JPS586128A - フォトマスクの欠落欠陥修正装置 - Google Patents

フォトマスクの欠落欠陥修正装置

Info

Publication number
JPS586128A
JPS586128A JP56103359A JP10335981A JPS586128A JP S586128 A JPS586128 A JP S586128A JP 56103359 A JP56103359 A JP 56103359A JP 10335981 A JP10335981 A JP 10335981A JP S586128 A JPS586128 A JP S586128A
Authority
JP
Japan
Prior art keywords
slit
missing
laser beam
power density
photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56103359A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6220539B2 (enrdf_load_stackoverflow
Inventor
Mikio Hongo
幹雄 本郷
Katsuro Mizukoshi
克郎 水越
Takeoki Miyauchi
宮内　建興
Masao Mitani
正男 三谷
Masaaki Okunaka
正昭 奥中
Takao Kawanabe
川那部　隆夫
Isao Tanabe
田辺　功
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56103359A priority Critical patent/JPS586128A/ja
Publication of JPS586128A publication Critical patent/JPS586128A/ja
Publication of JPS6220539B2 publication Critical patent/JPS6220539B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP56103359A 1981-07-03 1981-07-03 フォトマスクの欠落欠陥修正装置 Granted JPS586128A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56103359A JPS586128A (ja) 1981-07-03 1981-07-03 フォトマスクの欠落欠陥修正装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56103359A JPS586128A (ja) 1981-07-03 1981-07-03 フォトマスクの欠落欠陥修正装置

Publications (2)

Publication Number Publication Date
JPS586128A true JPS586128A (ja) 1983-01-13
JPS6220539B2 JPS6220539B2 (enrdf_load_stackoverflow) 1987-05-07

Family

ID=14351927

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56103359A Granted JPS586128A (ja) 1981-07-03 1981-07-03 フォトマスクの欠落欠陥修正装置

Country Status (1)

Country Link
JP (1) JPS586128A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4510222A (en) * 1982-05-24 1985-04-09 Hitachi, Ltd. Photomask with corrected white defects
JPS6125146A (ja) * 1984-07-13 1986-02-04 Hitachi Ltd フオトマスク欠陥修正方法
JPH03181945A (ja) * 1989-12-12 1991-08-07 Mitsubishi Electric Corp マスクのパターン欠け欠陥の修正方法
JPH0412261A (ja) * 1990-05-01 1992-01-16 Horiba Ltd ガス分析計の自動校正装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51122379A (en) * 1975-04-18 1976-10-26 Fujitsu Ltd Treatment for defect of photo-mask

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51122379A (en) * 1975-04-18 1976-10-26 Fujitsu Ltd Treatment for defect of photo-mask

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4510222A (en) * 1982-05-24 1985-04-09 Hitachi, Ltd. Photomask with corrected white defects
JPS6125146A (ja) * 1984-07-13 1986-02-04 Hitachi Ltd フオトマスク欠陥修正方法
JPH03181945A (ja) * 1989-12-12 1991-08-07 Mitsubishi Electric Corp マスクのパターン欠け欠陥の修正方法
JPH0412261A (ja) * 1990-05-01 1992-01-16 Horiba Ltd ガス分析計の自動校正装置

Also Published As

Publication number Publication date
JPS6220539B2 (enrdf_load_stackoverflow) 1987-05-07

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