JPS5860538A - パタ−ン検査方法 - Google Patents

パタ−ン検査方法

Info

Publication number
JPS5860538A
JPS5860538A JP56158993A JP15899381A JPS5860538A JP S5860538 A JPS5860538 A JP S5860538A JP 56158993 A JP56158993 A JP 56158993A JP 15899381 A JP15899381 A JP 15899381A JP S5860538 A JPS5860538 A JP S5860538A
Authority
JP
Japan
Prior art keywords
pattern
patterns
difference signal
memory
actual
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56158993A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6239816B2 (enrdf_load_stackoverflow
Inventor
Shogo Matsui
正五 松井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56158993A priority Critical patent/JPS5860538A/ja
Publication of JPS5860538A publication Critical patent/JPS5860538A/ja
Publication of JPS6239816B2 publication Critical patent/JPS6239816B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP56158993A 1981-10-06 1981-10-06 パタ−ン検査方法 Granted JPS5860538A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56158993A JPS5860538A (ja) 1981-10-06 1981-10-06 パタ−ン検査方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56158993A JPS5860538A (ja) 1981-10-06 1981-10-06 パタ−ン検査方法

Publications (2)

Publication Number Publication Date
JPS5860538A true JPS5860538A (ja) 1983-04-11
JPS6239816B2 JPS6239816B2 (enrdf_load_stackoverflow) 1987-08-25

Family

ID=15683872

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56158993A Granted JPS5860538A (ja) 1981-10-06 1981-10-06 パタ−ン検査方法

Country Status (1)

Country Link
JP (1) JPS5860538A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59132129A (ja) * 1983-01-19 1984-07-30 Hitachi Ltd 欠陥検査装置
JPS62113436A (ja) * 1985-11-13 1987-05-25 Toshiba Corp 半導体ペレツトの外観検査方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50127574A (enrdf_load_stackoverflow) * 1974-03-27 1975-10-07
JPS5225575A (en) * 1975-08-22 1977-02-25 Hitachi Ltd Inspection method of the state of object

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50127574A (enrdf_load_stackoverflow) * 1974-03-27 1975-10-07
JPS5225575A (en) * 1975-08-22 1977-02-25 Hitachi Ltd Inspection method of the state of object

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59132129A (ja) * 1983-01-19 1984-07-30 Hitachi Ltd 欠陥検査装置
JPS62113436A (ja) * 1985-11-13 1987-05-25 Toshiba Corp 半導体ペレツトの外観検査方法

Also Published As

Publication number Publication date
JPS6239816B2 (enrdf_load_stackoverflow) 1987-08-25

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