JPS6199960U - - Google Patents
Info
- Publication number
- JPS6199960U JPS6199960U JP18464184U JP18464184U JPS6199960U JP S6199960 U JPS6199960 U JP S6199960U JP 18464184 U JP18464184 U JP 18464184U JP 18464184 U JP18464184 U JP 18464184U JP S6199960 U JPS6199960 U JP S6199960U
- Authority
- JP
- Japan
- Prior art keywords
- electron
- deflection
- electron beam
- optical axis
- deflection coil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 claims description 4
- 230000001133 acceleration Effects 0.000 claims 2
- 238000001514 detection method Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Description
第１図は本考案の一実施例の構成図、第２図イ
及びロは本考案の電子ビームの偏向を説明するた
めの図である。
１：電子ビーム、２：光軸、３：前方磁界レン
ズ、４：試料、５，６：偏向コイル、７，８：増
幅器、９，１０：Ｄ／Ａ変換器、１１：制御装置
、１２：二次電子検出器、１２Ａ：二次電子収集
電極。
FIG. 1 is a block diagram of an embodiment of the present invention, and FIGS. 2A and 2B are diagrams for explaining the deflection of the electron beam of the present invention. 1: Electron beam, 2: Optical axis, 3: Front magnetic field lens, 4: Sample, 5, 6: Deflection coil, 7, 8: Amplifier, 9, 10: D/A converter, 11: Control device, 12: Secondary electron detector, 12A: secondary electron collection electrode.
Claims (1)
ムを加速電圧Ｅ０で加速して試料に照射し、該試
料より電子銃側に設けられ二次電子収集電極を有
する二次電子検出器により二次電子を検出する装
置において、前記二次電子検出器より電子銃側に
設けられた２段の偏向コイルと、該偏向コイルに
偏向電流を供給する手段と、該偏向電流供給手段
を制御する制御手段とを設け、該１段目の偏向コ
イルによる電子ビームの偏向角をθ１、２段目の
偏向コイルによる電子ビームの偏向角をθ２、光
軸と直交して設けられた二次電子検出器の中心軸
と光軸の交点Ｐに入射する電子ビームの傾斜角を
θｊとするとき、前記加速電圧Ｅ０の切り換えに
連動してθｊ＝θ２−θ１を満足するように制御
することを特徴とする走査電子顕微鏡。 An electron beam taken out along the optical axis from an electron gun is accelerated at an acceleration voltage E0 and irradiated onto a sample, and a secondary electron detector having a secondary electron collection electrode installed on the electron gun side of the sample collects secondary electrons. In a device for detecting electrons, there is provided a two-stage deflection coil provided closer to the electron gun than the secondary electron detector, a means for supplying a deflection current to the deflection coil, and a control means for controlling the deflection current supply means. The deflection angle of the electron beam by the first-stage deflection coil is θ 1 , the deflection angle of the electron beam by the second-stage deflection coil is θ 2 , and a secondary electron detection device is provided perpendicular to the optical axis. When the inclination angle of the electron beam incident on the intersection P of the central axis of the device and the optical axis is θ j , control is performed to satisfy θ j =θ 2 −θ 1 in conjunction with the switching of the acceleration voltage E 0 . A scanning electron microscope characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1984184641U JPH0537398Y2 (en) | 1984-12-05 | 1984-12-05 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1984184641U JPH0537398Y2 (en) | 1984-12-05 | 1984-12-05 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6199960U true JPS6199960U (en) | 1986-06-26 |
| JPH0537398Y2 JPH0537398Y2 (en) | 1993-09-21 |
Family
ID=30742126
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1984184641U Expired - Lifetime JPH0537398Y2 (en) | 1984-12-05 | 1984-12-05 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0537398Y2 (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5576560A (en) * | 1978-12-01 | 1980-06-09 | Hitachi Ltd | Observation field moving device for electron microscope |
| JPS5630659A (en) * | 1979-08-21 | 1981-03-27 | Tadashi Hirotsune | Dielectric strength test apparatus for method electric plug |
| JPS5888769U (en) * | 1981-12-11 | 1983-06-16 | 日本電子株式会社 | Electron beam deflection device |
-
1984
- 1984-12-05 JP JP1984184641U patent/JPH0537398Y2/ja not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5576560A (en) * | 1978-12-01 | 1980-06-09 | Hitachi Ltd | Observation field moving device for electron microscope |
| JPS5630659A (en) * | 1979-08-21 | 1981-03-27 | Tadashi Hirotsune | Dielectric strength test apparatus for method electric plug |
| JPS5888769U (en) * | 1981-12-11 | 1983-06-16 | 日本電子株式会社 | Electron beam deflection device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0537398Y2 (en) | 1993-09-21 |
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