JPS6330777B2 - - Google Patents

Info

Publication number
JPS6330777B2
JPS6330777B2 JP57224278A JP22427882A JPS6330777B2 JP S6330777 B2 JPS6330777 B2 JP S6330777B2 JP 57224278 A JP57224278 A JP 57224278A JP 22427882 A JP22427882 A JP 22427882A JP S6330777 B2 JPS6330777 B2 JP S6330777B2
Authority
JP
Japan
Prior art keywords
mask
substrate
printed
exposure
belt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57224278A
Other languages
Japanese (ja)
Other versions
JPS59113624A (en
Inventor
Kenichi Oku
Masaki Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP57224278A priority Critical patent/JPS59113624A/en
Publication of JPS59113624A publication Critical patent/JPS59113624A/en
Publication of JPS6330777B2 publication Critical patent/JPS6330777B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70733Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741Handling masks outside exposure position, e.g. reticle libraries
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Pile Receivers (AREA)
  • Sheets, Magazines, And Separation Thereof (AREA)

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、半導体や回路基板の露光に使用する
マスクを自動的に交換するインライン型露光装置
に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to an in-line exposure apparatus that automatically exchanges masks used for exposing semiconductors and circuit boards.

従来例の構成とその問題点 従来のインライン型露光装置は、第1図にその
具体構成を示すように、基板供給部1から基板搬
送部2へ被焼付基板3が供給され、露光部4へ搬
送される。露光部4で、被焼付基板3はマスク5
との間で位置合わせが行なわれ、次いで露光が行
なわれる。露光が終了後、被焼付基板3は基板搬
送部2により搬送され、基板収納部6へ収納され
るというような構成となつていた。
Configuration of Conventional Example and Its Problems In the conventional in-line exposure apparatus, as shown in the concrete configuration in FIG. transported. In the exposure section 4, the substrate 3 to be printed is covered with a mask 5.
Positioning is performed between the two, and then exposure is performed. After the exposure is completed, the substrate 3 to be printed is transported by the substrate transport section 2 and stored in the substrate storage section 6.

しかしながら、上記のような構成では、マスク
5の自動交換機能がないので、マスクの交換は人
手によつて行なわなければならないため省力化が
計りにくいという欠点を有していた。
However, in the above configuration, since there is no automatic exchange function for the mask 5, the mask must be exchanged manually, which has the disadvantage that it is difficult to save labor.

発明の目的 本発明は上記欠点に鑑み、マスクの交換を自動
的に行なう小型のインライン型露光装置を提供す
るものである。
OBJECTS OF THE INVENTION In view of the above-mentioned drawbacks, the present invention provides a small in-line type exposure apparatus that automatically exchanges masks.

発明の構成 本発明は、露光用回路パタンが印刷されたマス
クを直線的に搬送するマスク搬送手段と、上記マ
スク搬送手段の下方に位置し、前記マスク搬送手
段と平行な方向に被焼付基板を搬送する基板搬送
手段と、前記マスク搬送手段及び前記基板搬送手
段上に位置し、前記マスクに印刷された露光用回
路パタンを上記被焼付基板に焼き付ける露光手段
と、前記基板搬送手段をまたいで昇降しかつ前記
マスク搬送手段に上方から順次下降しながらマス
クを供給するマスク供給手段と、前記基板搬送手
段をまたいで昇降し、かつ前記マスク搬送手段の
下方から順次上昇しながらマスクを収納するマス
ク収納手段とを構成されておりマスクの交換が自
動的に行なえる小型の露光装置を提供するもので
ある。
Composition of the Invention The present invention includes a mask transporting means for linearly transporting a mask on which an exposure circuit pattern is printed, and a substrate to be printed that is located below the mask transporting means and in a direction parallel to the mask transporting means. A substrate conveyance means for conveying, an exposure means located on the mask conveyance means and the substrate conveyance means and for burning an exposure circuit pattern printed on the mask onto the substrate to be printed, and a device that moves up and down across the substrate conveyance means. and a mask supply means for supplying the mask to the mask transport means while descending sequentially from above, and a mask storage that moves up and down across the substrate transport means and stores the masks while ascending sequentially from below the mask transport means. The purpose of the present invention is to provide a small-sized exposure apparatus that is configured with means and that can automatically exchange masks.

実施例の説明 以下本発明の一実施例について図面を参照しな
がら説明する。
DESCRIPTION OF EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.

