JPS59113624A - インライン型露光装置 - Google Patents

インライン型露光装置

Info

Publication number
JPS59113624A
JPS59113624A JP57224278A JP22427882A JPS59113624A JP S59113624 A JPS59113624 A JP S59113624A JP 57224278 A JP57224278 A JP 57224278A JP 22427882 A JP22427882 A JP 22427882A JP S59113624 A JPS59113624 A JP S59113624A
Authority
JP
Japan
Prior art keywords
mask
substrate
printed
exposure
masks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57224278A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6330777B2 (sv
Inventor
Kenichi Oku
健一 奥
Masaki Suzuki
正樹 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP57224278A priority Critical patent/JPS59113624A/ja
Publication of JPS59113624A publication Critical patent/JPS59113624A/ja
Publication of JPS6330777B2 publication Critical patent/JPS6330777B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Pile Receivers (AREA)
  • Sheets, Magazines, And Separation Thereof (AREA)
JP57224278A 1982-12-20 1982-12-20 インライン型露光装置 Granted JPS59113624A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57224278A JPS59113624A (ja) 1982-12-20 1982-12-20 インライン型露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57224278A JPS59113624A (ja) 1982-12-20 1982-12-20 インライン型露光装置

Publications (2)

Publication Number Publication Date
JPS59113624A true JPS59113624A (ja) 1984-06-30
JPS6330777B2 JPS6330777B2 (sv) 1988-06-21

Family

ID=16811264

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57224278A Granted JPS59113624A (ja) 1982-12-20 1982-12-20 インライン型露光装置

Country Status (1)

Country Link
JP (1) JPS59113624A (sv)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61177726A (ja) * 1985-02-01 1986-08-09 Hitachi Ltd 半導体用露光装置
EP0266760A2 (en) * 1986-11-05 1988-05-11 Svg Lithography Systems, Inc. High speed reticle change system
JP2003015308A (ja) * 2001-06-28 2003-01-17 Dainippon Printing Co Ltd 露光装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61177726A (ja) * 1985-02-01 1986-08-09 Hitachi Ltd 半導体用露光装置
EP0266760A2 (en) * 1986-11-05 1988-05-11 Svg Lithography Systems, Inc. High speed reticle change system
JP2003015308A (ja) * 2001-06-28 2003-01-17 Dainippon Printing Co Ltd 露光装置

Also Published As

Publication number Publication date
JPS6330777B2 (sv) 1988-06-21

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