JPS57118247A - Method and device for correction of white point defect of photomask - Google Patents

Method and device for correction of white point defect of photomask

Info

Publication number
JPS57118247A
JPS57118247A JP304581A JP304581A JPS57118247A JP S57118247 A JPS57118247 A JP S57118247A JP 304581 A JP304581 A JP 304581A JP 304581 A JP304581 A JP 304581A JP S57118247 A JPS57118247 A JP S57118247A
Authority
JP
Japan
Prior art keywords
film
irradiation
laser
deposition
laser beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP304581A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6161669B2 (enrdf_load_stackoverflow
Inventor
Mikio Hongo
Masao Mitani
Takeoki Miyauchi
Masaaki Okunaka
Katsuro Mizukoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP304581A priority Critical patent/JPS57118247A/ja
Priority to US06/338,864 priority patent/US4444801A/en
Publication of JPS57118247A publication Critical patent/JPS57118247A/ja
Publication of JPS6161669B2 publication Critical patent/JPS6161669B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/105—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/225—Correcting or repairing of printed circuits

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP304581A 1981-01-14 1981-01-14 Method and device for correction of white point defect of photomask Granted JPS57118247A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP304581A JPS57118247A (en) 1981-01-14 1981-01-14 Method and device for correction of white point defect of photomask
US06/338,864 US4444801A (en) 1981-01-14 1982-01-12 Method and apparatus for correcting transparent defects on a photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP304581A JPS57118247A (en) 1981-01-14 1981-01-14 Method and device for correction of white point defect of photomask

Publications (2)

Publication Number Publication Date
JPS57118247A true JPS57118247A (en) 1982-07-23
JPS6161669B2 JPS6161669B2 (enrdf_load_stackoverflow) 1986-12-26

Family

ID=11546335

Family Applications (1)

Application Number Title Priority Date Filing Date
JP304581A Granted JPS57118247A (en) 1981-01-14 1981-01-14 Method and device for correction of white point defect of photomask

Country Status (1)

Country Link
JP (1) JPS57118247A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02282743A (ja) * 1989-04-25 1990-11-20 Oki Electric Ind Co Ltd ホトマスク欠陥修正方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02282743A (ja) * 1989-04-25 1990-11-20 Oki Electric Ind Co Ltd ホトマスク欠陥修正方法

Also Published As

Publication number Publication date
JPS6161669B2 (enrdf_load_stackoverflow) 1986-12-26

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