JPS60130631U - Charged particle beam drawing device - Google Patents
Charged particle beam drawing deviceInfo
- Publication number
- JPS60130631U JPS60130631U JP1905984U JP1905984U JPS60130631U JP S60130631 U JPS60130631 U JP S60130631U JP 1905984 U JP1905984 U JP 1905984U JP 1905984 U JP1905984 U JP 1905984U JP S60130631 U JPS60130631 U JP S60130631U
- Authority
- JP
- Japan
- Prior art keywords
- stage
- charged particle
- particle beam
- movement amount
- movement
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
添附図面は、本考案の一実施例である電子線描画装置を
示す図である。
１・・・電子銃、２・・・集束レンズ、３・・・坐料、
４・・・偏向器、５・・・駆動機構、６・・・ステージ
、７・・・レーサ測長器、訃・・カウンタ、９・・・コ
ントローラ、１０・・・レジスタ、１１・・・比較回路
、１２・・・制御回路、１３．１５・・・Ｄ−Ａ変換器
、１４・・・加算回路、１６・・・増幅器、１７・・・
コンパレータ。The accompanying drawings are diagrams showing an electron beam lithography apparatus that is an embodiment of the present invention. 1... Electron gun, 2... Focusing lens, 3... Suppository,
4...Deflector, 5...Drive mechanism, 6...Stage, 7...Laser length measuring device, 2...Counter, 9...Controller, 10...Register, 11... Comparison circuit, 12... Control circuit, 13.15... D-A converter, 14... Addition circuit, 16... Amplifier, 17...
comparator.
Claims (1)
子線を偏向する手段と、該被描画材料が載置されるステ
ージと、該ステージを駆動する手段と、該ステージの移
動を監視する手段と、該ステージの設定移動量と該監視
手段によって測定される実際の移動量とを比較し、両移
動量の差が所定の範囲内となった際に該ステージの移動
を停止するように制御する制御手段とを備え、該ステー
ジの停止後における設定移動量と実際の移動量との差に
応じた信号を前記荷電粒子線偏向手段に供給するように
構成した荷電粒子線描画装置ｉこおいて、該ステージの
移動が停止された後における設定移動量と実際の移動量
との差が予め定められた範囲以内かどうかを監視する手
段を設けたことを特徴とする荷電粒子線描画装置。A means for irradiating a charged particle beam onto a material to be drawn, a means for deflecting the charged particle beam, a stage on which the material to be drawn is placed, a means for driving the stage, and a means for monitoring movement of the stage. means for comparing the set movement amount of the stage with the actual movement amount measured by the monitoring means, and stopping the movement of the stage when the difference between the two movement amounts falls within a predetermined range. a charged particle beam lithography apparatus i, comprising: a control means for controlling the stage; and configured to supply the charged particle beam deflection means with a signal corresponding to the difference between the set movement amount and the actual movement amount after the stage is stopped. Charged particle beam lithography characterized in that a means is provided for monitoring whether the difference between the set movement amount and the actual movement amount after the movement of the stage is stopped is within a predetermined range. Device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1905984U JPS60130631U (en) | 1984-02-13 | 1984-02-13 | Charged particle beam drawing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1905984U JPS60130631U (en) | 1984-02-13 | 1984-02-13 | Charged particle beam drawing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60130631U true JPS60130631U (en) | 1985-09-02 |
Family
ID=30508277
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1905984U Pending JPS60130631U (en) | 1984-02-13 | 1984-02-13 | Charged particle beam drawing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60130631U (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54158873A (en) * | 1978-06-06 | 1979-12-15 | Jeol Ltd | Electron-beam exposure unit |
| JPS5518031A (en) * | 1978-07-25 | 1980-02-07 | Jeol Ltd | Stage shifting device in electron beam device |
-
1984
- 1984-02-13 JP JP1905984U patent/JPS60130631U/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54158873A (en) * | 1978-06-06 | 1979-12-15 | Jeol Ltd | Electron-beam exposure unit |
| JPS5518031A (en) * | 1978-07-25 | 1980-02-07 | Jeol Ltd | Stage shifting device in electron beam device |
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