JPS5854783Y2 - scanning electron microscope - Google Patents

scanning electron microscope

Info

Publication number
JPS5854783Y2
JPS5854783Y2 JP8462782U JP8462782U JPS5854783Y2 JP S5854783 Y2 JPS5854783 Y2 JP S5854783Y2 JP 8462782 U JP8462782 U JP 8462782U JP 8462782 U JP8462782 U JP 8462782U JP S5854783 Y2 JPS5854783 Y2 JP S5854783Y2
Authority
JP
Japan
Prior art keywords
secondary electrons
relay electrode
electrode
sample
electron microscope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8462782U
Other languages
Japanese (ja)
Other versions
JPS585275U (en
Inventor
隆 永谷
満彦 山田
Original Assignee
株式会社日立製作所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社日立製作所 filed Critical 株式会社日立製作所
Priority to JP8462782U priority Critical patent/JPS5854783Y2/en
Publication of JPS585275U publication Critical patent/JPS585275U/en
Application granted granted Critical
Publication of JPS5854783Y2 publication Critical patent/JPS5854783Y2/en
Expired legal-status Critical Current

Links

Description

【考案の詳細な説明】 本考案は試料表面から発生した二次電子を効率よく検出
器に到達させ、高分解能、高S/Nとした走査電子顕微
鏡に関する。
[Detailed Description of the Invention] The present invention relates to a scanning electron microscope that efficiently allows secondary electrons generated from the surface of a sample to reach a detector, and achieves high resolution and high S/N.

走査電子顕微鏡の分解能を高めるために、対物レンズ主
面と試料との距離(以後WDと略称)を小さくすること
がしばしば試みられてきた、これは、電子光学系におい
ては収差が減少して小さなプローブ径が得られること、
および試料表面での二次電子発生機構の見地からも試料
を見込む角度が大きくなる、すなわち焦点深度が浅くな
るため、試料内部の広い領域からの情報は失われ、試料
表面の比較的狭い領域からの情報によって像形成が行な
われることが期待できることなどによる。
In order to increase the resolution of a scanning electron microscope, attempts have often been made to reduce the distance between the main surface of the objective lens and the sample (hereinafter abbreviated as WD). that the probe diameter can be obtained;
Also, from the viewpoint of the secondary electron generation mechanism on the sample surface, the angle at which the sample is viewed becomes larger, that is, the depth of focus becomes shallower, so information from a wide area inside the sample is lost, and information from a relatively narrow area on the sample surface is lost. This is because image formation can be expected to be performed based on the information.

しかし、WDを縮小し、試料を対物レンズ主面位置ある
いはレンズ内部に置くと、試料表面で発生した二次電子
を、試料近傍の対物レンズポールピースや、そこに存在
する磁界あるいは電界によって妨害されることなく、効
率よく二次電子検出器に到達せしめることが困難となる
However, when the WD is reduced and the sample is placed on the main surface of the objective lens or inside the lens, the secondary electrons generated on the sample surface are blocked by the objective lens pole piece near the sample and the magnetic or electric field that exists there. This makes it difficult for the secondary electrons to efficiently reach the secondary electron detector.

この問題をさけるために、試料近傍に中継電極を設け、
該中継電極に適当なバイアス電圧を印加して、試料面で
発生した二次電子をこの中継電極に衝突させ、該中継電
極において発生した二次電子を検出器に導いて検出させ
ることが提案されている。
To avoid this problem, a relay electrode is installed near the sample.
It has been proposed to apply an appropriate bias voltage to the relay electrode to cause secondary electrons generated on the sample surface to collide with the relay electrode, and to guide the secondary electrons generated at the relay electrode to a detector for detection. ing.

この中継電極を用いる手段によって前記困難は相当軽減
されはするが、検出される二次電子量はなお十分ではな
い欠点があった。
Although the above-mentioned difficulties can be considerably alleviated by means of using this relay electrode, there is a drawback that the amount of secondary electrons detected is still insufficient.

本考案はWDを縮小した場合に中継電極を介して二次電
子を検出する従来の技術の前記欠点を補い、二次電子検
出器に到達する二次電子量が増加することができる高分
解能の走査電子顕微鏡を提供することを目的とする。
The present invention compensates for the drawbacks of the conventional technique of detecting secondary electrons through a relay electrode when the WD is reduced, and provides a high-resolution method that can increase the amount of secondary electrons reaching the secondary electron detector. The purpose is to provide a scanning electron microscope.

第1図はWDを縮小した場合に、中継電極を介して二次
電子を検出する従来の走査電子顕微鏡の一例を示す図で
ある。
FIG. 1 is a diagram showing an example of a conventional scanning electron microscope that detects secondary electrons via a relay electrode when the WD is reduced.

