JPS58212169A - 三層電極構造を有する半導体装置 - Google Patents
三層電極構造を有する半導体装置Info
- Publication number
- JPS58212169A JPS58212169A JP57094702A JP9470282A JPS58212169A JP S58212169 A JPS58212169 A JP S58212169A JP 57094702 A JP57094702 A JP 57094702A JP 9470282 A JP9470282 A JP 9470282A JP S58212169 A JPS58212169 A JP S58212169A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- aluminum
- sinter
- electrode
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/83—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/60—Electrodes characterised by their materials
- H10D64/62—Electrodes ohmically coupled to a semiconductor
Landscapes
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57094702A JPS58212169A (ja) | 1982-06-04 | 1982-06-04 | 三層電極構造を有する半導体装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57094702A JPS58212169A (ja) | 1982-06-04 | 1982-06-04 | 三層電極構造を有する半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58212169A true JPS58212169A (ja) | 1983-12-09 |
JPH0444430B2 JPH0444430B2 (enrdf_load_stackoverflow) | 1992-07-21 |
Family
ID=14117498
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57094702A Granted JPS58212169A (ja) | 1982-06-04 | 1982-06-04 | 三層電極構造を有する半導体装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58212169A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01255234A (ja) * | 1988-04-05 | 1989-10-12 | Toshiba Corp | 半導体装置 |
JP2002343980A (ja) * | 2001-05-21 | 2002-11-29 | Rohm Co Ltd | 可変容量ダイオード及びその製造方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5444866A (en) * | 1977-09-16 | 1979-04-09 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor device |
-
1982
- 1982-06-04 JP JP57094702A patent/JPS58212169A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5444866A (en) * | 1977-09-16 | 1979-04-09 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor device |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01255234A (ja) * | 1988-04-05 | 1989-10-12 | Toshiba Corp | 半導体装置 |
JP2002343980A (ja) * | 2001-05-21 | 2002-11-29 | Rohm Co Ltd | 可変容量ダイオード及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0444430B2 (enrdf_load_stackoverflow) | 1992-07-21 |
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