第2図は本発明の第一の実施例におけるインラ
イン型露光装置の斜視図を示すものである。第2
図において、7は被焼付基板、8は露光用回路パ
タンが印刷されたマスク、9は上記被焼付基板7
と上記マスク8を位置合わせし、上記マスク8に
印刷された露光用回路パタンを上記被焼付基板7
に焼きつける露光部、10は上記マスク8を搬送
するマスク搬送ベルト、11は上記マスク搬送ベ
ルト10に上方から順次下降しながら上記マスク
8を供給するマスク供給手段、12は上記マスク
搬送ベルト10の下方から順次上昇しながらマス
ク8を収納するマスク収納手段、13は上記マス
ク搬送手段10の下方に位置し、上記マスク搬送
ベルト10と平行な方向に上記被焼付基板7を搬
送する基板搬送ベルト、14は上記被焼付基板7
を上方から順次下降しながら基板搬送ベルト3に
供給する基板供給手段、15は上記基板搬送ベル
ト13の下方から順次上昇しながら被焼付基板7
を収納する基板収納手段である。
FIG. 2 shows a perspective view of an in-line type exposure apparatus in a first embodiment of the present invention. Second
In the figure, 7 is a substrate to be printed, 8 is a mask on which an exposure circuit pattern is printed, and 9 is the substrate 7 to be printed.
and the mask 8, and place the exposure circuit pattern printed on the mask 8 on the substrate 7 to be printed.
10 is a mask conveyor belt that conveys the mask 8; 11 is a mask supply means that supplies the mask 8 to the mask conveyor belt 10 while descending from above; 12 is a lower part of the mask conveyor belt 10; a mask storage means 13 for storing the masks 8 while ascending sequentially from the mask transport means 10; a substrate transport belt 14 for transporting the substrate 7 to be printed in a direction parallel to the mask transport belt 10; is the above-mentioned board 7 to be baked.
A substrate supply means 15 supplies the substrate to be printed 7 to the substrate conveyance belt 3 while sequentially descending from above;
This is a board storage means for storing.

以上のように構成されたインライン型露光装置
について以下にその動作を説明する。まず、マス
ク供給手段11からマスク搬送ベルト10にマス
ク8が供給され、露光部9まで搬送されて、露光
部9に固定される。次に基板供給手段14から被
焼付基板7が基板搬送ベルト13に供給され、露
光部9まで搬送され、露光部9で上記マスク8と
の間で位置合わせが行なわれ露光が行なわれる。
露光完了後、被焼付基板7は基板搬送ベルト13
により搬送され、基板収納手段15に収納され
る。一方マスク8はマスク搬送ベルト10により
搬送されマスク収納手段12に収納される。
The operation of the in-line exposure apparatus configured as described above will be described below. First, the mask 8 is supplied from the mask supply means 11 to the mask conveying belt 10, conveyed to the exposure section 9, and fixed thereon. Next, the substrate 7 to be printed is supplied from the substrate supply means 14 to the substrate conveyance belt 13 and conveyed to the exposure section 9, where it is aligned with the mask 8 and exposed.
After the exposure is completed, the substrate 7 to be printed is transferred to the substrate conveyor belt 13.
and stored in the substrate storage means 15. On the other hand, the mask 8 is transported by a mask transport belt 10 and stored in a mask storage means 12.

次に基板搬送ベルトとマスク搬送ベルトの位置
関係を第3図に基づいて説明する。
Next, the positional relationship between the substrate conveyance belt and the mask conveyance belt will be explained based on FIG. 3.

第3図において、7aは被焼付基板、8aはマ
スク、13aは基板搬送ベルト、10aはマスク
搬送ベルト、16はマスク搬送ベルト駆動モーー
タ、17は基板搬送ベルト駆動モータである。マ
スク8aと被焼付基板7aは平行な方向に搬送さ
れるが、基板搬送ベルト13aの方が下方を通つ
ているためマスク8aと被焼付基板は搬送途中で
接触することはない。
In FIG. 3, 7a is a substrate to be printed, 8a is a mask, 13a is a substrate conveyance belt, 10a is a mask conveyance belt, 16 is a mask conveyance belt drive motor, and 17 is a substrate conveyance belt drive motor. The mask 8a and the substrate to be printed 7a are transported in parallel directions, but since the substrate transport belt 13a passes below, the mask 8a and the substrate to be printed do not come into contact during transport.