1は一次(走査)電子線、2は対物レンズ、3は試料、
4は試料ホルダ、5はシンチロータ、6はライトガイド
、7は試料表面で発生した二次電子、8は中継電極表面
で発生した二次電子、9は中継電極、10は絶縁物であ
る。
1 is a primary (scanning) electron beam, 2 is an objective lens, 3 is a sample,
4 is a sample holder, 5 is a scintillator, 6 is a light guide, 7 is a secondary electron generated on the sample surface, 8 is a secondary electron generated on the relay electrode surface, 9 is a relay electrode, and 10 is an insulator.

第1図の例の場合、試料3は対物レンズ2の主面位置に
おかれている。
In the example shown in FIG. 1, the sample 3 is placed at the main surface of the objective lens 2.

すなわちWD=Qmmである。この様な試料位置に対し
て中継電極9を設け、該電極に適当な正のバイアス電圧
EBを与えて、試料3の表面が電子線1に照射されるこ
とによって発生した二次電子7を中継電極9に衝突させ
、この衝突によって中継電極9の表面で発生した二次電
子8をシンチレータ5(その表面には後段加速電源Ep
によって+12 kV程度の電圧が印加されている)に
導くようにすれば、中継電極9を設けるという比較的簡
単な手段で、比較的多量の二次電子を検出できると考え
られた。
That is, WD=Qmm. A relay electrode 9 is provided for such a sample position, and an appropriate positive bias voltage EB is applied to the electrode to relay the secondary electrons 7 generated when the surface of the sample 3 is irradiated with the electron beam 1. The secondary electrons 8 generated on the surface of the relay electrode 9 by this collision are sent to the scintillator 5 (the surface of which is connected to the secondary acceleration power source Ep).
It was thought that a relatively large amount of secondary electrons could be detected by a relatively simple means of providing a relay electrode 9, by introducing a voltage of approximately +12 kV (applied with a voltage of approximately +12 kV).

しかし実際にはシンチレータ5に到達する二次電子量は
なお一層多くすることが望ましいので、本考案において
は二次電子の通路に沿って、特に中継電極9とシンチレ
ータ5との間に、集束電極を設けて適当なバイアス電圧
を印加し、発生した二次電子を効率良くシンチレータに
導くようにしたのである。
However, in reality, it is desirable to increase the amount of secondary electrons that reach the scintillator 5, so in the present invention, a focusing electrode is placed along the path of the secondary electrons, especially between the relay electrode 9 and the scintillator 5. By applying a suitable bias voltage, the generated secondary electrons were efficiently guided to the scintillator.

第2図は本考案の一実施例図である。FIG. 2 is a diagram showing one embodiment of the present invention.

第2図中11は絶縁物、12は集束電極で、その他の符
号は第1図の場合と同様である。
In FIG. 2, 11 is an insulator, 12 is a focusing electrode, and other symbols are the same as in FIG. 1.

本実施例では集束電極12は、中継電極9と同電位にバ
イアスされている。
In this embodiment, the focusing electrode 12 is biased to the same potential as the relay electrode 9.

なおシンチレータ5に二次電子8が到達すると光に変換
され、ライトガイド6を通して光電子増倍管(図示省略
)において信号電流に変えられる。
Note that when the secondary electrons 8 reach the scintillator 5, they are converted into light, which is passed through the light guide 6 and converted into a signal current in a photomultiplier tube (not shown).

第3図は集束電極12のない場合(第1図に示した例の
場合)と、集束電極12を設けて中継電極9と同電位に
バイアスした場合(第2図実施例の場合)とについて、
バイアス電圧EBと、光電子増倍管出力電流との関係を
示す図である。
FIG. 3 shows the case where the focusing electrode 12 is not provided (the case of the example shown in FIG. 1) and the case where the focusing electrode 12 is provided and biased to the same potential as the relay electrode 9 (the case of the embodiment shown in FIG. 2). ,
FIG. 3 is a diagram showing the relationship between bias voltage EB and photomultiplier tube output current.

集束電極のない場合を■、集束電極12を設けた場合を
■で示している。
The case without the focusing electrode is shown by ■, and the case where the focusing electrode 12 is provided is shown by ■.

集束電極12および中継電極9に与えられる電圧が約3
00■以上の場合、約2.3倍以上の信号電流が得られ
ていることがわかる。
The voltage applied to the focusing electrode 12 and the relay electrode 9 is approximately 3
It can be seen that in the case of 00■ or more, a signal current of about 2.3 times or more is obtained.

