JPS58207651A - 静電防止型収容治具 - Google Patents

静電防止型収容治具

Info

Publication number
JPS58207651A
JPS58207651A JP8993182A JP8993182A JPS58207651A JP S58207651 A JPS58207651 A JP S58207651A JP 8993182 A JP8993182 A JP 8993182A JP 8993182 A JP8993182 A JP 8993182A JP S58207651 A JPS58207651 A JP S58207651A
Authority
JP
Japan
Prior art keywords
jig
housing
type containing
preventing type
electrostatic preventing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8993182A
Other languages
English (en)
Japanese (ja)
Other versions
JPH048945B2 (enrdf_load_stackoverflow
Inventor
Masashi Yamamoto
山本　正志
Kunihiro Sakai
酒井　邦弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Hokuetsu Toyo Fibre Co Ltd
Original Assignee
Hitachi Ltd
Toyo Fiber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Toyo Fiber Co Ltd filed Critical Hitachi Ltd
Priority to JP8993182A priority Critical patent/JPS58207651A/ja
Publication of JPS58207651A publication Critical patent/JPS58207651A/ja
Publication of JPH048945B2 publication Critical patent/JPH048945B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67326—Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67326—Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls
    • H01L21/6733—Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls characterized by a material, a roughness, a coating or the like

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Workshop Equipment, Work Benches, Supports, Or Storage Means (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP8993182A 1982-05-28 1982-05-28 静電防止型収容治具 Granted JPS58207651A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8993182A JPS58207651A (ja) 1982-05-28 1982-05-28 静電防止型収容治具

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8993182A JPS58207651A (ja) 1982-05-28 1982-05-28 静電防止型収容治具

Publications (2)

Publication Number Publication Date
JPS58207651A true JPS58207651A (ja) 1983-12-03
JPH048945B2 JPH048945B2 (enrdf_load_stackoverflow) 1992-02-18

Family

ID=13984436

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8993182A Granted JPS58207651A (ja) 1982-05-28 1982-05-28 静電防止型収容治具

Country Status (1)

Country Link
JP (1) JPS58207651A (enrdf_load_stackoverflow)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6063941U (ja) * 1983-10-07 1985-05-07 信越化学工業株式会社 電子材料用ウエ−ハハンドリング用治具類
JPS60147121A (ja) * 1984-01-12 1985-08-03 Mitsui Toatsu Chem Inc ウエハ処理用容器
JPS6112099A (ja) * 1984-06-26 1986-01-20 倉敷紡績株式会社 半導体製造用治具
JPS6137842A (ja) * 1984-07-30 1986-02-22 Daikin Ind Ltd 非帯電性高分子材料
JPS6456866U (enrdf_load_stackoverflow) * 1987-09-30 1989-04-10
JPH0260954A (ja) * 1988-08-29 1990-03-01 Daikin Ind Ltd 非帯電性高分子材料
JPH02201926A (ja) * 1989-01-31 1990-08-10 Fujitsu Ltd ウエット洗浄用ホルダ及びウエット洗浄方法
JPH0312949A (ja) * 1989-06-12 1991-01-21 Fujitsu Ltd ウエハキャリア保持装置
JPH0380535A (ja) * 1989-08-23 1991-04-05 Fujitsu Ltd 洗浄ホルダ
WO2003049157A1 (en) * 2001-12-03 2003-06-12 E. I. Du Pont De Nemours And Company Transfer member with electric conductivity and its manufacturing method
US7699067B2 (en) * 2005-12-02 2010-04-20 Hon Hai Precision Industry Co., Ltd. Clamping apparatus for washing optical members
WO2019244520A1 (ja) * 2018-06-18 2019-12-26 株式会社Ｓｃｒｅｅｎホールディングス チャック部材及び基板処理装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50108880A (enrdf_load_stackoverflow) * 1974-02-01 1975-08-27
JPS53114670A (en) * 1977-03-17 1978-10-06 Toshiba Ceramics Co Jig for diffusion furnace

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50108880A (enrdf_load_stackoverflow) * 1974-02-01 1975-08-27
JPS53114670A (en) * 1977-03-17 1978-10-06 Toshiba Ceramics Co Jig for diffusion furnace

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6063941U (ja) * 1983-10-07 1985-05-07 信越化学工業株式会社 電子材料用ウエ−ハハンドリング用治具類
JPS60147121A (ja) * 1984-01-12 1985-08-03 Mitsui Toatsu Chem Inc ウエハ処理用容器
JPS6112099A (ja) * 1984-06-26 1986-01-20 倉敷紡績株式会社 半導体製造用治具
JPS6137842A (ja) * 1984-07-30 1986-02-22 Daikin Ind Ltd 非帯電性高分子材料
JPS6456866U (enrdf_load_stackoverflow) * 1987-09-30 1989-04-10
US5106539A (en) * 1988-08-29 1992-04-21 Daikin Industries, Ltd. Non-electrification polymeric composite material
JPH0260954A (ja) * 1988-08-29 1990-03-01 Daikin Ind Ltd 非帯電性高分子材料
JPH02201926A (ja) * 1989-01-31 1990-08-10 Fujitsu Ltd ウエット洗浄用ホルダ及びウエット洗浄方法
JPH0312949A (ja) * 1989-06-12 1991-01-21 Fujitsu Ltd ウエハキャリア保持装置
JPH0380535A (ja) * 1989-08-23 1991-04-05 Fujitsu Ltd 洗浄ホルダ
WO2003049157A1 (en) * 2001-12-03 2003-06-12 E. I. Du Pont De Nemours And Company Transfer member with electric conductivity and its manufacturing method
CN1332419C (zh) * 2001-12-03 2007-08-15 纳幕尔杜邦公司 具有电导的转移部件及其制造方法
US7699067B2 (en) * 2005-12-02 2010-04-20 Hon Hai Precision Industry Co., Ltd. Clamping apparatus for washing optical members
WO2019244520A1 (ja) * 2018-06-18 2019-12-26 株式会社Ｓｃｒｅｅｎホールディングス チャック部材及び基板処理装置
JP2019220528A (ja) * 2018-06-18 2019-12-26 株式会社Ｓｃｒｅｅｎホールディングス チャック部材及び基板処理装置

Also Published As

Publication number Publication date
JPH048945B2 (enrdf_load_stackoverflow) 1992-02-18

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