JPS61153958U - - Google Patents
Info
- Publication number
- JPS61153958U JPS61153958U JP3726285U JP3726285U JPS61153958U JP S61153958 U JPS61153958 U JP S61153958U JP 3726285 U JP3726285 U JP 3726285U JP 3726285 U JP3726285 U JP 3726285U JP S61153958 U JPS61153958 U JP S61153958U
- Authority
- JP
- Japan
- Prior art keywords
- sample
- magnetic field
- detector
- electron beam
- field type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
Description
第１図は本考案の一実施例装置の構成図、第２
図はワーキングデイスタンスＷを変化させた状態
を説明するための図、第３図は従来装置を説明す
るための図である。
１：電子線、２：磁極片、３：試料、４：試料
ホルダ、５：試料ステージ、６：シンチレータ、
７：ライトパイプ、８：光電子増倍管、９：リン
グ状電極、１０：コレクタ電極、１１：磁界型レ
ンズ、１２：電源。
Fig. 1 is a configuration diagram of an embodiment of the device of the present invention;
The figure is a diagram for explaining a state in which the working distance W is changed, and FIG. 3 is a diagram for explaining a conventional device. 1: electron beam, 2: magnetic pole piece, 3: sample, 4: sample holder, 5: sample stage, 6: scintillator,
7: light pipe, 8: photomultiplier tube, 9: ring-shaped electrode, 10: collector electrode, 11: magnetic field type lens, 12: power supply.
Claims (1)
た試料に電子線を照射し、上記試料よりの２次電
子を前記対物レンズの光軸に対して垂直又は傾斜
して配置された２次電子検出器によつて検出する
ようにした装置において、２次電子検出器の高電
圧が印加される電極と試料との間に２次電子検出
器と同軸の回転対称な磁界型レンズ手段を設け、
前記試料移動又は傾斜に連動させて磁界型レンズ
手段の磁界強度を可変することを特徴とする電子
線装置。 A specimen placed movably and tiltably under the objective lens is irradiated with an electron beam, and secondary electrons from the sample are detected by secondary electrons placed perpendicularly or inclined to the optical axis of the objective lens. In the apparatus for detecting by a detector, a rotationally symmetrical magnetic field type lens means coaxial with the secondary electron detector is provided between the electrode to which a high voltage of the secondary electron detector is applied and the sample,
An electron beam apparatus characterized in that the magnetic field strength of the magnetic field type lens means is varied in conjunction with the movement or tilting of the sample.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3726285U JPS61153958U (en) | 1985-03-15 | 1985-03-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3726285U JPS61153958U (en) | 1985-03-15 | 1985-03-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61153958U true JPS61153958U (en) | 1986-09-24 |
Family
ID=30543186
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3726285U Pending JPS61153958U (en) | 1985-03-15 | 1985-03-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61153958U (en) |
-
1985
- 1985-03-15 JP JP3726285U patent/JPS61153958U/ja active Pending
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