JPS59136131A - スパツタリング装置 - Google Patents
スパツタリング装置Info
- Publication number
- JPS59136131A JPS59136131A JP896883A JP896883A JPS59136131A JP S59136131 A JPS59136131 A JP S59136131A JP 896883 A JP896883 A JP 896883A JP 896883 A JP896883 A JP 896883A JP S59136131 A JPS59136131 A JP S59136131A
- Authority
- JP
- Japan
- Prior art keywords
- target
- substrate
- sputtering
- film
- anode electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP896883A JPS59136131A (ja) | 1983-01-21 | 1983-01-21 | スパツタリング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP896883A JPS59136131A (ja) | 1983-01-21 | 1983-01-21 | スパツタリング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59136131A true JPS59136131A (ja) | 1984-08-04 |
| JPS634450B2 JPS634450B2 (enrdf_load_stackoverflow) | 1988-01-29 |
Family
ID=11707478
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP896883A Granted JPS59136131A (ja) | 1983-01-21 | 1983-01-21 | スパツタリング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59136131A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0375321U (enrdf_load_stackoverflow) * | 1989-11-24 | 1991-07-29 |
-
1983
- 1983-01-21 JP JP896883A patent/JPS59136131A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS634450B2 (enrdf_load_stackoverflow) | 1988-01-29 |
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