JPS6161669B2 - - Google Patents
Info
- Publication number
- JPS6161669B2 JPS6161669B2 JP304581A JP304581A JPS6161669B2 JP S6161669 B2 JPS6161669 B2 JP S6161669B2 JP 304581 A JP304581 A JP 304581A JP 304581 A JP304581 A JP 304581A JP S6161669 B2 JPS6161669 B2 JP S6161669B2
- Authority
- JP
- Japan
- Prior art keywords
- white spot
- photomask
- amount
- laser beam
- spot defect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000007547 defect Effects 0.000 claims description 64
- 229910052751 metal Inorganic materials 0.000 claims description 27
- 239000002184 metal Substances 0.000 claims description 27
- 238000000034 method Methods 0.000 claims description 24
- 150000004696 coordination complex Chemical class 0.000 claims description 18
- 238000012937 correction Methods 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims description 8
- 230000007423 decrease Effects 0.000 claims description 6
- 239000003960 organic solvent Substances 0.000 claims description 6
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 claims description 4
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 238000007493 shaping process Methods 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 229910001961 silver nitrate Inorganic materials 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 230000003247 decreasing effect Effects 0.000 claims 1
- 238000005137 deposition process Methods 0.000 claims 1
- 241000519995 Stachys sylvatica Species 0.000 description 48
- 229910044991 metal oxide Inorganic materials 0.000 description 13
- 150000004706 metal oxides Chemical class 0.000 description 13
- 238000000151 deposition Methods 0.000 description 10
- 238000005286 illumination Methods 0.000 description 9
- 230000003287 optical effect Effects 0.000 description 9
- 239000000758 substrate Substances 0.000 description 9
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 238000003384 imaging method Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- ZRHOFLXFAAEXEE-UHFFFAOYSA-J butanoate;titanium(4+) Chemical compound [Ti+4].CCCC([O-])=O.CCCC([O-])=O.CCCC([O-])=O.CCCC([O-])=O ZRHOFLXFAAEXEE-UHFFFAOYSA-J 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- -1 carboxylic acid silver salts Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 229940113088 dimethylacetamide Drugs 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 150000003378 silver Chemical class 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/105—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/225—Correcting or repairing of printed circuits
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP304581A JPS57118247A (en) | 1981-01-14 | 1981-01-14 | Method and device for correction of white point defect of photomask |
| US06/338,864 US4444801A (en) | 1981-01-14 | 1982-01-12 | Method and apparatus for correcting transparent defects on a photomask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP304581A JPS57118247A (en) | 1981-01-14 | 1981-01-14 | Method and device for correction of white point defect of photomask |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57118247A JPS57118247A (en) | 1982-07-23 |
| JPS6161669B2 true JPS6161669B2 (enrdf_load_stackoverflow) | 1986-12-26 |
Family
ID=11546335
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP304581A Granted JPS57118247A (en) | 1981-01-14 | 1981-01-14 | Method and device for correction of white point defect of photomask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57118247A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2849398B2 (ja) * | 1989-04-25 | 1999-01-20 | 沖電気工業株式会社 | ホトマスク欠陥修正方法 |
-
1981
- 1981-01-14 JP JP304581A patent/JPS57118247A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57118247A (en) | 1982-07-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4444801A (en) | Method and apparatus for correcting transparent defects on a photomask | |
| US4463073A (en) | Method and apparatus for redressing defective photomask | |
| EP0165685B1 (en) | Laser-based system for the total repair of photomasks | |
| KR100190423B1 (ko) | 에멀젼마스크 등의결함 수정방법 및 장치 | |
| JP2799080B2 (ja) | レーザ加工方法とその装置並びに透過型液晶素子、配線パターン欠陥修正方法とその装置 | |
| JPH05192779A (ja) | レーザ加工装置 | |
| JPH0961296A (ja) | カラーフィルタの欠陥修正方法および欠陥修正装置 | |
| JP2002071939A (ja) | カラーフィルタの欠陥修正方法 | |
| JP2797506B2 (ja) | 露光装置 | |
| JPS6161669B2 (enrdf_load_stackoverflow) | ||
| JPS6220539B2 (enrdf_load_stackoverflow) | ||
| JPS6237388B2 (enrdf_load_stackoverflow) | ||
| CN116841117A (zh) | 掩模基板的再生方法及系统 | |
| JP2002005860A (ja) | 微小領域熱物性測定装置 | |
| JPS6052822A (ja) | レーザｃｖｄ装置 | |
| JP2877841B2 (ja) | エマルジョンマスク等の欠陥修正装置 | |
| JPS5922372B2 (ja) | フォトマスク修正方法 | |
| JP2663561B2 (ja) | レーザ加工装置 | |
| JPS6140103B2 (enrdf_load_stackoverflow) | ||
| JPH0777188B2 (ja) | 加工装置 | |
| JP3050556B2 (ja) | エマルジョンマスク等の欠陥部修正方法 | |
| US12287579B2 (en) | High-performance EUV microscope device with free-form illumination system structure having elliptical mirror | |
| JPS642935B2 (enrdf_load_stackoverflow) | ||
| JPS6340316A (ja) | 半導体製造装置 | |
| JPH05237676A (ja) | レーザ加工装置 |