JPS5848483A - Manufacture of nonlinear element comprising metal- insulator-metal - Google Patents

Manufacture of nonlinear element comprising metal- insulator-metal

Info

Publication number
JPS5848483A
JPS5848483A JP56145883A JP14588381A JPS5848483A JP S5848483 A JPS5848483 A JP S5848483A JP 56145883 A JP56145883 A JP 56145883A JP 14588381 A JP14588381 A JP 14588381A JP S5848483 A JPS5848483 A JP S5848483A
Authority
JP
Japan
Prior art keywords
metal
insulator
layer
resist
anodic oxidation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56145883A
Other languages
Japanese (ja)
Inventor
Takashi Nakazawa
尊史 中澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Epson Corp
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK, Epson Corp filed Critical Seiko Epson Corp
Priority to JP56145883A priority Critical patent/JPS5848483A/en
Publication of JPS5848483A publication Critical patent/JPS5848483A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching

Abstract

PURPOSE:To each only the metal on the first layer wherein the part not requiring metal-insulator-metal structure is subjected to anodic oxidation, without etching a glass substrate 1, when the first layer metal and an insulator are etched, by masking the non-etching part by resist. CONSTITUTION:The figure shows a resist pattern. A numeral 4 is a glass substrate, a numeral 5 is a metal, wherein the part not requiring metal-insulator- metal structure is subjected to anodic oxidation, a numeral 6 is a resist, and a numeral 7 is the part, which is used as metal, wherein the first layer of the metal-insulator-metal structure is subjected to the anodic oxidation. Except for the part 7 which is used as the metal-insulator-metal structure, the metal 5 which has been unnecessarily subjected to the anodic oxidation is etched. In order to prevent the etching of the glass surface at the time of etching, all the part which is not used as the metal-insulator-metal structure, except the metal 5 which has been subjected to the anodic oxidation is masked by the resist.

Description

【発明の詳細な説明】 本発明は、ガラス基板上にメタル・インシュレーター・
メタルから成る非線形素子を１マトリツクス状に配し九
メタル・インシュレーター・メタルの製造過程でのレジ
ストパターン形状に関する〇マトリックス状に配したメ
タル−インシュレーター・メタルの一層目の金属線、陽
極酸化により、インシュレーターを形成するので電気的
に接続さｎていなけｎばならない。陽極酸化＃Ｃより、
インタｚ　ｌ／−ター暫ＳａＷ、メタル・インシュレー
ター・メタルとして使用しない不要な部分を埴り除く必
要がある。[Detailed Description of the Invention] The present invention provides a metal insulator on a glass substrate.
Non-linear elements made of metal are arranged in a matrix shape.9Metal InsulatorMetal Resist pattern shape in the metal manufacturing process〇Metal insulator Metal arranged in a matrix The first layer of metal wire is anodized to create an insulator. , so they must be electrically connected. From anodizing #C,
It is necessary to remove unnecessary portions that will not be used as interlayer SaW, metal, insulator, or metal.

従来は、第１図処示す様に、メタル・インシュレーター
・メタルで使用する部分のみにレジスト５ｔバターニン
グした。Conventionally, as shown in Figure 1, resist 5t patterning was applied only to the parts used for metal, insulator, and metal.

このようなレジストパターンを用いて、陽極酸化さＡ九
一層目の金属２ｔ−エツチングすると、ガラスｉ［１の
露出している面がエツチング畜ｎてし筐うという欠点が
あつ友・ また、ガラス基＆１がエツチングさｎる九め処党の透過
率が悪くなってし１うという欠点があった。When etching the metal 2t of the anodized 91st layer using such a resist pattern, there is a drawback that the exposed surface of the glass 1 is etched. There was a drawback in that the transmittance of the glass substrate deteriorated when the glass substrate was etched.

不発’ＪＡは、かかる欠点を除去したもので、七の目的
は、カラス１板１がエツチングされることすく、メタル
・インシュレーター・メタルの不必要な部分の陽ｉ１歳
化さｎた一層目の金属２ｔエツチングするレジストパタ
ーンｔ″提供するｔのでちる。Fudo'JA is a product that eliminates such drawbacks, and the purpose of the seventh layer is to prevent the crow plate from being etched, and to remove unnecessary parts of the metal insulator and the first layer. The metal 2t is etched to provide a resist pattern t''.

以下実施例にｉづいて不発＃４’に＃（、（説曲丁４゜ 第５図は、本４ＩＩ５明に蕪づ（レジスト形状で、４は
ガラ不基板、５はメタル・インシュレーターやメタルの
不必要な部分の＃ＩＩ極酸化さｎた金属６に、レジスト
、７はメタルナインシュレータ−・メタルの一層目のｔ
ｔｉｔ極酸化さｎた金属として使用される部分で＃４ｏ
＃’図はその断面１で＃）ゐ０メタル・インシュレータ
ー・メタルとして使用される部分７を除いて、不必要な
陽極酸化され友金属５１１−エツチングする０エツチン
グの際、ガラス面がエツチングされるのｔ防ぐために、
メタル・インシュレーター・メタルとし下用いない、陽
極酸化し皮金属５荀除く丁べての部分音レジストでおお
ったものである。Below, based on the example i, the unexploded #4' is #(, (Sekkyokud4゜Figure 5 is the resist shape, 4 is a glass non-substrate, 5 is a metal insulator or metal The unnecessary parts of the #II polarized metal 6 are covered with resist, and 7 is the first layer of metal insulator metal.
Tit #4o in the part used as extremely oxidized metal
＃'The figure shows cross section 1 of the same. In order to prevent
It is made of metal insulator, and is anodized and covered with a partial tone resist on all sides except for the metal insulator.

