JP58026155A JP2615583A JPS59152625A JP S59152625 A JPS59152625 A JP S59152625A JP 58026155 A JP58026155 A JP 58026155A JP 2615583 A JP2615583 A JP 2615583A JP S59152625 A JPS59152625 A JP S59152625A
Authority
JP
Japan
Prior art keywords
substrate
foreign matter
foreign
slit
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58026155A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0334576B2 (https=
Inventor
Yukio Uto
幸雄 宇都
Mitsuyoshi Koizumi
小泉　光義
Masataka Shiba
正孝 芝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58026155A priority Critical patent/JPS59152625A/ja
Publication of JPS59152625A publication Critical patent/JPS59152625A/ja
Publication of JPH0334576B2 publication Critical patent/JPH0334576B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP58026155A 1983-02-21 1983-02-21 異物検出装置 Granted JPS59152625A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58026155A JPS59152625A (ja) 1983-02-21 1983-02-21 異物検出装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58026155A JPS59152625A (ja) 1983-02-21 1983-02-21 異物検出装置

Publications (2)

Publication Number Publication Date
JPS59152625A true JPS59152625A (ja) 1984-08-31
JPH0334576B2 JPH0334576B2 (https=) 1991-05-23

Family

ID=12185642

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58026155A Granted JPS59152625A (ja) 1983-02-21 1983-02-21 異物検出装置

Country Status (1)

Country Link
JP (1) JPS59152625A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5331396A (en) * 1991-10-08 1994-07-19 Matsushita Electric Industrial Co., Ltd. Foreign matter detection device
JP2015111161A (ja) * 2015-03-17 2015-06-18 大日本印刷株式会社 異物検査装置、異物検査方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5671173A (en) * 1979-11-14 1981-06-13 Hitachi Ltd Pattern detection method of printed circuit substrate
JPS5780546A (en) * 1980-11-07 1982-05-20 Nippon Kogaku Kk <Nikon> Detecting device for foreign substance

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5671173A (en) * 1979-11-14 1981-06-13 Hitachi Ltd Pattern detection method of printed circuit substrate
JPS5780546A (en) * 1980-11-07 1982-05-20 Nippon Kogaku Kk <Nikon> Detecting device for foreign substance

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5331396A (en) * 1991-10-08 1994-07-19 Matsushita Electric Industrial Co., Ltd. Foreign matter detection device
JP2015111161A (ja) * 2015-03-17 2015-06-18 大日本印刷株式会社 異物検査装置、異物検査方法

Also Published As

Publication number Publication date
JPH0334576B2 (https=) 1991-05-23

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