JPS58224351A - 感光性印刷版 - Google Patents

感光性印刷版

Info

Publication number
JPS58224351A
JPS58224351A JP57107996A JP10799682A JPS58224351A JP S58224351 A JPS58224351 A JP S58224351A JP 57107996 A JP57107996 A JP 57107996A JP 10799682 A JP10799682 A JP 10799682A JP S58224351 A JPS58224351 A JP S58224351A
Authority
JP
Japan
Prior art keywords
oxonol dye
acid
aluminum
development
dye
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57107996A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0368375B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Akira Nishioka
明 西岡
Norimasa Aotani
青谷　能昌
Kotaro Yamasue
耕太郎 山末
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP57107996A priority Critical patent/JPS58224351A/ja
Priority to US06/506,268 priority patent/US4497888A/en
Priority to DE19833322684 priority patent/DE3322684A1/de
Publication of JPS58224351A publication Critical patent/JPS58224351A/ja
Publication of JPH0368375B2 publication Critical patent/JPH0368375B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
JP57107996A 1982-06-23 1982-06-23 感光性印刷版 Granted JPS58224351A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP57107996A JPS58224351A (ja) 1982-06-23 1982-06-23 感光性印刷版
US06/506,268 US4497888A (en) 1982-06-23 1983-06-21 Light-sensitive o-quinonediazide printing plate with oxonol dye
DE19833322684 DE3322684A1 (de) 1982-06-23 1983-06-23 Lichtempfindliche druckplatte mit einem ueberzug, welcher einen oxonol-farbstoff enthaelt

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57107996A JPS58224351A (ja) 1982-06-23 1982-06-23 感光性印刷版

Publications (2)

Publication Number Publication Date
JPS58224351A true JPS58224351A (ja) 1983-12-26
JPH0368375B2 JPH0368375B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-10-28

Family

ID=14473337

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57107996A Granted JPS58224351A (ja) 1982-06-23 1982-06-23 感光性印刷版

Country Status (3)

Country Link
US (1) US4497888A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS58224351A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3322684A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61258255A (ja) * 1985-05-13 1986-11-15 Fuji Photo Film Co Ltd ポジ型感光性平版印刷版
JPS61271354A (ja) * 1985-05-24 1986-12-01 Japan Synthetic Rubber Co Ltd 集積回路製造用感紫外線ポシ型レジスト
JPH01245250A (ja) * 1988-03-28 1989-09-29 Toshiba Corp ポジ型レジスト組成物
WO2008108406A1 (ja) * 2007-03-05 2008-09-12 Fujifilm Corporation フォトレジスト用化合物、フォトレジスト液、およびこれを用いるエッチング方法
JP2009227984A (ja) * 2008-02-28 2009-10-08 Fujifilm Corp フォトレジスト用化合物、フォトレジスト膜、フォトレジスト材料、フォトレジスト液、およびこれらを用いるエッチング方法

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4524125A (en) * 1982-08-13 1985-06-18 Polychrome Corporation Chemical etching of lithographic aluminum substrate
JPH02502312A (ja) * 1987-12-10 1990-07-26 マクダーミツド　インコーポレーテツド 像反転性乾燥フィルムホトレジスト
JPH02105137A (ja) * 1988-10-14 1990-04-17 Fuji Photo Film Co Ltd ハロゲン化銀写真感光材料
JP2720224B2 (ja) * 1990-06-15 1998-03-04 富士写真フイルム株式会社 感光性平版印刷版
KR960004456A (ko) * 1994-07-08 1996-02-23 미야사끼 료헤이 투명한 착색 미세패턴 형성용 착색제 조성물 및 이의 용도
EP0736806B1 (en) * 1995-04-07 2001-01-03 Agfa-Gevaert N.V. An imaging element for making a lithographic printing plate
ES2181120T3 (es) 1996-04-23 2003-02-16 Kodak Polychrome Graphics Co Compuestos termosensibles para precursores de forma para impresion litografica positiva.
DE69718585T2 (de) * 1996-09-30 2003-08-07 Fuji Photo Film Co., Ltd. Medium für Informationsaufzeichnung
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
JP2002511955A (ja) 1997-07-05 2002-04-16 コダック・ポリクローム・グラフィックス・エルエルシー パターン形成方法
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
US6468711B1 (en) * 1998-09-09 2002-10-22 Fuji Photo Film Co., Ltd. Photosensitive composition and method for manufacturing lithographic printing plate

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3458311A (en) * 1966-06-27 1969-07-29 Du Pont Photopolymerizable elements with solvent removable protective layers
US3619194A (en) * 1969-11-05 1971-11-09 Gary F Mitchell Novel light-absorbing layers for photographic elements containing substituted 1-aminopyridinium dyes
US3891516A (en) * 1970-08-03 1975-06-24 Polychrome Corp Process of electrolyically anodizing a mechanically grained aluminum base and article made thereby
JPS5238056B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1972-05-02 1977-09-27
US3859099A (en) * 1972-12-22 1975-01-07 Eastman Kodak Co Positive plate incorporating diazoquinone
JPS5280022A (en) * 1975-12-26 1977-07-05 Fuji Photo Film Co Ltd Light solubilizable composition
CA1130130A (en) * 1979-03-02 1982-08-24 Raymond G. Lemahieu Photographic silver halide materials comprising a 2-pyrazolin-5-one pentamethine oxonol dye
CA1142527A (en) * 1979-03-02 1983-03-08 Felix J. Moelants Light-absorbing methine dyes and photographic materials containing them
JPS57163234A (en) * 1981-04-01 1982-10-07 Fuji Photo Film Co Ltd Photosensitive composition

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61258255A (ja) * 1985-05-13 1986-11-15 Fuji Photo Film Co Ltd ポジ型感光性平版印刷版
JPS61271354A (ja) * 1985-05-24 1986-12-01 Japan Synthetic Rubber Co Ltd 集積回路製造用感紫外線ポシ型レジスト
JPH01245250A (ja) * 1988-03-28 1989-09-29 Toshiba Corp ポジ型レジスト組成物
WO2008108406A1 (ja) * 2007-03-05 2008-09-12 Fujifilm Corporation フォトレジスト用化合物、フォトレジスト液、およびこれを用いるエッチング方法
JP2009227984A (ja) * 2008-02-28 2009-10-08 Fujifilm Corp フォトレジスト用化合物、フォトレジスト膜、フォトレジスト材料、フォトレジスト液、およびこれらを用いるエッチング方法

Also Published As

Publication number Publication date
DE3322684A1 (de) 1983-12-29
JPH0368375B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-10-28
US4497888A (en) 1985-02-05

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