次にマスク供給手段の構造について説明する。
第4図で7bは被焼付基板、8bはマスク、13
bは基板搬送ベルト10bはマスク搬送ベルト、
11bはマスク供給手段、18はマスク供給手段
11aの内側に両方から設けられた一対の突起で
ある。上記一対の突起18間の距離は、マスク搬
送ベルト10bの幅よりも大きくなつている。新
しいマスク8bがマスク搬送ベルト10bに供給
されるときには、マスク供給手段11aが下降し
突起18がマスク搬送ベルト10bの位置にきた
とき、マスク8bは、マスク搬送ベルト10bに
乗り、搬送される。このとき1対の突起18間の
距離はマスク搬送ベルト10bの幅よりも大きい
ため、マスク供給手段11aとマスク搬送ベルト
10bは接触しない。また、マスクを収納する手
段も同様の構造であるが、この場合マスクが搬送
されてくると、マスク収納手段が一段ずつ上昇し
てマスクを収納する。
Next, the structure of the mask supply means will be explained.
In Fig. 4, 7b is the substrate to be printed, 8b is the mask, 13
b is a substrate conveyance belt 10b is a mask conveyance belt,
11b is a mask supply means, and 18 is a pair of protrusions provided inside the mask supply means 11a from both sides. The distance between the pair of protrusions 18 is greater than the width of the mask conveying belt 10b. When a new mask 8b is supplied to the mask conveying belt 10b, when the mask supply means 11a is lowered and the protrusion 18 comes to the position of the mask conveying belt 10b, the mask 8b rides on the mask conveying belt 10b and is conveyed. At this time, since the distance between the pair of protrusions 18 is greater than the width of the mask conveyance belt 10b, the mask supply means 11a and the mask conveyance belt 10b do not come into contact with each other. Further, the means for storing the mask has a similar structure, but in this case, when the mask is transported, the mask storing means rises step by step to store the mask.

以上のように本実施例によれば、マスク8を直
線的に搬送するマスク搬送ベルト10と、上記マ
スク搬送ベルト10の下方に位置し、上記マスク
搬送ベルト10と平行な方向に被焼付基板7を搬
送する基板搬送ベルト13と、上記マスク8に印
刷された露光用回路パタンを上記被焼付基板7に
焼きつける露光手段9と、上記基板搬送ベルト1
3をまたいで昇降し、かつ上記マスク搬送ベルト
10に上方から順次下降しながらマスク8を供給
するマスク供給手段11と、上記基板搬送ベルト
13をまたいで昇降し、かつ上記マスク搬送ベル
ト10の下方から順次上昇しながらマスク8を収
納するマスク収納手段12を設けることにより、
マスクの交換を自動的に行なうことができる。な
お、本実施例において、マスク搬送ベルト10、
基板搬送ベルト13はそれぞれエアーコンベアな
どにしてもよい。
As described above, according to this embodiment, the mask conveying belt 10 linearly conveys the mask 8, and the substrate 7 to be printed is located below the mask conveying belt 10 and extends in a direction parallel to the mask conveying belt 10. a substrate conveyance belt 13 that conveys the substrate, an exposure means 9 that burns the exposure circuit pattern printed on the mask 8 onto the substrate 7 to be printed, and the substrate conveyance belt 1.
a mask supply means 11 that ascends and descends across the substrate transport belt 13 and supplies the mask 8 while sequentially descending from above to the mask transport belt 10; By providing a mask storage means 12 that stores the mask 8 while rising sequentially from the
Masks can be replaced automatically. Note that in this embodiment, the mask conveying belt 10,
Each of the substrate conveyance belts 13 may be an air conveyor or the like.

また一連の工程の中に露光装置を組み込む場合
には、基板供給手段14及び基板収納手段15を
取り除き、基板搬送ベルト13を延長しベルトに
より前工程を連結し、前工程を終えた被焼付基板
7が基板搬送ベルト13により露光部9へ搬送さ
れ露光完了後、基板搬送ベルト13により後工程
へ直接搬送されるというような構成も可能であ
る。
In addition, when incorporating an exposure device into a series of processes, the substrate supply means 14 and the substrate storage means 15 are removed, the substrate conveyance belt 13 is extended and the previous process is connected by the belt, and the substrate to be printed after the previous process is A configuration is also possible in which the substrate 7 is transported to the exposure section 9 by the substrate transport belt 13, and after the exposure is completed, it is directly transported by the substrate transport belt 13 to a subsequent process.

