JPS59125727A - 光重合性樹脂組成物 - Google Patents

光重合性樹脂組成物

Info

Publication number
JPS59125727A
JPS59125727A JP88683A JP88683A JPS59125727A JP S59125727 A JPS59125727 A JP S59125727A JP 88683 A JP88683 A JP 88683A JP 88683 A JP88683 A JP 88683A JP S59125727 A JPS59125727 A JP S59125727A
Authority
JP
Japan
Prior art keywords
resin composition
photoresist
composition
photopolymerizable resin
meth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP88683A
Other languages
English (en)
Japanese (ja)
Other versions
JPH047500B2 (enrdf_load_stackoverflow
Inventor
Hiroyuki Uchida
内田 広幸
Jun Nakauchi
純 中内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Rayon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Rayon Co Ltd
Priority to JP88683A priority Critical patent/JPS59125727A/ja
Publication of JPS59125727A publication Critical patent/JPS59125727A/ja
Publication of JPH047500B2 publication Critical patent/JPH047500B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/085Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0073Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Graft Or Block Polymers (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Polymerisation Methods In General (AREA)
JP88683A 1983-01-07 1983-01-07 光重合性樹脂組成物 Granted JPS59125727A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP88683A JPS59125727A (ja) 1983-01-07 1983-01-07 光重合性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP88683A JPS59125727A (ja) 1983-01-07 1983-01-07 光重合性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS59125727A true JPS59125727A (ja) 1984-07-20
JPH047500B2 JPH047500B2 (enrdf_load_stackoverflow) 1992-02-12

Family

ID=11486152

Family Applications (1)

Application Number Title Priority Date Filing Date
JP88683A Granted JPS59125727A (ja) 1983-01-07 1983-01-07 光重合性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS59125727A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH047500B2 (enrdf_load_stackoverflow) 1992-02-12

Similar Documents

Publication Publication Date Title
JPS60214354A (ja) 光重合性樹脂組成物
JPS58144824A (ja) フォトレジスト製品
JP4645776B2 (ja) 感光性樹脂組成物、並びにこれを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造法
KR930007506B1 (ko) 방사선 중합가능한 혼합물
US4629679A (en) Tetrazole compound-containing photopolymerizable resin composition
JP2007286477A (ja) 感光性樹脂組成物、これを用いた感光性エレメント及びプリント配線板の製造方法
JPS59125726A (ja) 光重合性樹脂組成物
JP4240282B2 (ja) 感光性樹脂組成物これを用いた感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法
JP2719799B2 (ja) 感光性樹脂組成物
JPS59125727A (ja) 光重合性樹脂組成物
KR0140880B1 (ko) 조사선중합성조성물및이로부터제조되는감조사선성기록재료
JP3859934B2 (ja) 感光性樹脂組成物、感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法
JPH01263645A (ja) 光重合性組成物
JPS59125728A (ja) 光重合性樹脂組成物
JP4002658B2 (ja) レジストパターン形成方法
JP4033423B2 (ja) 光重合性樹脂組成物及び積層体
JP2005221743A (ja) 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法
JP3939402B2 (ja) レジストパターン形成方法
JP2008102257A (ja) 感光性樹脂組成物これを用いた感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法
JP4529289B2 (ja) 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法
JPH04371957A (ja) フォトレジストフィルム
JPH0269753A (ja) 光重合性樹脂組成物
KR20030012071A (ko) 자외선 경화성 수지 조성물
KR0140055B1 (ko) 감광성 수지조성물
US5182187A (en) Radiation-polymerizable composition and recording material prepared from this composition