JPS5887272A - プレ−ナマグネトロンスパツタ装置 - Google Patents

プレ−ナマグネトロンスパツタ装置

Info

Publication number
JPS5887272A
JPS5887272A JP18536381A JP18536381A JPS5887272A JP S5887272 A JPS5887272 A JP S5887272A JP 18536381 A JP18536381 A JP 18536381A JP 18536381 A JP18536381 A JP 18536381A JP S5887272 A JPS5887272 A JP S5887272A
Authority
JP
Japan
Prior art keywords
substrate
target
film
flat plate
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18536381A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6127464B2 (enrdf_load_stackoverflow
Inventor
Kazuyuki Fujimoto
藤本　一之
Hide Kobayashi
秀 小林
Katsuo Abe
勝男 阿部
Tsuneaki Kamei
亀井　常彰
Tamotsu Shimizu
保 清水
Hideki Tateishi
秀樹 立石
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP18536381A priority Critical patent/JPS5887272A/ja
Publication of JPS5887272A publication Critical patent/JPS5887272A/ja
Publication of JPS6127464B2 publication Critical patent/JPS6127464B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)
JP18536381A 1981-11-20 1981-11-20 プレ−ナマグネトロンスパツタ装置 Granted JPS5887272A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18536381A JPS5887272A (ja) 1981-11-20 1981-11-20 プレ−ナマグネトロンスパツタ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18536381A JPS5887272A (ja) 1981-11-20 1981-11-20 プレ−ナマグネトロンスパツタ装置

Publications (2)

Publication Number Publication Date
JPS5887272A true JPS5887272A (ja) 1983-05-25
JPS6127464B2 JPS6127464B2 (enrdf_load_stackoverflow) 1986-06-25

Family

ID=16169483

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18536381A Granted JPS5887272A (ja) 1981-11-20 1981-11-20 プレ−ナマグネトロンスパツタ装置

Country Status (1)

Country Link
JP (1) JPS5887272A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60138069A (ja) * 1983-12-27 1985-07-22 Fujitsu General Ltd スパツタリング装置
JPS60200533A (ja) * 1984-03-23 1985-10-11 Nippon Telegr & Teleph Corp <Ntt> アニ−リング法及びそれに用いる装置
JP2011052313A (ja) * 2009-09-04 2011-03-17 Meijo Univ 窒化処理装置及び窒化処理方法
WO2012153767A1 (ja) * 2011-05-09 2012-11-15 学校法人トヨタ学園 窒化処理方法及び窒化処理装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5855228A (ja) * 1981-09-28 1983-04-01 Toyo Rubber Chem Ind Co Ltd ポリエチレン発泡体の製造方法
JPS593545A (ja) * 1982-06-30 1984-01-10 Fujitsu Ltd 端末装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5855228A (ja) * 1981-09-28 1983-04-01 Toyo Rubber Chem Ind Co Ltd ポリエチレン発泡体の製造方法
JPS593545A (ja) * 1982-06-30 1984-01-10 Fujitsu Ltd 端末装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60138069A (ja) * 1983-12-27 1985-07-22 Fujitsu General Ltd スパツタリング装置
JPS60200533A (ja) * 1984-03-23 1985-10-11 Nippon Telegr & Teleph Corp <Ntt> アニ−リング法及びそれに用いる装置
JP2011052313A (ja) * 2009-09-04 2011-03-17 Meijo Univ 窒化処理装置及び窒化処理方法
WO2012153767A1 (ja) * 2011-05-09 2012-11-15 学校法人トヨタ学園 窒化処理方法及び窒化処理装置
JPWO2012153767A1 (ja) * 2011-05-09 2014-07-31 学校法人トヨタ学園 窒化処理方法及び窒化処理装置

Also Published As

Publication number Publication date
JPS6127464B2 (enrdf_load_stackoverflow) 1986-06-25

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