JPS58192342A - パターンの検査方法及び装置 - Google Patents

パターンの検査方法及び装置

Info

Publication number
JPS58192342A
JPS58192342A JP7526882A JP7526882A JPS58192342A JP S58192342 A JPS58192342 A JP S58192342A JP 7526882 A JP7526882 A JP 7526882A JP 7526882 A JP7526882 A JP 7526882A JP S58192342 A JPS58192342 A JP S58192342A
Authority
JP
Japan
Prior art keywords
pattern
distance
defect
patterns
signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7526882A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0422018B2 (enrdf_load_stackoverflow
Inventor
Yutaka Sako
裕 酒匂
Haruo Yoda
晴夫 依田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7526882A priority Critical patent/JPS58192342A/ja
Publication of JPS58192342A publication Critical patent/JPS58192342A/ja
Publication of JPH0422018B2 publication Critical patent/JPH0422018B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP7526882A 1982-05-07 1982-05-07 パターンの検査方法及び装置 Granted JPS58192342A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7526882A JPS58192342A (ja) 1982-05-07 1982-05-07 パターンの検査方法及び装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7526882A JPS58192342A (ja) 1982-05-07 1982-05-07 パターンの検査方法及び装置

Publications (2)

Publication Number Publication Date
JPS58192342A true JPS58192342A (ja) 1983-11-09
JPH0422018B2 JPH0422018B2 (enrdf_load_stackoverflow) 1992-04-15

Family

ID=13571303

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7526882A Granted JPS58192342A (ja) 1982-05-07 1982-05-07 パターンの検査方法及び装置

Country Status (1)

Country Link
JP (1) JPS58192342A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107782731A (zh) * 2016-08-31 2018-03-09 西门子(中国)有限公司 用于维护零部件表面受损的机械设备的方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5491359A (en) * 1977-12-28 1979-07-19 Fujitsu Ltd Pattern detector
JPS5542013A (en) * 1978-09-20 1980-03-25 Hitachi Ltd Automatic appearance test system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5491359A (en) * 1977-12-28 1979-07-19 Fujitsu Ltd Pattern detector
JPS5542013A (en) * 1978-09-20 1980-03-25 Hitachi Ltd Automatic appearance test system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107782731A (zh) * 2016-08-31 2018-03-09 西门子(中国)有限公司 用于维护零部件表面受损的机械设备的方法

Also Published As

Publication number Publication date
JPH0422018B2 (enrdf_load_stackoverflow) 1992-04-15

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