JPS6352767B2 - - Google Patents
Info
- Publication number
- JPS6352767B2 JPS6352767B2 JP57200062A JP20006282A JPS6352767B2 JP S6352767 B2 JPS6352767 B2 JP S6352767B2 JP 57200062 A JP57200062 A JP 57200062A JP 20006282 A JP20006282 A JP 20006282A JP S6352767 B2 JPS6352767 B2 JP S6352767B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- alignment
- wafer
- mark
- objective lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000003287 optical effect Effects 0.000 claims description 32
- 238000001514 detection method Methods 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 18
- 238000005286 illumination Methods 0.000 description 12
- 230000008569 process Effects 0.000 description 9
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 8
- 238000003384 imaging method Methods 0.000 description 8
- 230000009467 reduction Effects 0.000 description 7
- 239000011521 glass Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 210000001747 pupil Anatomy 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Control Of Position Or Direction (AREA)
- Length Measuring Devices By Optical Means (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57200062A JPS5989417A (ja) | 1982-11-15 | 1982-11-15 | マスク設定方法 |
| US06/550,097 US4655599A (en) | 1982-11-15 | 1983-11-09 | Mask aligner having a photo-mask setting device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57200062A JPS5989417A (ja) | 1982-11-15 | 1982-11-15 | マスク設定方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5989417A JPS5989417A (ja) | 1984-05-23 |
| JPS6352767B2 true JPS6352767B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-10-20 |
Family
ID=16418201
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57200062A Granted JPS5989417A (ja) | 1982-11-15 | 1982-11-15 | マスク設定方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5989417A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07107724B2 (ja) * | 1986-01-20 | 1995-11-15 | ソニー株式会社 | ビデオテ−プレコ−ダの回転ヘツド装置 |
| JPH07105326B2 (ja) * | 1986-06-18 | 1995-11-13 | 富士通株式会社 | 位置合わせ装置 |
| JP2622573B2 (ja) * | 1988-01-27 | 1997-06-18 | キヤノン株式会社 | マーク検知装置及び方法 |
-
1982
- 1982-11-15 JP JP57200062A patent/JPS5989417A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5989417A (ja) | 1984-05-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4062623A (en) | Device for observing an object | |
| JPH0580497A (ja) | 面状態検査装置 | |
| JPH04232951A (ja) | 面状態検査装置 | |
| US4669867A (en) | Alignment and exposure apparatus | |
| JPH0785466B2 (ja) | 位置合せ装置 | |
| JPS6341023A (ja) | ウエハをレチクルヘアラインする方法および装置 | |
| JPH08167558A (ja) | 投影露光装置 | |
| JPH07130635A (ja) | 基板の高さ位置検出装置 | |
| JPS61174717A (ja) | 位置合わせ装置 | |
| US4655599A (en) | Mask aligner having a photo-mask setting device | |
| WO1994024611A1 (en) | On axis mask and wafer alignment system | |
| KR20010091971A (ko) | 얼라인먼트 장치, 얼라인먼트 방법, 노광 장치 및 노광 방법 | |
| JP3048168B2 (ja) | 表面状態検査装置及びこれを備える露光装置 | |
| US4801808A (en) | Alignment and exposure apparatus having an objective lens system capable of observing a mark on an exposure optical holding member to permit alignment of a mask relative to the exposure optical system | |
| GB2133565A (en) | An observation device and an aligner using same | |
| JPS6352767B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
| JPS6352769B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
| JPS6362090B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
| US4660966A (en) | Optical alignment apparatus | |
| JPH04339245A (ja) | 表面状態検査装置 | |
| JP3495868B2 (ja) | 走査型投影露光装置及びそれを用いたデバイスの製造方法 | |
| JP3448663B2 (ja) | 投影露光装置 | |
| JPS5989418A (ja) | パタ−ン検知方法 | |
| JPH0344242B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
| JP3211246B2 (ja) | 投影露光装置及び素子製造方法 |