JPS59113624A - In-line type exposing device - Google Patents

Abstract

PURPOSE:To obtain the small-sized device, through which masks are exchanged automatically, by carrying a substrate to be baked in the direction parallel with a mask carrying means and baking a circuit pattern for exposure printed on the mask to the substrate to be baked. CONSTITUTION:The masks 8 are fed to a mask conveyor belt 10 from a mask supply means 11, carried up to an exposing section 9, and fixed to the exposing section 9. The substrates to be baked 7 are fed to a substrate conveyor belt 13 from a substrate supply means 14, and carried up to the exposing section 9. The substrates are positioned with the masks 8 in the exposing section 9 and exposed. Exposure is completed, and the substrates to be baked 7 are carried by the substrate conveyor belt 13, and encased in a substrate encasing means 15. On the other hand, the masks 8 are carried by the mask conveyor belt 10, and encased in a mask encasing means 12.

Description

DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to an in-line exposure apparatus that automatically exchanges masks used for exposing semiconductors and circuit boards.

Structure of the conventional example and its problems In the conventional in-line exposure apparatus, as shown in the concrete structure in FIG. transported. In the exposure section 4, the substrate 3 to be printed is aligned with the mask 6, and then exposed. After the exposure is completed, the substrate 3 to be printed is transported by the substrate transport section 2 and stored in the substrate storage section 6.

However, the above-mentioned configuration has the disadvantage that there is no automatic exchange function for the mask 6, and therefore the mask must be exchanged manually, making it difficult to save labor.

OBJECTS OF THE INVENTION In view of the above-mentioned drawbacks, the present invention provides a compact in-line exposure apparatus that automatically exchanges masks.

Structure of the Invention The present invention comprises a mask transport means for linearly transporting a mask printed with an exposure circuit button, and a mask transport means located below the mask transport means, for transporting a substrate to be printed in a direction parallel to the mask transport means. A substrate transporting means for transporting, an exposure means located on the mask transporting means and the substrate transporting means and printing an exposure circuit stamp printed on the mask onto the substrate to be printed, and an exposure means for printing onto the substrate to be printed; A small exposure apparatus is provided, which is composed of a mask supply means for supplying masks while descending, and a mask storage means for storing masks while ascending sequentially from below the mask transport means, and in which masks can be replaced automatically. This is what we provide.

DESCRIPTION OF EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.

FIG. 2 shows a perspective view of an in-line exposure apparatus in a first embodiment of the present invention. In Figure 2, 7
81 is a substrate to be printed; 81 is a mask on which an exposure circuit button is printed; 9 is a mask on which the substrate 7 to be printed and the mask 8 are aligned; The exposed area to be printed, 10 is the mask 8 mentioned above.
11 is a mask supplying means for supplying the mask 8 to the mask conveying belt 10 while descending sequentially from above; 12 is a mask conveying belt 1;
A mask storage means 13 for storing the masks 8 while ascending sequentially from below 0 is located below the mask transport means 10, and transports the substrate 7 to be printed in a direction parallel to the mask transport belt 1o. A substrate conveyance belt 14 is a substrate supply means for supplying the substrate 7 to be printed to the substrate conveyance belt 3 while descending from above sequentially; 16 is a means for storing the substrate 7 to be baked while being ascended sequentially from below the substrate conveyance belt 13; It is a board storage means.

The operation of the in-line exposure apparatus configured as described above will be described below. First, the mask supply means 11
The mask 8 is supplied to the mask conveying belt 10 from the mask conveying belt 10, conveyed to the exposure section 9, and fixed to the exposure section 9. Next, the substrate 7 to be printed is supplied from the substrate supply means 14 to the substrate conveyance belt 13 and conveyed to the exposure section 9, where it is aligned with the mask 8 and exposed.

After the exposure is completed, the substrate 7 to be printed is transported by the substrate transport belt 13 and stored in the substrate storage means 15.

On the other hand, the mask 8 is transported by a mask transport belt 10 and stored in a mask storage means 12.

Next, the positional relationship between the substrate conveyance belt and the mask conveyance belt will be explained based on FIG. 3.

In FIG. 3, 7a is a substrate to be printed, 8a is a mask, 1
3a is a substrate conveyance belt, 10a is a mask conveyance belt, 1
6 is a mask conveyance belt drive motor, and 17 is a substrate conveyance belt drive motor. The mask 8a and the substrate to be printed 7a are conveyed in parallel directions, but because of the substrate conveyance belt, the mask 8a and the substrate to be printed do not come into contact during the conveyance.

