JPS5978630U - Electron beam exposure equipment - Google Patents
Electron beam exposure equipmentInfo
- Publication number
- JPS5978630U JPS5978630U JP17446382U JP17446382U JPS5978630U JP S5978630 U JPS5978630 U JP S5978630U JP 17446382 U JP17446382 U JP 17446382U JP 17446382 U JP17446382 U JP 17446382U JP S5978630 U JPS5978630 U JP S5978630U
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- current
- coils
- control
- beam exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 title claims 4
- 238000010586 diagram Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Landscapes
- Electron Beam Exposure (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は一般的なビニム露光装置の光学鏡筒部構成を示
す模式図、第２図は本考案の一実施例に係わる電流制御
部構成を示すブロック図である。
１・・・電子銃、２． ３． ４・・・レンズ、５・・
・試料１．６，７・・・偏向板、８． ９． １０・・
・軸合わせコイル、１１・・・非点補正フィル、２１・
・・計算機、２２・・田−タリエンコーダ、２３，２８
．２９１〜２９７・・・スイッチ、２４・・・電流制御
回路、２４１〜２４７・・・制御ブロック、２５・・・
レジスタ、２６・・・デジタル・アナログ・コンバータ
、２７・・・電流増幅器、３０・・・切換スイッチ。FIG. 1 is a schematic diagram showing the structure of an optical lens barrel section of a general vinyl exposure apparatus, and FIG. 2 is a block diagram showing the structure of a current control section according to an embodiment of the present invention. 1...Electron gun, 2. 3. 4...lens, 5...
・Sample 1.6, 7... Deflection plate, 8. 9. 10...
・Axis alignment coil, 11... Stigma correction filter, 21・
・・Computer, 22 ・・Tari encoder, 23, 28
．． 291-297...Switch, 24...Current control circuit, 241-247...Control block, 25...
Register, 26... Digital-to-analog converter, 27... Current amplifier, 30... Changeover switch.
Claims (1)
れた電子ビームを集束すると共に試料上で走査して試料
上に所望パターンを露光する電子ビーム露光装置におい
て、前記コイルにそれぞれ接続され、入力指令を一時記
憶しその記憶情報に従って上記各コイルに流れる電流を
それぞれ制御する複数の制御ブロックからなる電流制御
回路と、計算機からの指令を上記各制御ブロック番と選
択的に入力し前記各コイルに流す電流を自動的に制御す
る手段と、ロータリエンコーダ及び複数のスイッチから
なり、上記ロータリエンコーダにセットした指令を上記
スイッチを介して前記各制御ブロックに選択的に入力し
前記各コイルに流す電流を手動で制御する手段とを具備
してなることを特徴とする電子ビーム露光装置。In an electron beam exposure apparatus that is equipped with a plurality of electromagnetic coils and deflectors, and that focuses an electron beam emitted from an electron gun and scans it on a sample to expose a desired pattern on the sample, the input A current control circuit consisting of a plurality of control blocks that temporarily stores commands and controls the current flowing to each of the coils according to the stored information, and a current control circuit that selectively inputs commands from a computer to each of the control block numbers and controls the current flowing to each of the coils. It consists of a means for automatically controlling the current to flow, a rotary encoder, and a plurality of switches, and a command set in the rotary encoder is selectively inputted to each of the control blocks via the switch to control the current to flow to each of the coils. 1. An electron beam exposure apparatus comprising: manual control means.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17446382U JPS5978630U (en) | 1982-11-18 | 1982-11-18 | Electron beam exposure equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17446382U JPS5978630U (en) | 1982-11-18 | 1982-11-18 | Electron beam exposure equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5978630U true JPS5978630U (en) | 1984-05-28 |
Family
ID=30379804
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17446382U Pending JPS5978630U (en) | 1982-11-18 | 1982-11-18 | Electron beam exposure equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5978630U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63176459A (en) * | 1987-01-14 | 1988-07-20 | Ishikawajima Harima Heavy Ind Co Ltd | Method for controlling vapor deposition speed for vacuum deposition device |
-
1982
- 1982-11-18 JP JP17446382U patent/JPS5978630U/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63176459A (en) * | 1987-01-14 | 1988-07-20 | Ishikawajima Harima Heavy Ind Co Ltd | Method for controlling vapor deposition speed for vacuum deposition device |
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