JPS5879852U - Shutter device in electron microscope etc. - Google Patents
Shutter device in electron microscope etc.Info
- Publication number
- JPS5879852U JPS5879852U JP17153081U JP17153081U JPS5879852U JP S5879852 U JPS5879852 U JP S5879852U JP 17153081 U JP17153081 U JP 17153081U JP 17153081 U JP17153081 U JP 17153081U JP S5879852 U JPS5879852 U JP S5879852U
- Authority
- JP
- Japan
- Prior art keywords
- shutter device
- electron microscope
- electron beam
- optical axis
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第゛１図及び第３図は本考案の一実施例の装置を示す概
略図、第２図は電子線遮蔽体の一実施例を示す詳細図、
第４図はその動作を示すためのタイムチャートである。
１：上磁極片、２：下磁極片、１ａ：電子線通過孔、２
ａ：電子線通過孔、３，４：支持棒、５．６＝非磁性導
電体、７：第１遮蔽体、８：第２遮蔽体、９゜１０：シ
ャッター電源、１１：シャッター制御回路、１２：乾板
。1 and 3 are schematic views showing an apparatus according to an embodiment of the present invention, and FIG. 2 is a detailed view showing an embodiment of an electron beam shield.
FIG. 4 is a time chart showing the operation. 1: Upper magnetic pole piece, 2: Lower magnetic pole piece, 1a: Electron beam passage hole, 2
a: electron beam passage hole, 3, 4: support rod, 5.6 = non-magnetic conductor, 7: first shield, 8: second shield, 9° 10: shutter power supply, 11: shutter control circuit, 12: Dry plate.
Claims (1)
遮蔽体と、これらの遮蔽体を前記電子レンズ磁界を利用
して電子線光軸上又は電子線光軸外に移動させる移動手
段、及び前記第１の遮蔽体を電子線光軸外に移動させる
時間内に、前記第２の遮蔽体を所望の時間電子線光軸外
に移動させる様に前記移動手段を制御する手段を設けた
ことを特徴とする電子顕微鏡等に於けるシャッター装置
。first and second shields movably disposed within an electron lens magnetic field; and a moving means for moving these shields onto or outside the electron beam optical axis using the electron lens magnetic field. , and means for controlling the moving means so that the second shielding body is moved outside the electron beam optical axis for a desired time within the time period in which the first shielding body is moved outside the electron beam optical axis. A shutter device for an electron microscope, etc., characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17153081U JPS5879852U (en) | 1981-11-18 | 1981-11-18 | Shutter device in electron microscope etc. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17153081U JPS5879852U (en) | 1981-11-18 | 1981-11-18 | Shutter device in electron microscope etc. |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5879852U true JPS5879852U (en) | 1983-05-30 |
| JPS6247168Y2 JPS6247168Y2 (en) | 1987-12-25 |
Family
ID=29963449
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17153081U Granted JPS5879852U (en) | 1981-11-18 | 1981-11-18 | Shutter device in electron microscope etc. |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5879852U (en) |
-
1981
- 1981-11-18 JP JP17153081U patent/JPS5879852U/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6247168Y2 (en) | 1987-12-25 |
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