JPS59104111A - 酸化鉄磁性薄膜の製造方法 - Google Patents

酸化鉄磁性薄膜の製造方法

Info

Publication number
JPS59104111A
JPS59104111A JP21378882A JP21378882A JPS59104111A JP S59104111 A JPS59104111 A JP S59104111A JP 21378882 A JP21378882 A JP 21378882A JP 21378882 A JP21378882 A JP 21378882A JP S59104111 A JPS59104111 A JP S59104111A
Authority
JP
Japan
Prior art keywords
thin film
substrate
coercive force
sputtering
auxiliary electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21378882A
Other languages
English (en)
Japanese (ja)
Other versions
JPS616532B2 (OSRAM
Inventor
Osamu Ishii
修 石井
Bunichi Yoshimura
吉村　文一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP21378882A priority Critical patent/JPS59104111A/ja
Publication of JPS59104111A publication Critical patent/JPS59104111A/ja
Publication of JPS616532B2 publication Critical patent/JPS616532B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Compounds Of Iron (AREA)
  • Physical Vapour Deposition (AREA)
  • Thin Magnetic Films (AREA)
JP21378882A 1982-12-06 1982-12-06 酸化鉄磁性薄膜の製造方法 Granted JPS59104111A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21378882A JPS59104111A (ja) 1982-12-06 1982-12-06 酸化鉄磁性薄膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21378882A JPS59104111A (ja) 1982-12-06 1982-12-06 酸化鉄磁性薄膜の製造方法

Publications (2)

Publication Number Publication Date
JPS59104111A true JPS59104111A (ja) 1984-06-15
JPS616532B2 JPS616532B2 (OSRAM) 1986-02-27

Family

ID=16645056

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21378882A Granted JPS59104111A (ja) 1982-12-06 1982-12-06 酸化鉄磁性薄膜の製造方法

Country Status (1)

Country Link
JP (1) JPS59104111A (OSRAM)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02197556A (ja) * 1989-01-27 1990-08-06 Tdk Corp マグネタイト膜の製造方法および製造装置
US5316645A (en) * 1990-08-07 1994-05-31 Canon Kabushiki Kaisha Plasma processing apparatus
US5580805A (en) * 1993-09-10 1996-12-03 Sony Corporation Semiconductor device having various threshold voltages and manufacturing same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02197556A (ja) * 1989-01-27 1990-08-06 Tdk Corp マグネタイト膜の製造方法および製造装置
US5316645A (en) * 1990-08-07 1994-05-31 Canon Kabushiki Kaisha Plasma processing apparatus
US5580805A (en) * 1993-09-10 1996-12-03 Sony Corporation Semiconductor device having various threshold voltages and manufacturing same

Also Published As

Publication number Publication date
JPS616532B2 (OSRAM) 1986-02-27

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