JPS5893047A - ポジ型遠紫外線レジスト - Google Patents

ポジ型遠紫外線レジスト

Info

Publication number
JPS5893047A
JPS5893047A JP56191489A JP19148981A JPS5893047A JP S5893047 A JPS5893047 A JP S5893047A JP 56191489 A JP56191489 A JP 56191489A JP 19148981 A JP19148981 A JP 19148981A JP S5893047 A JPS5893047 A JP S5893047A
Authority
JP
Japan
Prior art keywords
copolymer
resist
methacrylate
dry etching
sensitivity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56191489A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6349212B2 (enrdf_load_stackoverflow
Inventor
Makoto Tanaka
誠 田中
Masahiro Kadooka
正弘 角岡
Bunya Konishi
小西　文弥
Kenichi Takeyama
竹山　健一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP56191489A priority Critical patent/JPS5893047A/ja
Publication of JPS5893047A publication Critical patent/JPS5893047A/ja
Publication of JPS6349212B2 publication Critical patent/JPS6349212B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP56191489A 1981-11-27 1981-11-27 ポジ型遠紫外線レジスト Granted JPS5893047A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56191489A JPS5893047A (ja) 1981-11-27 1981-11-27 ポジ型遠紫外線レジスト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56191489A JPS5893047A (ja) 1981-11-27 1981-11-27 ポジ型遠紫外線レジスト

Publications (2)

Publication Number Publication Date
JPS5893047A true JPS5893047A (ja) 1983-06-02
JPS6349212B2 JPS6349212B2 (enrdf_load_stackoverflow) 1988-10-04

Family

ID=16275490

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56191489A Granted JPS5893047A (ja) 1981-11-27 1981-11-27 ポジ型遠紫外線レジスト

Country Status (1)

Country Link
JP (1) JPS5893047A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60229026A (ja) * 1984-03-02 1985-11-14 アメリカン　テレフオン　アンド　テレグラフ　カムパニ− 電子デバイスの製造方法
US6376154B2 (en) 1996-02-26 2002-04-23 Matsushita Electric Industrial Co., Ltd. Pattern forming material and pattern forming method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60229026A (ja) * 1984-03-02 1985-11-14 アメリカン　テレフオン　アンド　テレグラフ　カムパニ− 電子デバイスの製造方法
US6376154B2 (en) 1996-02-26 2002-04-23 Matsushita Electric Industrial Co., Ltd. Pattern forming material and pattern forming method
US6387592B2 (en) 1996-02-26 2002-05-14 Matsushita Electric Industrial Co., Ltd. Pattern forming material and pattern forming method
US6387598B2 (en) 1996-02-26 2002-05-14 Matsushita Electric Industrial Co., Ltd. Pattern forming material and pattern forming method

Also Published As

Publication number Publication date
JPS6349212B2 (enrdf_load_stackoverflow) 1988-10-04

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