JPS60185333U - Charged particle beam lithography equipment - Google Patents
Charged particle beam lithography equipmentInfo
- Publication number
- JPS60185333U JPS60185333U JP7241084U JP7241084U JPS60185333U JP S60185333 U JPS60185333 U JP S60185333U JP 7241084 U JP7241084 U JP 7241084U JP 7241084 U JP7241084 U JP 7241084U JP S60185333 U JPS60185333 U JP S60185333U
- Authority
- JP
- Japan
- Prior art keywords
- shot
- charged particle
- signal
- particle beam
- beam lithography
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は従来の装置によるタイミング図、第２図は本考
案−実施例を示した電子ビーム描画装置の概略図、第３
図は該装置のタイミング図である。
１：電子銃、５：位置決め用偏向器、６：材料、７：ブ
ランキング用偏向器、８ニブランキング用スリツト、９
：デジタル制御装置、１０：ビーム位置レジスタ、１１
ニジヨツトタイムレジスタ、１２：ＤＡ変換器、１３：
アンプ、１４：第１シヨツト信号発生器、１５：アンプ
、１６：減算器、１７：第２シヨツト信号発生器。FIG. 1 is a timing diagram of a conventional device, FIG. 2 is a schematic diagram of an electron beam lithography device showing an embodiment of the present invention, and FIG.
The figure is a timing diagram of the device. 1: Electron gun, 5: Deflector for positioning, 6: Material, 7: Deflector for blanking, 8 Slit for blanking, 9
: Digital control device, 10: Beam position register, 11
Nijotsu time register, 12: DA converter, 13:
Amplifier, 14: first shot signal generator, 15: amplifier, 16: subtracter, 17: second shot signal generator.
Claims (1)
を材料上に集束させる為のレンズ、該ビームの材料上で
の位置を決定する偏向手段、該ビームが材料上にショッ
トされる時間を制御するブランキング用電極から成る装
置において、デジタル制御装置からのショットタイム信
号がセットされ、該信号を前記ブランキング用電極に送
る第１シヨツト信号発生器、前記デジタル制御装置から
のショットタイム信号から処理タイム信号を差引いて第
２シヨツト信号発生器に送る手段を具備し、前記第２シ
ヨツト信号発生器の信号によって、 次のショット
動作をコントロールする様に成した荷電粒子ビーム描画
装置。Charged particle beam generating means, a lens for focusing the charged particle beam from the means onto the material, deflection means for determining the position of the beam on the material, and controlling the time at which the beam is shot onto the material. In a device comprising a blanking electrode, a first shot signal generator is set with a shot time signal from a digital control device and sends the signal to the blanking electrode, and a processing time is determined from the shot time signal from the digital control device. A charged particle beam lithography apparatus comprising means for subtracting a signal and sending it to a second shot signal generator, the next shot operation being controlled by the signal from the second shot signal generator.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7241084U JPS60185333U (en) | 1984-05-17 | 1984-05-17 | Charged particle beam lithography equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7241084U JPS60185333U (en) | 1984-05-17 | 1984-05-17 | Charged particle beam lithography equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60185333U true JPS60185333U (en) | 1985-12-09 |
Family
ID=30610790
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7241084U Pending JPS60185333U (en) | 1984-05-17 | 1984-05-17 | Charged particle beam lithography equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60185333U (en) |
-
1984
- 1984-05-17 JP JP7241084U patent/JPS60185333U/en active Pending
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