JPS5880838A - デイベロツパ− - Google Patents

デイベロツパ−

Info

Publication number
JPS5880838A
JPS5880838A JP56178374A JP17837481A JPS5880838A JP S5880838 A JPS5880838 A JP S5880838A JP 56178374 A JP56178374 A JP 56178374A JP 17837481 A JP17837481 A JP 17837481A JP S5880838 A JPS5880838 A JP S5880838A
Authority
JP
Japan
Prior art keywords
wafer
developer
nozzle
chuck
injected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56178374A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0160937B2 (enExample
Inventor
Toshihiro Abe
安部　敏弘
Chiharu Kato
千晴 加藤
Hirokazu Fukushima
宏和 福島
Kazuo Sato
和夫 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP56178374A priority Critical patent/JPS5880838A/ja
Publication of JPS5880838A publication Critical patent/JPS5880838A/ja
Publication of JPH0160937B2 publication Critical patent/JPH0160937B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56178374A 1981-11-09 1981-11-09 デイベロツパ− Granted JPS5880838A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56178374A JPS5880838A (ja) 1981-11-09 1981-11-09 デイベロツパ−

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56178374A JPS5880838A (ja) 1981-11-09 1981-11-09 デイベロツパ−

Publications (2)

Publication Number Publication Date
JPS5880838A true JPS5880838A (ja) 1983-05-16
JPH0160937B2 JPH0160937B2 (enExample) 1989-12-26

Family

ID=16047369

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56178374A Granted JPS5880838A (ja) 1981-11-09 1981-11-09 デイベロツパ−

Country Status (1)

Country Link
JP (1) JPS5880838A (enExample)

Also Published As

Publication number Publication date
JPH0160937B2 (enExample) 1989-12-26

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