発明の効果 以上のように本発明は、露光用回路パタンが印
刷されたマスクを直接的に搬送するマスク搬送手
段と、上記マスク搬送手段の下方に位置し上記マ
スク搬送手段と平行な方向に被焼付基板を搬送す
る基板搬送手段と、上記マスク搬送手段及び上記
基板搬送手段上に位置し、上記マスクに印刷され
た露光用回路パタンを上記被焼付基板に焼きつけ
る露光手段と、上記基板搬送手段をまたいで昇降
し、かつ上記マスク搬送手段に上方から順次下降
しながらマスクを供給するマスク供給手段と、上
記基板搬送手段をまたいで昇降し、かつ上記マス
ク搬送手段の下方から順次上昇しながらマスクを
収納するマスク搬送手段とを備えることにより、
自動的にマスクを交換できる小型の露光装置を提
供するものである。
Effects of the Invention As described above, the present invention includes a mask transporting means that directly transports a mask on which an exposure circuit pattern is printed, and a mask transporting means that is located below the mask transporting means and is mounted in a direction parallel to the mask transporting means. a substrate conveying means for conveying the printed substrate; an exposure means located on the mask conveying means and the substrate conveying means for burning an exposure circuit pattern printed on the mask onto the printed substrate; and the substrate conveying means. A mask supply means that ascends and descends astride the substrate transport means and supplies the mask to the mask transport means while sequentially descending from above; By providing a means for transporting the mask to be stored,
The purpose of the present invention is to provide a compact exposure device that can automatically exchange masks.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来のインライン型露光装置の斜視
図、第2図は本発明の一実施例におけるインライ
ン型露光装置の斜視図、第3図は基板搬送ベルト
とマスク搬送ベルトの斜視図、第4図はマスク供
給手段の断面図である。 1……基板供給手段、2……基板搬送手段、3
……被焼付基板、4……露光部、5……マスク、
6……基板収納手段、7,7a,7b……被焼付
基板、8,8a,8b……マスク、9……露光
部、10,10a,10b……マスク搬送ベル
ト、11,11a……マスク供給手段、12……
マスク収納手段、13,13a,13b……基板
搬送ベルト、14……基板供給手段、15……基
板収納手段、16……マスク搬送ベルト駆動モー
タ、17……基板搬送ベルト駆動モータ、18…
…突起。
FIG. 1 is a perspective view of a conventional in-line exposure apparatus, FIG. 2 is a perspective view of an in-line exposure apparatus according to an embodiment of the present invention, FIG. 3 is a perspective view of a substrate conveyance belt and a mask conveyance belt, and FIG. The figure is a sectional view of the mask supply means. 1...Substrate supply means, 2...Substrate transport means, 3
...Substrate to be printed, 4...Exposure section, 5...Mask,
6...Substrate storage means, 7, 7a, 7b...Substrate to be printed, 8, 8a, 8b...Mask, 9...Exposure section, 10, 10a, 10b...Mask transport belt, 11, 11a...Mask Supply means, 12...
Mask storage means, 13, 13a, 13b...Substrate conveyance belt, 14...Substrate supply means, 15...Substrate storage means, 16...Mask conveyance belt drive motor, 17...Substrate conveyance belt drive motor, 18...
…protrusion.

Claims (1)

【特許請求の範囲】[Claims] 1 露光用パタンが印刷されたマスクを直線的に
搬送するマスク搬送手段と、このマスク搬送手段
の下方に設けられ、前記マスク搬送手段と平行な
方向に被焼付基板を搬送する基板搬送手段と、前
記マスク搬送手段及び前記基板搬送手段上に設け
られ、前記マスクに印刷された露光用パタンを前
記被焼付基板に焼き付ける露光手段と、前記基板
搬送手段をまたいで昇降し、かつ前記マスク搬送
手段に上方から順次下降しながらマスクを供給す
るマスク供給手段と、前記基板搬送手段をまたい
で昇降し、かつ前記マスク搬送手段の下方から順
次上昇しながらマスクを収納するマスク収納手段
とを備えたインライン型露光装置。
1. A mask transport means for linearly transporting a mask on which an exposure pattern is printed; a substrate transport means provided below the mask transport means for transporting a substrate to be printed in a direction parallel to the mask transport means; an exposure means that is provided on the mask transport means and the substrate transport means and prints the exposure pattern printed on the mask onto the substrate to be printed; In-line type, comprising: a mask supply means that supplies masks while descending from above, and a mask storage means that moves up and down across the substrate transport means and stores masks while ascending sequentially from below the mask transport means. Exposure equipment.
JP57224278A 1982-12-20 1982-12-20 In-line type exposing device Granted JPS59113624A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57224278A JPS59113624A (en) 1982-12-20 1982-12-20 In-line type exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57224278A JPS59113624A (en) 1982-12-20 1982-12-20 In-line type exposing device

Publications (2)

Publication Number Publication Date
JPS59113624A JPS59113624A (en) 1984-06-30
JPS6330777B2 true JPS6330777B2 (en) 1988-06-21

Family

ID=16811264

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57224278A Granted JPS59113624A (en) 1982-12-20 1982-12-20 In-line type exposing device

Country Status (1)

Country Link
JP (1) JPS59113624A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0638389B2 (en) * 1985-02-01 1994-05-18 株式会社日立製作所 Exposure equipment for semiconductors
US4760429A (en) * 1986-11-05 1988-07-26 The Perkin-Elmer Corporation High speed reticle change system
JP4910252B2 (en) * 2001-06-28 2012-04-04 大日本印刷株式会社 Exposure equipment

Also Published As

Publication number Publication date
JPS59113624A (en) 1984-06-30

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