JPS58204345A - パタ−ンの欠陥検査装置 - Google Patents
パタ−ンの欠陥検査装置Info
- Publication number
- JPS58204345A JPS58204345A JP57087734A JP8773482A JPS58204345A JP S58204345 A JPS58204345 A JP S58204345A JP 57087734 A JP57087734 A JP 57087734A JP 8773482 A JP8773482 A JP 8773482A JP S58204345 A JPS58204345 A JP S58204345A
- Authority
- JP
- Japan
- Prior art keywords
- reflective surface
- axis
- side reflective
- optical
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000007547 defect Effects 0.000 title claims abstract description 14
- 238000007689 inspection Methods 0.000 title claims abstract description 9
- 230000003287 optical effect Effects 0.000 claims abstract description 39
- 238000010586 diagram Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57087734A JPS58204345A (ja) | 1982-05-24 | 1982-05-24 | パタ−ンの欠陥検査装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57087734A JPS58204345A (ja) | 1982-05-24 | 1982-05-24 | パタ−ンの欠陥検査装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58204345A true JPS58204345A (ja) | 1983-11-29 |
JPH033899B2 JPH033899B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-01-21 |
Family
ID=13923147
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57087734A Granted JPS58204345A (ja) | 1982-05-24 | 1982-05-24 | パタ−ンの欠陥検査装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58204345A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5935044A (ja) * | 1982-08-18 | 1984-02-25 | Shin Etsu Chem Co Ltd | 光通信フアイバ−用被覆剤 |
-
1982
- 1982-05-24 JP JP57087734A patent/JPS58204345A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5935044A (ja) * | 1982-08-18 | 1984-02-25 | Shin Etsu Chem Co Ltd | 光通信フアイバ−用被覆剤 |
Also Published As
Publication number | Publication date |
---|---|
JPH033899B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-01-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4595289A (en) | Inspection system utilizing dark-field illumination | |
US5528360A (en) | Surface-condition inspection apparatus | |
JPH04273008A (ja) | 表面状態検査装置 | |
JPH0141249B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
TWI537606B (zh) | 用於檢查物件的方法及系統 | |
EP0894262B1 (en) | Optical inspection device and lithographic apparatus provided with such a device | |
JPH02161332A (ja) | 曲率半径測定装置及び方法 | |
US5448350A (en) | Surface state inspection apparatus and exposure apparatus including the same | |
WO2002017357A2 (en) | Three dimensional inspection of leaded ics | |
JPS58204345A (ja) | パタ−ンの欠陥検査装置 | |
US4708484A (en) | Projection alignment method and apparatus | |
US4808002A (en) | Method and device for aligning first and second objects relative to each other | |
JPS58151544A (ja) | 暗視野像による欠陥検査装置 | |
JPS62188945A (ja) | 表面状態測定装置 | |
EP1139090A2 (en) | Leaded integrated circuit inspection system | |
JPS632324B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
JPS6352767B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
JPH043291Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
JPH07146213A (ja) | 収差測定装置 | |
JPS62274248A (ja) | 表面状態測定装置 | |
JPS6352769B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
JPS6347641A (ja) | 表面状態検査装置 | |
CN114675514A (zh) | 调平调焦装置 | |
JPH08203819A (ja) | 傾斜計測装置 | |
JPS6060721A (ja) | パタ−ン位置合せ装置 |