JPS60166967U - scanning electron microscope - Google Patents

scanning electron microscope

Info

Publication number
JPS60166967U
JPS60166967U JP5335084U JP5335084U JPS60166967U JP S60166967 U JPS60166967 U JP S60166967U JP 5335084 U JP5335084 U JP 5335084U JP 5335084 U JP5335084 U JP 5335084U JP S60166967 U JPS60166967 U JP S60166967U
Authority
JP
Japan
Prior art keywords
electron microscope
scanning electron
axis
detector
conjunction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5335084U
Other languages
Japanese (ja)
Inventor
渡部　忠雄
Original Assignee
株式会社日立製作所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社日立製作所 filed Critical 株式会社日立製作所
Priority to JP5335084U priority Critical patent/JPS60166967U/en
Publication of JPS60166967U publication Critical patent/JPS60166967U/en
Pending legal-status Critical Current

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  • Electron Sources, Ion Sources (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は、走査電子顕微鏡の原理図である。 ２・・・電子線、８・・・軸補正コイル、４ｒ・・・軸
ズレ、１０・・・補正電流設定回路、１１・・・メモリ
ー回路、ΔＣ・・・軸補正量、１２・・・二次電子検出
器、９・・・補正電源。FIG. 1 is a diagram showing the principle of a scanning electron microscope. 2... Electron beam, 8... Axis correction coil, 4r... Axis deviation, 10... Correction current setting circuit, 11... Memory circuit, ΔC... Axis correction amount, 12... Secondary electron detector, 9...correction power supply.

Claims (1)

【実用新案登録請求の範囲】 １　電子線通路の近傍に高電圧を印加した検出器を備え
た走査電子顕微鏡において、検出器の高電圧電界により
軸ズレした電子線を加速電圧に連動して軸補正すること
を特徴とする走査電子顕微鏡。 ２　実用新案登録請求の範囲第１項において、前記軸補
正装置の軸ズレ補正量をあらかじめ設定してメモリーに
登録したデータを使用加速電圧と連動して読出し軸補正
できることを特徴とする走査電子顕微鏡。[Scope of Claim for Utility Model Registration] 1. In a scanning electron microscope equipped with a detector to which a high voltage is applied near the electron beam path, an electron beam whose axis is deviated by the high voltage electric field of the detector is aligned in conjunction with an accelerating voltage. A scanning electron microscope characterized by correction. 2. A scanning electron microscope according to claim 1, characterized in that the axis correction amount of the axis correction device is set in advance and the data registered in the memory can be read out and axis corrected in conjunction with the acceleration voltage used. .
JP5335084U 1984-04-13 1984-04-13 scanning electron microscope Pending JPS60166967U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5335084U JPS60166967U (en) 1984-04-13 1984-04-13 scanning electron microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5335084U JPS60166967U (en) 1984-04-13 1984-04-13 scanning electron microscope

Publications (1)

Publication Number Publication Date
JPS60166967U true JPS60166967U (en) 1985-11-06

Family

ID=30574129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5335084U Pending JPS60166967U (en) 1984-04-13 1984-04-13 scanning electron microscope

Country Status (1)

Country Link
JP (1) JPS60166967U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1027563A (en) * 1996-07-10 1998-01-27 Jeol Ltd Scanning electron microscope
JP2010219013A (en) * 2009-03-19 2010-09-30 Jeol Ltd Correction method and apparatus for beam irradiation position in sem-fib composite apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1027563A (en) * 1996-07-10 1998-01-27 Jeol Ltd Scanning electron microscope
JP2010219013A (en) * 2009-03-19 2010-09-30 Jeol Ltd Correction method and apparatus for beam irradiation position in sem-fib composite apparatus

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