JPS5846642A - ウエ−ハ洗浄乾燥装置 - Google Patents

ウエ−ハ洗浄乾燥装置

Info

Publication number
JPS5846642A
JPS5846642A JP56144292A JP14429281A JPS5846642A JP S5846642 A JPS5846642 A JP S5846642A JP 56144292 A JP56144292 A JP 56144292A JP 14429281 A JP14429281 A JP 14429281A JP S5846642 A JPS5846642 A JP S5846642A
Authority
JP
Japan
Prior art keywords
wafer
turntable
side plate
cleaning
washing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56144292A
Other languages
English (en)
Japanese (ja)
Other versions
JPS622455B2 (https=
Inventor
Masatoshi Yamazaki
山崎　雅敏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP56144292A priority Critical patent/JPS5846642A/ja
Publication of JPS5846642A publication Critical patent/JPS5846642A/ja
Publication of JPS622455B2 publication Critical patent/JPS622455B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Drying Of Solid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP56144292A 1981-09-12 1981-09-12 ウエ−ハ洗浄乾燥装置 Granted JPS5846642A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56144292A JPS5846642A (ja) 1981-09-12 1981-09-12 ウエ−ハ洗浄乾燥装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56144292A JPS5846642A (ja) 1981-09-12 1981-09-12 ウエ−ハ洗浄乾燥装置

Publications (2)

Publication Number Publication Date
JPS5846642A true JPS5846642A (ja) 1983-03-18
JPS622455B2 JPS622455B2 (https=) 1987-01-20

Family

ID=15358670

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56144292A Granted JPS5846642A (ja) 1981-09-12 1981-09-12 ウエ−ハ洗浄乾燥装置

Country Status (1)

Country Link
JP (1) JPS5846642A (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61162046U (https=) * 1985-03-27 1986-10-07
JPS63110031U (https=) * 1987-01-09 1988-07-15
EP0631846A1 (en) * 1993-06-14 1995-01-04 International Business Machines Corporation Mounting apparatus for cryogenic aerosol cleaning

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61162046U (https=) * 1985-03-27 1986-10-07
JPS63110031U (https=) * 1987-01-09 1988-07-15
EP0631846A1 (en) * 1993-06-14 1995-01-04 International Business Machines Corporation Mounting apparatus for cryogenic aerosol cleaning
EP0712690A1 (en) * 1993-06-14 1996-05-22 International Business Machines Corporation Mounting apparatus for cryogenic aerosol cleaning

Also Published As

Publication number Publication date
JPS622455B2 (https=) 1987-01-20

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