JPS5818940A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS5818940A
JPS5818940A JP56117080A JP11708081A JPS5818940A JP S5818940 A JPS5818940 A JP S5818940A JP 56117080 A JP56117080 A JP 56117080A JP 11708081 A JP11708081 A JP 11708081A JP S5818940 A JPS5818940 A JP S5818940A
Authority
JP
Japan
Prior art keywords
resin
etching
film
metal film
electrode wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56117080A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6256663B2 (cg-RX-API-DMAC10.html
Inventor
Hiroshi Kuroda
黒田　啓
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP56117080A priority Critical patent/JPS5818940A/ja
Publication of JPS5818940A publication Critical patent/JPS5818940A/ja
Publication of JPS6256663B2 publication Critical patent/JPS6256663B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10W20/069—

Landscapes

  • Drying Of Semiconductors (AREA)
JP56117080A 1981-07-28 1981-07-28 半導体装置の製造方法 Granted JPS5818940A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56117080A JPS5818940A (ja) 1981-07-28 1981-07-28 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56117080A JPS5818940A (ja) 1981-07-28 1981-07-28 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS5818940A true JPS5818940A (ja) 1983-02-03
JPS6256663B2 JPS6256663B2 (cg-RX-API-DMAC10.html) 1987-11-26

Family

ID=14702892

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56117080A Granted JPS5818940A (ja) 1981-07-28 1981-07-28 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS5818940A (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61124154A (ja) * 1984-11-20 1986-06-11 Nec Corp 半導体装置の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61124154A (ja) * 1984-11-20 1986-06-11 Nec Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS6256663B2 (cg-RX-API-DMAC10.html) 1987-11-26

Similar Documents

Publication Publication Date Title
KR0136569B1 (ko) 고집적 반도체 소자의 콘택홀 형성 방법
JP2519819B2 (ja) コンタクトホ―ルの形成方法
JPS5818940A (ja) 半導体装置の製造方法
JPH0856024A (ja) 集積回路の製造方法
JPH08130195A (ja) 半導体装置及びその製造方法
KR100248150B1 (ko) 반도체소자의 콘택홀형성방법
JPH0222844A (ja) 半導体集積回路
JPH01189939A (ja) 半導体集積回路
JPS58155A (ja) 半導体装置の製造方法
JPS61239646A (ja) 多層配線の形成方法
JPS6043844A (ja) 半導体装置の製造方法
JPS59181647A (ja) 半導体装置の製造方法
JPS59163838A (ja) 半導体装置の製造方法
JPH0774248A (ja) 半導体装置及びその製造方法
JPH0476207B2 (cg-RX-API-DMAC10.html)
JPS61296722A (ja) 半導体装置の製造方法
JPH0656847B2 (ja) 半導体集積回路の製造方法
JPS6149439A (ja) 半導体装置の製造方法
JPH11186224A (ja) 半導体装置の製造方法
JPS61288445A (ja) 半導体装置の製造方法
JPH10340951A (ja) 半導体装置及びその製造方法
JPS60227440A (ja) 半導体装置の製造方法
JPH01128544A (ja) 半導体装置およびその製造方法
KR19980080479A (ko) 자기정합적인 콘텍트홀 형성 방법
JPS60101952A (ja) 半導体装置