JPS5911096B2 - 樹脂凸版用感光性組成物 - Google Patents

樹脂凸版用感光性組成物

Info

Publication number
JPS5911096B2
JPS5911096B2 JP49025492A JP2549274A JPS5911096B2 JP S5911096 B2 JPS5911096 B2 JP S5911096B2 JP 49025492 A JP49025492 A JP 49025492A JP 2549274 A JP2549274 A JP 2549274A JP S5911096 B2 JPS5911096 B2 JP S5911096B2
Authority
JP
Japan
Prior art keywords
weight
photosensitive composition
group
general formula
copolymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP49025492A
Other languages
English (en)
Japanese (ja)
Other versions
JPS50122301A (enrdf_load_stackoverflow
Inventor
信行 喜多
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP49025492A priority Critical patent/JPS5911096B2/ja
Priority to DE19752509842 priority patent/DE2509842A1/de
Publication of JPS50122301A publication Critical patent/JPS50122301A/ja
Publication of JPS5911096B2 publication Critical patent/JPS5911096B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • C08F265/06—Polymerisation of acrylate or methacrylate esters on to polymers thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP49025492A 1974-03-06 1974-03-06 樹脂凸版用感光性組成物 Expired JPS5911096B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP49025492A JPS5911096B2 (ja) 1974-03-06 1974-03-06 樹脂凸版用感光性組成物
DE19752509842 DE2509842A1 (de) 1974-03-06 1975-03-06 Lichtempfindliche masse

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP49025492A JPS5911096B2 (ja) 1974-03-06 1974-03-06 樹脂凸版用感光性組成物

Publications (2)

Publication Number Publication Date
JPS50122301A JPS50122301A (enrdf_load_stackoverflow) 1975-09-25
JPS5911096B2 true JPS5911096B2 (ja) 1984-03-13

Family

ID=12167543

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49025492A Expired JPS5911096B2 (ja) 1974-03-06 1974-03-06 樹脂凸版用感光性組成物

Country Status (2)

Country Link
JP (1) JPS5911096B2 (enrdf_load_stackoverflow)
DE (1) DE2509842A1 (enrdf_load_stackoverflow)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2822190A1 (de) * 1978-05-20 1979-11-22 Hoechst Ag Photopolymerisierbares gemisch
JPS5647411A (en) * 1979-09-28 1981-04-30 Nippon Oil & Fats Co Ltd Polymer of polyoxyalkylene glycol monoacrylate or monomethacrylate and lubricant, antistatic and cosmetic agent therefrom
JPS6042469A (ja) * 1983-08-16 1985-03-06 Mitsubishi Rayon Co Ltd 光硬化型防錆用被覆組成物
DE3329443A1 (de) * 1983-08-16 1985-03-07 Hoechst Ag, 6230 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes kopiermaterial
DE3504254A1 (de) * 1985-02-08 1986-08-14 Basf Ag, 6700 Ludwigshafen Lichtempfindliches aufzeichnungselement
EP0211406A3 (de) * 1985-08-02 1988-08-17 Hoechst Celanese Corporation Photopolymerisierbares Gemisch mit Polyvinylacetal als Bindemittel und daraus hergestelltes Aufzeichnungsmaterial
DE3619130A1 (de) * 1986-06-06 1987-12-10 Basf Ag Lichtempfindliches aufzeichnungselement
DE4022980C1 (enrdf_load_stackoverflow) * 1990-07-19 1991-08-08 Du Pont De Nemours (Deutschland) Gmbh, 6380 Bad Homburg, De
EP0628180B1 (en) * 1992-02-24 1998-09-16 E.I. Du Pont De Nemours And Company Pliable, aqueous processable, photoimageable permanent coatings for printed circuits
JP7335123B2 (ja) * 2019-10-07 2023-08-29 株式会社日本触媒 樹脂組成物、硬化性組成物、塗膜付き物品、塗膜付き物品の製造方法、コーティング剤及び積層塗膜付き基材の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4713083Y1 (enrdf_load_stackoverflow) * 1967-04-17 1972-05-13
JPS4826487Y1 (enrdf_load_stackoverflow) * 1968-12-31 1973-08-02

Also Published As

Publication number Publication date
JPS50122301A (enrdf_load_stackoverflow) 1975-09-25
DE2509842A1 (de) 1975-09-11

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