Next, the structure of the mask supply means will be explained.

In FIG. 4, 7b is a substrate to be printed, 8b is a mask, 13b is a substrate conveyance belt 10b is a mask conveyance belt, 11b is a mask supply means, and 18 is a pair of protrusions provided inside the mask supply means 11a from both sides. . The pair of protrusions 18
The distance between them is larger than the width of the mask conveying belt 1ob. New mask 8b is mask transport bell) 10
When the mask supply means 11a is lowered and the protrusion 18 comes to the position of the mask conveyance belt 10b, the mask 8b rides on the mask conveyance belt 1ob and is conveyed. At this time, since the distance between the pair of projections 18 is greater than the width of the mask conveyance belt 10b, the mask supply means 11a and the mask conveyance belt 1ob do not come into contact with each other. It's a trench.
The means for storing the mask has a similar structure, but in this case, when the mask is transported, the mask storing means rises one step at a time to store the mask.

As described above, this embodiment includes a mask conveying belt 10 that conveys the mask 8 in an i-line manner, and a substrate to be printed that is located below the mask conveying belt 10 and extends in a direction parallel to the mask conveying belt 10. 7, an exposure means 9 for printing the exposure circuit pattern printed on the mask 8 onto the substrate 7 to be printed, and a substrate conveying belt 13 that conveys the mask 8 while sequentially descending from above to the mask conveying belt 10. and the mask conveying belt 1.
By providing the mask storage means 12 that stores the masks 8 while ascending sequentially from below 0, the masks can be replaced automatically. In addition, in this example,
The mask conveyance belt 10 and the substrate conveyance belt 13 may each be an air conveyor or the like.

Also, when incorporating exposure equipment into a series of processes,
The substrate supply means 14 and the substrate storage means 16 are removed, the substrate conveyance belt 13 is extended, and the previous process is connected to the belt by the belt.
It is also possible to construct a structure in which the substrate is transported to the exposure section 9 by the substrate transport belt 13, and after the exposure is completed, the silver is directly transported to the subsequent process by the substrate transport belt 13.

Effects of the Invention As described above, the present invention includes a mask conveying means for linearly conveying a mask printed with an exposure circuit button, and a mask conveying means located below the mask conveying means in a direction parallel to the mask conveying means. a substrate transport means for transporting the substrate to be printed; an exposure means located on the mask transport means and the substrate transport means for printing an exposure circuit button printed on the mask onto the board to be printed; Masks can be exchanged automatically by providing a mask supply means for supplying masks to the transport means while descending from above, and a mask storage means for storing masks while ascending sequentially from below the mask transport means. This provides a compact exposure device.

[Brief explanation of the drawing]

FIG. 1 is a perspective view of a conventional in-line exposure apparatus, FIG. 2 is a perspective view of an in-line exposure apparatus according to embodiments of the present invention, FIG. 3 is a perspective view of a substrate conveyance belt and a mask conveyance belt, and FIG. The figure is a sectional view of the mask supply means. 1...Substrate supply means, 2...Substrate transport means, 3...Substrate to be printed, 4...Exposure section, 6...Mask, 6... Board storage means,
7. Completed a, 7b...Substrate to be baked, 8.8a, 8b
...Mask, 9...Exposure area, 10.1
0a, 10b...Mask conveyor belt, 11゜1
18 Yamanaka mask supply means, 12...mask storage means, 13, 13a, 13b... curved substrate conveyance belt, 1
4... Substrate supply means, 15... Substrate storage means, 16... Mask conveyance belt drive motor, 17...
...Substrate conveyor belt drive motor, 18...
protrusion.

Claims (1)

[Claims] a mask transport means for linearly transporting a mask printed with an exposure button; a substrate transport means provided below the mask transport means for transporting a substrate to be printed in a direction parallel to the mask transport means; , a fog light means provided on the crotch of the mask transport means and the substrate transporter for burning an exposure button printed on the mask onto the substrate to be printed;
An in-line exposure apparatus comprising: a mask supply means for supplying the mask to the mask transport means while descending sequentially from above; and a mask storage means for storing the mask while ascending sequentially from below the mask transport means.