JPS58215026A - フオト・レジストパタ−ンの形成方法 - Google Patents

フオト・レジストパタ−ンの形成方法

Info

Publication number
JPS58215026A
JPS58215026A JP57097947A JP9794782A JPS58215026A JP S58215026 A JPS58215026 A JP S58215026A JP 57097947 A JP57097947 A JP 57097947A JP 9794782 A JP9794782 A JP 9794782A JP S58215026 A JPS58215026 A JP S58215026A
Authority
JP
Japan
Prior art keywords
patterns
chip
etching
pattern
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57097947A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6253937B2 (enExample
Inventor
Mikio Segawa
幹雄 瀬川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP57097947A priority Critical patent/JPS58215026A/ja
Publication of JPS58215026A publication Critical patent/JPS58215026A/ja
Publication of JPS6253937B2 publication Critical patent/JPS6253937B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP57097947A 1982-06-08 1982-06-08 フオト・レジストパタ−ンの形成方法 Granted JPS58215026A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57097947A JPS58215026A (ja) 1982-06-08 1982-06-08 フオト・レジストパタ−ンの形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57097947A JPS58215026A (ja) 1982-06-08 1982-06-08 フオト・レジストパタ−ンの形成方法

Publications (2)

Publication Number Publication Date
JPS58215026A true JPS58215026A (ja) 1983-12-14
JPS6253937B2 JPS6253937B2 (enExample) 1987-11-12

Family

ID=14205860

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57097947A Granted JPS58215026A (ja) 1982-06-08 1982-06-08 フオト・レジストパタ−ンの形成方法

Country Status (1)

Country Link
JP (1) JPS58215026A (enExample)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50128469A (enExample) * 1974-03-27 1975-10-09
JPS5431282A (en) * 1977-08-12 1979-03-08 Mitsubishi Electric Corp Pattern formation method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50128469A (enExample) * 1974-03-27 1975-10-09
JPS5431282A (en) * 1977-08-12 1979-03-08 Mitsubishi Electric Corp Pattern formation method

Also Published As

Publication number Publication date
JPS6253937B2 (enExample) 1987-11-12

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