JPS5835918A - 石英反応管及びその製造方法 - Google Patents

石英反応管及びその製造方法

Info

Publication number
JPS5835918A
JPS5835918A JP13517181A JP13517181A JPS5835918A JP S5835918 A JPS5835918 A JP S5835918A JP 13517181 A JP13517181 A JP 13517181A JP 13517181 A JP13517181 A JP 13517181A JP S5835918 A JPS5835918 A JP S5835918A
Authority
JP
Japan
Prior art keywords
quartz
tube
transparent
transparent quartz
crystalline
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13517181A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0445212B2 (fr
Inventor
Nobuyuki Takemoto
竹本　信行
Masayoshi Aigou
藍郷　正善
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13517181A priority Critical patent/JPS5835918A/ja
Publication of JPS5835918A publication Critical patent/JPS5835918A/ja
Publication of JPH0445212B2 publication Critical patent/JPH0445212B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP13517181A 1981-08-28 1981-08-28 石英反応管及びその製造方法 Granted JPS5835918A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13517181A JPS5835918A (ja) 1981-08-28 1981-08-28 石英反応管及びその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13517181A JPS5835918A (ja) 1981-08-28 1981-08-28 石英反応管及びその製造方法

Publications (2)

Publication Number Publication Date
JPS5835918A true JPS5835918A (ja) 1983-03-02
JPH0445212B2 JPH0445212B2 (fr) 1992-07-24

Family

ID=15145489

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13517181A Granted JPS5835918A (ja) 1981-08-28 1981-08-28 石英反応管及びその製造方法

Country Status (1)

Country Link
JP (1) JPS5835918A (fr)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5126871U (fr) * 1974-08-16 1976-02-27

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5126871U (fr) * 1974-08-16 1976-02-27

Also Published As

Publication number Publication date
JPH0445212B2 (fr) 1992-07-24

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