JPS59132128A - レジストパタ−ンの形成方法及び装置 - Google Patents

レジストパタ−ンの形成方法及び装置

Info

Publication number
JPS59132128A
JPS59132128A JP587783A JP587783A JPS59132128A JP S59132128 A JPS59132128 A JP S59132128A JP 587783 A JP587783 A JP 587783A JP 587783 A JP587783 A JP 587783A JP S59132128 A JPS59132128 A JP S59132128A
Authority
JP
Japan
Prior art keywords
resist
substrate
resist pattern
forming
cooling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP587783A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0142624B2 (en, 2012
Inventor
Yoshihide Kato
加藤　芳秀
Kinya Usuda
臼田　欣也
Kei Kirita
桐田　慶
Toshiaki Shinozaki
篠崎　俊昭
Nobuji Tsuchiya
土屋　宜司
Fumiaki Shigemitsu
重光　文明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP587783A priority Critical patent/JPS59132128A/ja
Priority to KR1019840000153A priority patent/KR860002082B1/ko
Priority to DE88102726T priority patent/DE3486187T2/de
Priority to EP88102726A priority patent/EP0275126B1/en
Priority to DE8484300297T priority patent/DE3478060D1/de
Priority to EP84300297A priority patent/EP0114126B1/en
Publication of JPS59132128A publication Critical patent/JPS59132128A/ja
Priority to US06/789,366 priority patent/US4717645A/en
Priority to US07/108,767 priority patent/US4897337A/en
Publication of JPH0142624B2 publication Critical patent/JPH0142624B2/ja
Priority to US07/441,479 priority patent/US5051338A/en
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP587783A 1983-01-19 1983-01-19 レジストパタ−ンの形成方法及び装置 Granted JPS59132128A (ja)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP587783A JPS59132128A (ja) 1983-01-19 1983-01-19 レジストパタ−ンの形成方法及び装置
KR1019840000153A KR860002082B1 (ko) 1983-01-19 1984-01-16 레지스트 패턴의 형성 방법 및 장치
EP84300297A EP0114126B1 (en) 1983-01-19 1984-01-18 Method for forming resist pattern
EP88102726A EP0275126B1 (en) 1983-01-19 1984-01-18 Method and apparatus for forming resist pattern
DE8484300297T DE3478060D1 (en) 1983-01-19 1984-01-18 Method for forming resist pattern
DE88102726T DE3486187T2 (de) 1983-01-19 1984-01-18 Verfahren und Vorrichtung zur Herstellung von Schutzlackbildern.
US06/789,366 US4717645A (en) 1983-01-19 1985-10-22 Method and apparatus for forming resist pattern
US07/108,767 US4897337A (en) 1983-01-19 1987-10-15 Method and apparatus for forming resist pattern
US07/441,479 US5051338A (en) 1983-01-19 1989-11-27 Method and apparatus for forming resist pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP587783A JPS59132128A (ja) 1983-01-19 1983-01-19 レジストパタ−ンの形成方法及び装置

Publications (2)

Publication Number Publication Date
JPS59132128A true JPS59132128A (ja) 1984-07-30
JPH0142624B2 JPH0142624B2 (en, 2012) 1989-09-13

Family

ID=11623137

Family Applications (1)

Application Number Title Priority Date Filing Date
JP587783A Granted JPS59132128A (ja) 1983-01-19 1983-01-19 レジストパタ−ンの形成方法及び装置

Country Status (1)

Country Link
JP (1) JPS59132128A (en, 2012)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4840874A (en) * 1986-09-25 1989-06-20 Kabushiki Kaisha Toshiba Method of forming resist pattern
JPH0250163A (ja) * 1988-05-09 1990-02-20 Mitsubishi Electric Corp パターン形成方法
JPH0250165A (ja) * 1988-05-09 1990-02-20 Mitsubishi Electric Corp パターン形成方法
JPH0341926U (en, 2012) * 1989-08-31 1991-04-22

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4840874A (en) * 1986-09-25 1989-06-20 Kabushiki Kaisha Toshiba Method of forming resist pattern
JPH0250163A (ja) * 1988-05-09 1990-02-20 Mitsubishi Electric Corp パターン形成方法
JPH0250165A (ja) * 1988-05-09 1990-02-20 Mitsubishi Electric Corp パターン形成方法
JPH0341926U (en, 2012) * 1989-08-31 1991-04-22

Also Published As

Publication number Publication date
JPH0142624B2 (en, 2012) 1989-09-13

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