JPS5833154A - 検査装置 - Google Patents

検査装置

Info

Publication number
JPS5833154A
JPS5833154A JP13146781A JP13146781A JPS5833154A JP S5833154 A JPS5833154 A JP S5833154A JP 13146781 A JP13146781 A JP 13146781A JP 13146781 A JP13146781 A JP 13146781A JP S5833154 A JPS5833154 A JP S5833154A
Authority
JP
Japan
Prior art keywords
defect
inspection
wafer
primary
defects
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13146781A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0325738B2 (sv
Inventor
Masakuni Akiba
秋葉　政邦
Hiroto Nagatomo
長友　宏人
Kazuhiko Yonemitsu
米光　一彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Renesas Eastern Japan Semiconductor Inc
Original Assignee
Hitachi Tokyo Electronics Co Ltd
Hitachi Ltd
Hitachi Ome Electronic Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Tokyo Electronics Co Ltd, Hitachi Ltd, Hitachi Ome Electronic Co Ltd filed Critical Hitachi Tokyo Electronics Co Ltd
Priority to JP13146781A priority Critical patent/JPS5833154A/ja
Publication of JPS5833154A publication Critical patent/JPS5833154A/ja
Publication of JPH0325738B2 publication Critical patent/JPH0325738B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP13146781A 1981-08-24 1981-08-24 検査装置 Granted JPS5833154A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13146781A JPS5833154A (ja) 1981-08-24 1981-08-24 検査装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13146781A JPS5833154A (ja) 1981-08-24 1981-08-24 検査装置

Publications (2)

Publication Number Publication Date
JPS5833154A true JPS5833154A (ja) 1983-02-26
JPH0325738B2 JPH0325738B2 (sv) 1991-04-08

Family

ID=15058637

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13146781A Granted JPS5833154A (ja) 1981-08-24 1981-08-24 検査装置

Country Status (1)

Country Link
JP (1) JPS5833154A (sv)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60194535A (ja) * 1984-02-22 1985-10-03 ケイエルエイ・インストラメンツ・コ−ポレ−シヨン ウエハ−検査装置の電気的制御装置
JPS60202949A (ja) * 1984-02-22 1985-10-14 ケイエルエイ・インストラメンツ・コ−ポレ−シヨン パターン化されたウエハーの自動的な検査装置
JPS6199845A (ja) * 1984-10-22 1986-05-17 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 光学的欠陥検出装置
JPS61253758A (ja) * 1985-04-30 1986-11-11 Shimadzu Corp 微小部分析装置
JPS61267246A (ja) * 1985-05-21 1986-11-26 Hitachi Ltd 異物検出装置
JPS625547A (ja) * 1985-07-01 1987-01-12 Ulvac Corp 基板表面上の異物観察装置
JPS6391947A (ja) * 1986-10-03 1988-04-22 Jeol Ltd Ｘ線マイクロアナライザ−
JPH01147513A (ja) * 1987-12-04 1989-06-09 Hitachi Ltd 異物解析装置
JPH03181848A (ja) * 1989-12-12 1991-08-07 Sharp Corp 半導体材料評価装置
EP0685731A1 (en) * 1994-06-02 1995-12-06 Mitsubishi Denki Kabushiki Kaisha Positioning method and analysis method of fine foreign matter and analyzer used therefor
JP2002168793A (ja) * 2000-11-30 2002-06-14 Fuji Photo Film Co Ltd 表面欠陥検査装置および表面欠陥検査方法
JP2004170092A (ja) * 2002-11-18 2004-06-17 Hitachi Electronics Eng Co Ltd 表面検査方法及び表面検査装置
JP2008014822A (ja) * 2006-07-06 2008-01-24 Canon Chemicals Inc 板状体の検査装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5165362A (sv) * 1974-11-30 1976-06-05 Nissin Electric Co Ltd
JPS5618708A (en) * 1979-07-23 1981-02-21 Siemens Ag Optoelectronic inspector

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5165362A (sv) * 1974-11-30 1976-06-05 Nissin Electric Co Ltd
JPS5618708A (en) * 1979-07-23 1981-02-21 Siemens Ag Optoelectronic inspector

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60202949A (ja) * 1984-02-22 1985-10-14 ケイエルエイ・インストラメンツ・コ−ポレ−シヨン パターン化されたウエハーの自動的な検査装置
JPS60194535A (ja) * 1984-02-22 1985-10-03 ケイエルエイ・インストラメンツ・コ−ポレ−シヨン ウエハ−検査装置の電気的制御装置
JPS6199845A (ja) * 1984-10-22 1986-05-17 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 光学的欠陥検出装置
JPS61253758A (ja) * 1985-04-30 1986-11-11 Shimadzu Corp 微小部分析装置
JPS61267246A (ja) * 1985-05-21 1986-11-26 Hitachi Ltd 異物検出装置
JPS625547A (ja) * 1985-07-01 1987-01-12 Ulvac Corp 基板表面上の異物観察装置
JPH0527939B2 (sv) * 1985-07-01 1993-04-22 Ulvac Corp
JPH0528466B2 (sv) * 1986-10-03 1993-04-26 Nippon Electron Optics Lab
JPS6391947A (ja) * 1986-10-03 1988-04-22 Jeol Ltd Ｘ線マイクロアナライザ−
JPH01147513A (ja) * 1987-12-04 1989-06-09 Hitachi Ltd 異物解析装置
JPH03181848A (ja) * 1989-12-12 1991-08-07 Sharp Corp 半導体材料評価装置
EP0685731A1 (en) * 1994-06-02 1995-12-06 Mitsubishi Denki Kabushiki Kaisha Positioning method and analysis method of fine foreign matter and analyzer used therefor
US5715052A (en) * 1994-06-02 1998-02-03 Mitsubishi Denki Kabushiki Kaisha Method of detecting the position and the content of fine foreign matter on substrates and analyzers used therefor
JP2002168793A (ja) * 2000-11-30 2002-06-14 Fuji Photo Film Co Ltd 表面欠陥検査装置および表面欠陥検査方法
JP2004170092A (ja) * 2002-11-18 2004-06-17 Hitachi Electronics Eng Co Ltd 表面検査方法及び表面検査装置
JP2008014822A (ja) * 2006-07-06 2008-01-24 Canon Chemicals Inc 板状体の検査装置

Also Published As

Publication number Publication date
JPH0325738B2 (sv) 1991-04-08

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