なお第3図の結果を得た時の装置条件は、(a)加速電
圧25kV、(b)プローブ電流2 X 10=1A、
(C)光電子増倍管印加電圧600v、(d)傾斜角度
30°、(e)WD=Qmmであった。
The equipment conditions when obtaining the results shown in Figure 3 were (a) acceleration voltage 25 kV, (b) probe current 2 x 10 = 1 A,
(C) Photomultiplier tube applied voltage was 600 V, (d) Tilt angle was 30°, and (e) WD=Qmm.

第4図は本考案の他の実施例図で、集束電極12を円筒
状とした例を示す。
FIG. 4 shows another embodiment of the present invention, in which the focusing electrode 12 is cylindrical.

第5図は本考案の更に他の実施例図であって、集束電極
12を角筒状とした例を示す。
FIG. 5 is a diagram showing still another embodiment of the present invention, showing an example in which the focusing electrode 12 is shaped like a rectangular tube.

以上説明した様に本考案によって、中継電極の他に集束
電極を設け、これらの電極に約300V以上のバイアス
電圧を与えるだけの簡単な手段によって、多量の二次電
子を検出することができるようになり、S/Nの良好な
、高分解能の像が得られるようになった。
As explained above, the present invention makes it possible to detect a large amount of secondary electrons by simply providing a focusing electrode in addition to the relay electrode and applying a bias voltage of about 300 V or more to these electrodes. This made it possible to obtain high-resolution images with good S/N ratio.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はWDを縮小した場合に二次電子を検出するため
に中継電極を設けた従来の装置の例を示す図、第2図は
本考案の一実施例図、第3図はバイアス電圧EBと光電
子増倍管出力電流との関係を第1図に示した従来の例の
場合と第2図に示した本考案実施例の場合とについて示
した図、第4図は集束電極を円筒状にした本考案の実施
例図、第5図は集束電極を角筒状にした本考案の実施例
図である。 1・・・・・・一次(走査)電子線、3・・・・・・試
料、5・・・・・・シンチレータ、7・・・・・・試料
表面で発生した二次電子、8・・・・・・中継電極表面
で発生した二次電子、9・・・・・・中継電極、12・
・・・・・集束電極。
Fig. 1 is a diagram showing an example of a conventional device provided with a relay electrode to detect secondary electrons when the WD is reduced, Fig. 2 is an example of an embodiment of the present invention, and Fig. 3 is a bias voltage The relationship between EB and photomultiplier tube output current is shown for the conventional example shown in Fig. 1 and the case of the embodiment of the present invention shown in Fig. 2. Fig. 4 shows the relationship between the EB and the photomultiplier tube output current. FIG. 5 is a diagram showing an embodiment of the present invention in which the focusing electrode is shaped like a rectangular tube. 1...Primary (scanning) electron beam, 3...Sample, 5...Scintillator, 7...Secondary electrons generated on the sample surface, 8... ...Secondary electrons generated on the surface of the relay electrode, 9...Relay electrode, 12.
...Focusing electrode.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 試料の近傍に中継電極を設け、該中継電極にバイアス電
圧を印加して、一次電子線が試料面を走査照射すること
によって発生した二次電子を前記中継電極に衝突させ、
該中継電極において発生した二次電子を二次電子検出器
で検出して信号電流を得るようにした走査電子顕微鏡に
おいて、二次電子の通路に沿って集束電極を配設し、該
集束電極と前記中継電極に約300 V以上のバイアス
電圧を印加することを特徴とする走査電子顕微鏡。
A relay electrode is provided near the sample, a bias voltage is applied to the relay electrode, and secondary electrons generated by scanning and irradiating the sample surface with the primary electron beam collide with the relay electrode,
In a scanning electron microscope in which a signal current is obtained by detecting secondary electrons generated at the relay electrode with a secondary electron detector, a focusing electrode is disposed along the path of the secondary electrons, and a focusing electrode is arranged along the path of the secondary electrons. A scanning electron microscope characterized in that a bias voltage of about 300 V or more is applied to the relay electrode.
JP8462782U 1982-06-09 1982-06-09 scanning electron microscope Expired JPS5854783Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8462782U JPS5854783Y2 (en) 1982-06-09 1982-06-09 scanning electron microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8462782U JPS5854783Y2 (en) 1982-06-09 1982-06-09 scanning electron microscope

Publications (2)

Publication Number Publication Date
JPS585275U JPS585275U (en) 1983-01-13
JPS5854783Y2 true JPS5854783Y2 (en) 1983-12-14

Family

ID=29879971

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8462782U Expired JPS5854783Y2 (en) 1982-06-09 1982-06-09 scanning electron microscope

Country Status (1)

Country Link
JP (1) JPS5854783Y2 (en)

Also Published As

Publication number Publication date
JPS585275U (en) 1983-01-13

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