JPS59107516A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS59107516A
JPS59107516A JP21796282A JP21796282A JPS59107516A JP S59107516 A JPS59107516 A JP S59107516A JP 21796282 A JP21796282 A JP 21796282A JP 21796282 A JP21796282 A JP 21796282A JP S59107516 A JPS59107516 A JP S59107516A
Authority
JP
Japan
Prior art keywords
photoresist
layer
constituting
plasma etching
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21796282A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0410211B2 (enrdf_load_stackoverflow
Inventor
Toshiyuki Abumizuka
鐙塚　敏之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP21796282A priority Critical patent/JPS59107516A/ja
Publication of JPS59107516A publication Critical patent/JPS59107516A/ja
Publication of JPH0410211B2 publication Critical patent/JPH0410211B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP21796282A 1982-12-13 1982-12-13 半導体装置の製造方法 Granted JPS59107516A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21796282A JPS59107516A (ja) 1982-12-13 1982-12-13 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21796282A JPS59107516A (ja) 1982-12-13 1982-12-13 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS59107516A true JPS59107516A (ja) 1984-06-21
JPH0410211B2 JPH0410211B2 (enrdf_load_stackoverflow) 1992-02-24

Family

ID=16712449

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21796282A Granted JPS59107516A (ja) 1982-12-13 1982-12-13 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS59107516A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05267248A (ja) * 1992-03-19 1993-10-15 Yamaha Corp 半導体装置の製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS527315A (en) * 1975-05-28 1977-01-20 Pechiney Aluminium Making of wire consist of aluminium magnesiummsilicon alloy
JPS5454578A (en) * 1977-10-11 1979-04-28 Fujitsu Ltd Gas plasma etching method
JPS56135928A (en) * 1980-03-27 1981-10-23 Fujitsu Ltd Forming method for pattern of silicone resin

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS527315A (en) * 1975-05-28 1977-01-20 Pechiney Aluminium Making of wire consist of aluminium magnesiummsilicon alloy
JPS5454578A (en) * 1977-10-11 1979-04-28 Fujitsu Ltd Gas plasma etching method
JPS56135928A (en) * 1980-03-27 1981-10-23 Fujitsu Ltd Forming method for pattern of silicone resin

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05267248A (ja) * 1992-03-19 1993-10-15 Yamaha Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
JPH0410211B2 (enrdf_load_stackoverflow) 1992-02-24

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