JPS5850754A - 選択酸化膜の形成法 - Google Patents

選択酸化膜の形成法

Info

Publication number
JPS5850754A
JPS5850754A JP56150337A JP15033781A JPS5850754A JP S5850754 A JPS5850754 A JP S5850754A JP 56150337 A JP56150337 A JP 56150337A JP 15033781 A JP15033781 A JP 15033781A JP S5850754 A JPS5850754 A JP S5850754A
Authority
JP
Japan
Prior art keywords
layer
silicon
opening
polycrystalline
oxide film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56150337A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6141136B2 (enExample
Inventor
Kenji Tominaga
健司 富永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp, Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electronics Corp
Priority to JP56150337A priority Critical patent/JPS5850754A/ja
Publication of JPS5850754A publication Critical patent/JPS5850754A/ja
Publication of JPS6141136B2 publication Critical patent/JPS6141136B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10W10/0126—
    • H10W10/0121—
    • H10W10/13—

Landscapes

  • Local Oxidation Of Silicon (AREA)
  • Element Separation (AREA)
JP56150337A 1981-09-21 1981-09-21 選択酸化膜の形成法 Granted JPS5850754A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56150337A JPS5850754A (ja) 1981-09-21 1981-09-21 選択酸化膜の形成法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56150337A JPS5850754A (ja) 1981-09-21 1981-09-21 選択酸化膜の形成法

Publications (2)

Publication Number Publication Date
JPS5850754A true JPS5850754A (ja) 1983-03-25
JPS6141136B2 JPS6141136B2 (enExample) 1986-09-12

Family

ID=15494794

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56150337A Granted JPS5850754A (ja) 1981-09-21 1981-09-21 選択酸化膜の形成法

Country Status (1)

Country Link
JP (1) JPS5850754A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63229087A (ja) * 1987-03-17 1988-09-22 東芝テック株式会社 トリマ−付き電気かみそり
US6306726B1 (en) * 1999-08-30 2001-10-23 Micron Technology, Inc. Method of forming field oxide

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0361218A (ja) * 1989-07-27 1991-03-18 Canon Inc シート搬送装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63229087A (ja) * 1987-03-17 1988-09-22 東芝テック株式会社 トリマ−付き電気かみそり
US6306726B1 (en) * 1999-08-30 2001-10-23 Micron Technology, Inc. Method of forming field oxide
US6326672B1 (en) 1999-08-30 2001-12-04 Micron Technology, Inc. LOCOS fabrication processes and semiconductive material structures

Also Published As

Publication number Publication date
JPS6141136B2 (enExample) 1986-09-12

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