JPS5880250A - Ｘ線源装置 - Google Patents

Ｘ線源装置

Info

Publication number
JPS5880250A
JPS5880250A JP56179385A JP17938581A JPS5880250A JP S5880250 A JPS5880250 A JP S5880250A JP 56179385 A JP56179385 A JP 56179385A JP 17938581 A JP17938581 A JP 17938581A JP S5880250 A JPS5880250 A JP S5880250A
Authority
JP
Japan
Prior art keywords
container
plasma
source device
gas
ray source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56179385A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0354423B2 (enrdf_load_stackoverflow
Inventor
Seiichi Iwamatsu
誠一 岩松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP56179385A priority Critical patent/JPS5880250A/ja
Priority to US06/438,569 priority patent/US4538291A/en
Publication of JPS5880250A publication Critical patent/JPS5880250A/ja
Publication of JPH0354423B2 publication Critical patent/JPH0354423B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • X-Ray Techniques (AREA)
JP56179385A 1981-11-09 1981-11-09 Ｘ線源装置 Granted JPS5880250A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP56179385A JPS5880250A (ja) 1981-11-09 1981-11-09 Ｘ線源装置
US06/438,569 US4538291A (en) 1981-11-09 1982-11-02 X-ray source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56179385A JPS5880250A (ja) 1981-11-09 1981-11-09 Ｘ線源装置

Publications (2)

Publication Number Publication Date
JPS5880250A true JPS5880250A (ja) 1983-05-14
JPH0354423B2 JPH0354423B2 (enrdf_load_stackoverflow) 1991-08-20

Family

ID=16064929

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56179385A Granted JPS5880250A (ja) 1981-11-09 1981-11-09 Ｘ線源装置

Country Status (1)

Country Link
JP (1) JPS5880250A (enrdf_load_stackoverflow)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57147855A (en) * 1981-03-06 1982-09-11 Fujitsu Ltd Discharge plasma x-ray generator

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57147855A (en) * 1981-03-06 1982-09-11 Fujitsu Ltd Discharge plasma x-ray generator

Also Published As

Publication number Publication date
JPH0354423B2 (enrdf_load_stackoverflow) 1991-08-20

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