このような方法上用いることにより、メタル−インシュ
レータ〜・メタルに使用しない不必要な陽極酸化さｎな
い金属の−９−にエツチングできる利点がある。By using this method, there is an advantage that -9- of the metal can be etched without unnecessary anodic oxidation that is not used for the metal insulator.

また露出してｈるガラス基板４がレジストでお２ｖれて
いるためにガラス面がエツチングさｒＬることがない利
点がめる０ １次、エツチングの際、ｇ出しているカラス基板４に汚
ｎが付着しないという利点がある。In addition, since the exposed glass substrate 4 is covered with resist, there is an advantage that the glass surface is not etched. It has the advantage of not sticking.

本発明は、マトリックス状にメタル嗜インシエレーター
・メタルより成る非線形素子を有するガラス基板の製造
に有効となる。The present invention is effective for manufacturing a glass substrate having a nonlinear element made of a metal insulator metal in a matrix shape.

【図面の簡単な説明】[Brief explanation of the drawing]

第１図、第２−はメタル・インシュレーター・メタルで
使用する部分のみにレジストをパターニングし友もので
あり、第１図に平面−２第２−は、＠面図でめる０ 第３１．第４図は不鞄明に基づくレジスト形状で第３図
は平面図、第４■は断面図である０１．４・・・・・・
ガラス基板 ２・・・・・・陽極酸化さｆ′Ｌ九一層目の金属５．６
・・・・・令　レジスト ５・・・・・・メタル・インシュレータ−・メタルのり
必豪な部分の陽極酸化さｎた金属 ７・・・・・・メタル・インシュレーター・メタルの鳩
目の陽極酸比重ｎた金属 以　　上 信州精器株式会社 出鳳人株式会社諏訪精工２會 代理人　　　９　　最　　上　　　務 第１図 八 ９５２図 第４図 手続補正書（自発） 昭和５７年　１月２０日 特許庁長官殿 １、事件の表示 昭和ｓ４年特許願第１４５８８ｉ号 ２　発明の名称 非線形素子の製造方法 ３　補正をする者 事件との関係　出願人 手続補正書 １、発明の名称 ［メタル、インシュレーター、メタルエタ成非線形素子
の製造方法」とあるｔ「非線形素子の製造方法」に補正
する。 ２、特許請求の範囲Figures 1 and 2- are used to pattern resist only on the parts used for metal insulator metal. Fig. 4 shows the resist shape based on the opacity, Fig. 3 is a plan view, and Fig. 4 is a cross-sectional view.01.4...
Glass substrate 2...Anodized f'L 91st layer metal 5.6
...Resist 5...Metal, insulator, anodic oxidation of metal glue-required parts Metal 7...Metal, insulator, anodic oxidation specific gravity of metal eyelet Shinshu Seiki Co., Ltd. Dehojin Co., Ltd. Suwa Seiko 2 Agent 9 Mogami Affairs Figure 1 Figure 8952 Figure 4 Procedural Amendment (Voluntary) January 20, 1980 Commissioner of the Patent Office 1. Indication of the case 1924 Patent Application No. 14588i 2 Title of the invention Method for manufacturing nonlinear elements 3 Person making the amendment Relationship to the case Applicant's procedural amendment 1 Title of the invention [Metal, insulator, metal etching nonlinear ``Method for manufacturing a nonlinear element'' is corrected to ``Method for manufacturing a nonlinear element''. 2. Scope of claims

Claims (1)

【特許請求の範囲】[Claims] １［［１メタル・インシュレーターｅメタルヨリ成る非
線形素子ｔ１ガラス基板上にマトリックス状に配した非
畿形素子において、前記メタル・インシュレータ−・メ
タルの一層目のメタルを所足の形状にバターニングし、
前記一層目のメタル管陽極酸化し、−前記一層目のメタ
ルおよびインシエレーターｔ１所足の形状にエツチング
し、二層目のメタルｔｓｘ＃′ＦＪｂａ造方式ＩＬ訃い
て、前記一層目のメタルおよびインシュレーターをエツ
チングする際、非エツチング部分をレジストでおおった
ことｔ−物像とするメタル・インシュレーターΦメタル
より成る非−形素子の製造方法。1 [[1 Metal insulator e Non-linear element made of metal t1 Non-linear element arranged in a matrix on a glass substrate, buttering the first layer of the metal insulator metal into a desired shape,
The first layer of metal tube is anodized, - the first layer of metal and incillator t1 are etched into the shape, the second layer of metal is tsx#'FJba construction method IL, the first layer of metal and A method for manufacturing a non-form element made of a metal insulator Φ metal, in which the non-etched portion is covered with a resist when etching the insulator.
JP56145883A 1981-09-16 1981-09-16 Manufacture of nonlinear element comprising metal- insulator-metal Pending JPS5848483A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56145883A JPS5848483A (en) 1981-09-16 1981-09-16 Manufacture of nonlinear element comprising metal- insulator-metal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56145883A JPS5848483A (en) 1981-09-16 1981-09-16 Manufacture of nonlinear element comprising metal- insulator-metal

Publications (1)

Publication Number Publication Date
JPS5848483A true JPS5848483A (en) 1983-03-22

Family

ID=15395249

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56145883A Pending JPS5848483A (en) 1981-09-16 1981-09-16 Manufacture of nonlinear element comprising metal- insulator-metal

Country Status (1)

Country Link
JP (1) JPS5848483A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0180104A2 (en) * 1984-10-30 1986-05-07 Research Development Corporation of Japan Microwave device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0180104A2 (en) * 1984-10-30 1986-05-07 Research Development Corporation of Japan Microwave device

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