JPS59103439U - プラズマエツチング装置 - Google Patents

プラズマエツチング装置

Info

Publication number
JPS59103439U
JPS59103439U JP19961882U JP19961882U JPS59103439U JP S59103439 U JPS59103439 U JP S59103439U JP 19961882 U JP19961882 U JP 19961882U JP 19961882 U JP19961882 U JP 19961882U JP S59103439 U JPS59103439 U JP S59103439U
Authority
JP
Japan
Prior art keywords
plasma etching
electrostatic chuck
etching equipment
abstract
etched
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19961882U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0410688Y2 (https=
Inventor
弘 矢野
伴　保隆
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP19961882U priority Critical patent/JPS59103439U/ja
Publication of JPS59103439U publication Critical patent/JPS59103439U/ja
Application granted granted Critical
Publication of JPH0410688Y2 publication Critical patent/JPH0410688Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP19961882U 1982-12-28 1982-12-28 プラズマエツチング装置 Granted JPS59103439U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19961882U JPS59103439U (ja) 1982-12-28 1982-12-28 プラズマエツチング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19961882U JPS59103439U (ja) 1982-12-28 1982-12-28 プラズマエツチング装置

Publications (2)

Publication Number Publication Date
JPS59103439U true JPS59103439U (ja) 1984-07-12
JPH0410688Y2 JPH0410688Y2 (https=) 1992-03-17

Family

ID=30425144

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19961882U Granted JPS59103439U (ja) 1982-12-28 1982-12-28 プラズマエツチング装置

Country Status (1)

Country Link
JP (1) JPS59103439U (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01312087A (ja) * 1988-06-09 1989-12-15 Anelva Corp ドライエッチング装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5685828A (en) * 1979-12-17 1981-07-13 Nec Corp Electrostatic wafer holder
JPS57149734A (en) * 1981-03-12 1982-09-16 Anelva Corp Plasma applying working device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5685828A (en) * 1979-12-17 1981-07-13 Nec Corp Electrostatic wafer holder
JPS57149734A (en) * 1981-03-12 1982-09-16 Anelva Corp Plasma applying working device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01312087A (ja) * 1988-06-09 1989-12-15 Anelva Corp ドライエッチング装置

Also Published As

Publication number Publication date
JPH0410688Y2 (https=) 1992-03-17

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