JPS57118247A - Method and device for correction of white point defect of photomask - Google Patents

Method and device for correction of white point defect of photomask

Info

Publication number
JPS57118247A
JPS57118247A JP304581A JP304581A JPS57118247A JP S57118247 A JPS57118247 A JP S57118247A JP 304581 A JP304581 A JP 304581A JP 304581 A JP304581 A JP 304581A JP S57118247 A JPS57118247 A JP S57118247A
Authority
JP
Japan
Prior art keywords
film
irradiation
laser
deposition
laser beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP304581A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6161669B2 (enrdf_load_stackoverflow
Inventor
Mikio Hongo
Masao Mitani
Takeoki Miyauchi
Masaaki Okunaka
Katsuro Mizukoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP304581A priority Critical patent/JPS57118247A/ja
Priority to US06/338,864 priority patent/US4444801A/en
Publication of JPS57118247A publication Critical patent/JPS57118247A/ja
Publication of JPS6161669B2 publication Critical patent/JPS6161669B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/105—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/225—Correcting or repairing of printed circuits

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP304581A 1981-01-14 1981-01-14 Method and device for correction of white point defect of photomask Granted JPS57118247A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP304581A JPS57118247A (en) 1981-01-14 1981-01-14 Method and device for correction of white point defect of photomask
US06/338,864 US4444801A (en) 1981-01-14 1982-01-12 Method and apparatus for correcting transparent defects on a photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP304581A JPS57118247A (en) 1981-01-14 1981-01-14 Method and device for correction of white point defect of photomask

Publications (2)

Publication Number Publication Date
JPS57118247A true JPS57118247A (en) 1982-07-23
JPS6161669B2 JPS6161669B2 (enrdf_load_stackoverflow) 1986-12-26

Family

ID=11546335

Family Applications (1)

Application Number Title Priority Date Filing Date
JP304581A Granted JPS57118247A (en) 1981-01-14 1981-01-14 Method and device for correction of white point defect of photomask

Country Status (1)

Country Link
JP (1) JPS57118247A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02282743A (ja) * 1989-04-25 1990-11-20 Oki Electric Ind Co Ltd ホトマスク欠陥修正方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02282743A (ja) * 1989-04-25 1990-11-20 Oki Electric Ind Co Ltd ホトマスク欠陥修正方法

Also Published As

Publication number Publication date
JPS6161669B2 (enrdf_load_stackoverflow) 1986-12-26

Similar Documents

Publication Publication Date Title
ATE265864T1 (de) Sterilisierung von flüssigen klebstoffen durch bestrahlung mit einem elektronenstrahl
DE69312307D1 (de) Verfahren zum herstellen von dünnschichten durch gepulste excimerlaser-verdampfung
JPS5637635A (en) Manufacture of semiconductor device
JPS53135276A (en) Correcting method for defect of photomask
JPS57118247A (en) Method and device for correction of white point defect of photomask
JPS5429843A (en) Controlling method for composition and thickness of plated multicomponent alloy films
JPS5565239A (en) Method of forming film of titanium oxide on plastic base plate
JPS51121255A (en) Production method for thin film with piezo-electric characteristics
JPS5443681A (en) Electron beam light-exposing method
JPS56145339A (en) Measuring method for quantity of chlorine in polyvinyl chloride resin
JPS53106646A (en) Method and apparatus for vacuum evaporation plating
JPS5744151A (en) Manufacture of photomask
JPS5785228A (en) Defect correction of photo mask using laser
JPS54132793A (en) Conductive jointing method
JPS51115764A (en) Manufacturing method of a magnetron
JPS5253781A (en) Method of producing thin film by spattering
JPS55115710A (en) Frequency adjustment method for thickness slide vibrator
UA12589A (uk) Спосіб виготовлеhhя плівки hапівпровідhикового оксидhого скла
JPS57833A (en) Target for image pick-up tube
JPS57188673A (en) Formation of thin film by vacuum
JPS57162430A (en) Process for positive type fine pattern formation
JPS56112729A (en) Exposure of electron beam
JPS5693323A (en) Correcting method for photomask using laser beam and device thereof
DE2629034C3 (de) Verfahren zum Überziehen eines Blitzlampenkolbens
JPS5220294A (en) Method of and apparatus for manufacturing compound thin film